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InAlN薄膜MOCVD外延生长研究
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作者 贠利君 魏同波 +3 位作者 刘乃鑫 闫建昌 王军喜 李晋闽 《半导体技术》 CAS CSCD 北大核心 2011年第8期609-613,638,共6页
为了研究不同压力和不同模板对InA lN薄膜外延生长的影响,分别选取以GaN为模板时生长压力为4.00、6.67和13.33 kPa,压力为4.00 kPa时模板为GaN和A lN这两组条件进行实验比较。研究发现,随着生长压力的增加,样品中In含量降低,样品的粗糙... 为了研究不同压力和不同模板对InA lN薄膜外延生长的影响,分别选取以GaN为模板时生长压力为4.00、6.67和13.33 kPa,压力为4.00 kPa时模板为GaN和A lN这两组条件进行实验比较。研究发现,随着生长压力的增加,样品中In含量降低,样品的粗糙度则随压力的增加而增大;压力为4.00 kPa时,分别以摇摆曲线半高宽(FWHM)为86.97″的A lN和224.1″的GaN为模板,发现A lN模板上生长的InA lN样品(002)和(102)峰的FWHM值及表面粗糙度比上述GaN为模板生长的InA lN样品都要小很多。综合以上结果可初步得知:降低压力可以优化InA lN薄膜的表面形貌,增加In组分含量;采用高质量的A lN作模板能生长出晶体质量和表面形貌都比较好的InA lN薄膜。 展开更多
关键词 压力 模板 aiinn薄膜 粗糙度 晶体质量
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The advantage of blue InGaN multiple quantum wells light-emitting diodes with p-AlInN electron blocking layer 被引量:3
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作者 卢太平 李述体 +8 位作者 张康 刘超 肖国伟 周玉刚 郑树文 尹以安 仵乐娟 王海龙 杨孝东 《Chinese Physics B》 SCIE EI CAS CSCD 2011年第9期456-459,共4页
InGaN based light-emitting diodes (LEDs) with different electron blocking layers have been numerically investi- gated using the APSYS simulation software. It is found that the structure with a p-AlInN electron block... InGaN based light-emitting diodes (LEDs) with different electron blocking layers have been numerically investi- gated using the APSYS simulation software. It is found that the structure with a p-AlInN electron blocking layer showes improved light output power, lower current leakage, and smaller efficiency droop. Based on numerical simulation and analysis, these improvements of the electrical and optical characteristics are mainly attributed to the efficient electron blocking in the InGaN/GaN multiple quantum wells (MQWs). 展开更多
关键词 GaN-based light-emitting diodes electron blocking layer aiinn
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Electrical characteristics of AlInN/GaN HEMTs under cryogenic operation
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作者 张雪锋 王莉 +2 位作者 刘杰 魏崃 许键 《Chinese Physics B》 SCIE EI CAS CSCD 2013年第1期482-485,共4页
Electrical properties of an AIlnN/GaN high-electron mobility transistor (HEMT) on a sapphire substrate are investigated in a cryogenic temperature range from 295 K down to 50 K. It is shown that drain saturation cur... Electrical properties of an AIlnN/GaN high-electron mobility transistor (HEMT) on a sapphire substrate are investigated in a cryogenic temperature range from 295 K down to 50 K. It is shown that drain saturation current and conductance increase as transistor operation temperature decreases. A self-heating effect is observed over the entire range of temperature under high power consumption. The dependence of channel electron mobility on electron density is investigated in detail. It is found that aside from Coulomb scattering, electrons that have been pushed away from the AIInN/GaN interface into the bulk GaN substrate at a large reverse gate voltage are also responsible for the electron mobility drop with the decrease of electron density. 展开更多
关键词 aiinn/GaN heterostructure high-electron mobility transistor (HEMT) cryogenic temperature two-dimensional electron gas (2DEG) mobility
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