In addition to being used for pattern transfer,the negative photoresist SU-8 iswidely used as a structural material in microelectromechanical systems(MEMS).Due to its good photopatternability,SU-8 has lower manufactur...In addition to being used for pattern transfer,the negative photoresist SU-8 iswidely used as a structural material in microelectromechanical systems(MEMS).Due to its good photopatternability,SU-8 has lower manufacturing costs than many other materials,but its mechanical properties are relatively weak to some extent,which limits its performance.The mechanical properties of epoxy-like SU-8 can be enhanced by addingmicro-or nano-fillers such as carbon nanotube,clay,and SiC nanowire,which have superior elastic modulus.In this study,SiC nanowires were used to improve the mechanical properties of SU-8 while the SU-8 retains its photopatternability.The SiC nanowires were uniformly dispersed in SU-8 by stirring and ultrasonication.SU-8 materials with different SiC nanowire contents were fabricated into dog bone samples by lithography.The elastic modulus,storage modulus,and damping factor of the samples were measured by the Dynamic mechanical analysis(DMA)Q800.The experiment result shows that the rigidity and toughness increased,and the damping reduced.The 2 wt%SiC nanowires-reinforced SU-8 had a 73.88%increase in elastic modulus and a 103.4%increase in elongation at break.Furthermore,a spring component made by SiC-doped SU-8 could withstand greater acceleration.The SiC nanowires-reinforced SU-8 has the potential tomeet higher requirements in the design andmanufacture of MEMS and greatly reduce the manufacturing costs of MEMS devices.展开更多
报道了用光谱的手段研究 Si C纳米棒 (NR)的结果 .对于在实验中观察到 L O模的大幅度红移及新出现的喇曼峰 ,认为在类似 Si C NR的存在大量缺陷的极性纳米材料中 ,结构缺陷对材料特性的影响比量子限制效应更为重要 .理论计算证实了这一...报道了用光谱的手段研究 Si C纳米棒 (NR)的结果 .对于在实验中观察到 L O模的大幅度红移及新出现的喇曼峰 ,认为在类似 Si C NR的存在大量缺陷的极性纳米材料中 ,结构缺陷对材料特性的影响比量子限制效应更为重要 .理论计算证实了这一点 。展开更多
基金supports from the Shanghai Professional Technical Service Platform for Non-Silicon Micro-Nano Integrated ManufacturingProject funded by China Postdoctoral Science Foundation (No. 2018M630440)
文摘In addition to being used for pattern transfer,the negative photoresist SU-8 iswidely used as a structural material in microelectromechanical systems(MEMS).Due to its good photopatternability,SU-8 has lower manufacturing costs than many other materials,but its mechanical properties are relatively weak to some extent,which limits its performance.The mechanical properties of epoxy-like SU-8 can be enhanced by addingmicro-or nano-fillers such as carbon nanotube,clay,and SiC nanowire,which have superior elastic modulus.In this study,SiC nanowires were used to improve the mechanical properties of SU-8 while the SU-8 retains its photopatternability.The SiC nanowires were uniformly dispersed in SU-8 by stirring and ultrasonication.SU-8 materials with different SiC nanowire contents were fabricated into dog bone samples by lithography.The elastic modulus,storage modulus,and damping factor of the samples were measured by the Dynamic mechanical analysis(DMA)Q800.The experiment result shows that the rigidity and toughness increased,and the damping reduced.The 2 wt%SiC nanowires-reinforced SU-8 had a 73.88%increase in elastic modulus and a 103.4%increase in elongation at break.Furthermore,a spring component made by SiC-doped SU-8 could withstand greater acceleration.The SiC nanowires-reinforced SU-8 has the potential tomeet higher requirements in the design andmanufacture of MEMS and greatly reduce the manufacturing costs of MEMS devices.
