温度对AACVD法制备AZO透明导电薄膜的影响

低成本、大面积、沉积速率高、均匀性好、光电性能优良的Al掺杂ZnO薄膜(AZO)制备技术依然是透明导电薄膜领域研究的重点之一。本文采用冷壁式气溶胶辅助化学气相沉积(AACVD)技术在玻璃衬底上制备了AZO透明导电薄膜,研究了衬底温度对薄膜结构和光、电性能的影响。利用X射线衍射、原子力显微镜、紫外-可见光谱和光致发光光谱等对样品进行了表征。结果表明:在AACVD法生长AZO薄膜的过程中,衬底温度对AZO薄膜晶面的择优取向生长影响呈起伏式变化。明显的电学性能的转变温度发生在约400℃,光学性能和晶面的择优取向生长变化出现在约450℃。讨论了温度对AACVD法制备AZO透明导电薄膜结构和光、电性能影响的微观机制。400℃时沉积的AZO薄膜方阻190Ω/□,平均透过率为80%。

Composition and Band Gap Controlled AACVD of ZnSe and ZnS_xSe_1-xThin Films Using Novel Single Source Precursors

Polycrystalline thin films of ZnSe and ZnSxSe1-x have been deposited on glass substrates by Aerosol Assisted Chemical Vapour Deposition (AACVD) from bis(diethyldiselenocarbamato)zinc(II) and a 1:1 and 1:0.75 mixtures of bis(diethyldiselenocarbamato)zinc(II) and bis(diethyldithiocarbamato)zinc(II) as precursors. All films were characterized by p-XRD, SEM, EDX, Raman spectroscopy, photoluminescence (PL and UV/Vis spectroscopy. The band gap of pure ZnSe thin films was found to be 2.25 whereas the band gap of ZnSxSe1-x films varied from 2.55 to 2.66 eV depending on the sulfur content in the films. PL emission spectra showed a clear blue shift for ZnSxSe1-x films compared to ZnSe due to the sulphur content in the films which increase the band gap. The band gap of ZnSSe can be controlled by sulfur to selenium ratio in the alloy. The morphology of the ZnSe thin films changed from small randomly shaped crystallites to triangles whereas the morphology of ZnSxSe1-x was mainly based on cuboids.

钽掺杂FTO薄膜的制备及其光学电学性能的影响

采用气溶胶辅助化学气相沉积(AACVD)以单丁基氯化锡(MBTC)为锡源、氟化铵(NH 4F)为氟源、甲醇做溶剂、五氯化钽(TaCl_(5))为钽源在钠钙玻璃上成功沉积Ta掺杂的FTO(TFTO)薄膜。通过X射线衍射(XRD)、场发射扫描电镜(FESEM)、X光电子能谱(XPS)、分光光度计、霍尔效应测试仪等设备分析了薄膜的物相组成、微观形貌、光学性能、电学性能和低辐射性能。结果表明,钽掺杂的FTO薄膜具有四方金红石结构,为N型半导体。当Ta/Sn为1%(原子比分数)时,可见光区段透射比T为74.18%、电阻率ρ为2.78×10^(-4)Ω·cm、载流子浓度n为1.44×10^(21)cm^(-3)、迁移率μ为18.73 cm^(2)/V·s、红外反射率R IR为94%、辐射率ε为0.12。

镍掺杂对FTO薄膜光电性能的影响及机理分析

本文以单丁基三氯化锡(MBTC)为锡源,氟化铵(NH_(4)F)为氟源,甲醇为溶剂,六水合氯化镍(NiCl_(2)·6H_(2)O)为镍源,采用气溶胶辅助化学气相沉积(AACVD)制备了镍掺杂FTO薄膜。利用分光光度计、四探针电阻仪及霍尔效应测试仪对镍掺杂FTO薄膜的光学性能、电学性能进行表征和分析,并基于第一性原理对掺杂体系的电子结构进行了计算。结果表明,Ni掺杂的FTO薄膜为四方金红石结构,导电性能有所提高。当Ni/Sn为2%(原子数分数)时,品质因数Φ_(TC)达到3×10^(-2)Ω^(-1),电阻率ρ为3.79×10^(-4)Ω·cm,可见光平均透过率约为80%,载流子浓度n为6.88×10^(20)cm^(-3),迁移率μ为13.31 cm^(2)·V^(-1)·s^(-1)。