Fabrication of 80-nm T-gate high indium In_(0.7)Ga_(0.3)As/In_(0.6)Ga_(0.4)As composite channels mHEMT on GaAs substrate with simple technological process

An 80-nm gate length metamorphic high electron mobility transistor （mHEMT） on a GaAs substrate with high indium composite compound-channels Ino.7Ga0.aAs/Ino.6Gao.aAs and an optimized grade buffer scheme is presented. High 2-DEG Hall mobility values of 10200 cm2/（V.s） and a sheet density of 3.5 x 10^12 cm-2 at 300 K have been achieved. The device＇s T-shaped gate was made by utilizing a simple three layers electron beam resist, instead of employing a passivation layer for the T-share gate, which is beneficial to decreasing parasitic capacitance and parasitic resistance of the gate and simplifying the device manufacturing process. The ohmic contact resistance Rc is 0.2 n.mm when using the same metal system with the gate （Pt/Ti/Pt/Au）, which reduces the manufacturing cycle of the device. The mHEMT device demonstrates excellent DC and RF characteristics. The peak extrinsic transconductance of 1.1 S/mm and the maximum drain current density of 0.86 A/mm are obtained. The unity current gain cut-off frequency （fT） and the maximum oscillation frequency （fmax） are 246 and 301 GHz, respectively.

HPLC测定金鸡菊中金鸡菊查尔酮含量

目的建立高效液相色谱法测定金鸡菊中金鸡菊查尔酮含量的方法。方法采用Inertsil ODS-3 C18柱(4.6 mm×250 mm,5μm),以乙腈-1%冰醋酸(80∶20)为流动相,流速1.0 mL/min,检测波长378 nm。结果金鸡菊查尔酮在0.4～4.0μg范围内与峰面积呈良好线性关系,回归方程为Y=31 213X-149 303(r=0.999 9),平均回收率为99.21%,RSD=1.70%(n=5)。结论本方法简便、准确、重复性好,可用于金鸡菊的质量控制。