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Numerical Analysis on the Effect of n-Si on Cu(In, Ga)Se2 Based Thin-Films for High-Performance Solar Cells by 1D-SCAPS
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作者 Rasika N. Mohottige Micheal Farndale +1 位作者 Gary S. Coombs Shahnoza Saburhhojayeva 《Open Journal of Applied Sciences》 2024年第5期1315-1329,共15页
We report the performances of a chalcopyrite Cu(In, Ga)Se<sub>2 </sub>CIGS-based thin-film solar cell with a newly employed high conductive n-Si layer. The data analysis was performed with the help of the ... We report the performances of a chalcopyrite Cu(In, Ga)Se<sub>2 </sub>CIGS-based thin-film solar cell with a newly employed high conductive n-Si layer. The data analysis was performed with the help of the 1D-Solar Cell Capacitance Simulator (1D-SCAPS) software program. The new device structure is based on the CIGS layer as the absorber layer, n-Si as the high conductive layer, i-In<sub>2</sub>S<sub>3</sub>, and i-ZnO as the buffer and window layers, respectively. The optimum CIGS bandgap was determined first and used to simulate and analyze the cell performance throughout the experiment. This analysis revealed that the absorber layer’s optimum bandgap value has to be 1.4 eV to achieve maximum efficiency of 22.57%. Subsequently, output solar cell parameters were analyzed as a function of CIGS layer thickness, defect density, and the operating temperature with an optimized n-Si layer. The newly modeled device has a p-CIGS/n-Si/In<sub>2</sub>S<sub>3</sub>/Al-ZnO structure. The main objective was to improve the overall cell performance while optimizing the thickness of absorber layers, defect density, bandgap, and operating temperature with the newly employed optimized n-Si layer. The increase of absorber layer thickness from 0.2 - 2 µm showed an upward trend in the cell’s performance, while the increase of defect density and operating temperature showed a downward trend in solar cell performance. This study illustrates that the proposed cell structure shows higher cell performances and can be fabricated on the lab-scale and industrial levels. 展开更多
关键词 n-Si p-CIGS 1D-SCAPS Thin-films In2S3
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溶胶-凝胶SiO_(2)减反膜的制备与光学性能研究
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作者 沈斌 张旭 +2 位作者 熊怀 李海元 谢兴龙 《无机材料学报》 SCIE EI CAS CSCD 北大核心 2024年第5期525-530,共6页
碱催化溶胶-凝胶多孔SiO_(2)减反膜具有优异的光学性能及抗激光损伤性能,是高功率激光装置中的重要组成部分,但其与光学元件之间的结合强度低,使得膜层易发生接触破坏。本研究以“神光II”高功率激光装置溶胶-凝胶多孔SiO_(2)减反膜为基... 碱催化溶胶-凝胶多孔SiO_(2)减反膜具有优异的光学性能及抗激光损伤性能,是高功率激光装置中的重要组成部分,但其与光学元件之间的结合强度低,使得膜层易发生接触破坏。本研究以“神光II”高功率激光装置溶胶-凝胶多孔SiO_(2)减反膜为基础,通过提拉法在其表层涂覆致密的SiO_(2)薄层后得到机械强度提升的双层SiO_(2)减反膜(SiO_(2)-MTES),并与常用的单层氨固化SiO_(2)减反膜(SiO_(2)-HMDS)进行相关应用性能的综合比较。结果表明,涂覆SiO_(2)-MTES的熔石英在约800 nm处的峰值透过率大于99.6%,运用1-on-1激光损伤阈值测试方法测得该双层SiO_(2)减反膜的零几率激光损伤阈值为51.9 J/cm^(2)(1064 nm,9.1 ns),与涂覆SiO_(2)-HMDS的性能相当。同时,SiO_(2)-MTES膜层与水的接触角达到117.3°,且在相对湿度大于90%的高湿环境中膜层的透过率较稳定。多次擦拭实验结果表明SiO_(2)-MTES的耐摩擦机械强度明显优于SiO_(2)-HMDS,有效提升了膜层与光学元件之间的结合强度。 展开更多
关键词 溶胶-凝胶 减反膜 SiO_(2) 机械强度
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溶胶-凝胶法制备SiO_(2)减反射薄膜及其耐久性
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作者 王军 胡瑾瑜 +3 位作者 向军淮 李由 张淑娟 胡敏 《表面技术》 EI CAS CSCD 北大核心 2024年第10期243-249,共7页
目的增加太阳光在太阳能电池玻璃盖板的透过率,以期提高太阳能电池的转换效率。方法以正硅酸乙酯为原料、乙醇为溶剂、氨水为催化剂,采用碱催化溶胶-凝胶浸渍提拉法,在玻璃表面制备了SiO_(2)减反射薄膜,研究了溶胶中正硅酸乙酯与乙醇物... 目的增加太阳光在太阳能电池玻璃盖板的透过率,以期提高太阳能电池的转换效率。方法以正硅酸乙酯为原料、乙醇为溶剂、氨水为催化剂,采用碱催化溶胶-凝胶浸渍提拉法,在玻璃表面制备了SiO_(2)减反射薄膜,研究了溶胶中正硅酸乙酯与乙醇物质的量比和提拉镀膜速度对SiO_(2)薄膜光学性质的影响,分析了减反射薄膜的耐久性。结果碱性溶胶制备的SiO_(2)为非晶相,采用浸渍提拉法在玻璃表面制备的薄膜结构疏松,且存在微裂纹。采用正硅酸乙酯与乙醇物质的量比为1∶20、提拉速度为500μm/s及正硅酸乙酯与乙醇物质的量比为1∶30、提拉速度为1000μm/s制备的SiO_(2)薄膜,折射率分别为1.35和1.33,厚度分别为101.11、102.63nm,最大透过率分别高于未镀膜玻璃6.57%和6.94%,在400~1100nm波长范围内的平均透过率分别高于未镀膜玻璃5.01%和5.34%,表明该薄膜具有优异的减反射性能。玻璃表面制备SiO_(2)薄膜后,水接触角约为5°,具有超亲水性。将未镀膜玻璃及镀膜样品在实验室放置5个月后,采用正硅酸乙酯与乙醇物质的量比为1∶20、提拉速度为500μm/s及正硅酸乙酯与乙醇物质的量比为1∶30、提拉速度为1000μm/s的制备SiO_(2)薄膜的最大透过率分别高于未镀膜玻璃7.50%和6.71%,在400~1100 nm波长范围内的平均透过率分别高于未镀膜玻璃5.94%和5.59%,表明SiO_(2)薄膜的减反射性能具有较好的耐久性。结论采用碱催化溶胶-凝胶法在玻璃上制备的SiO_(2)减反射薄膜具有超亲水性及优异的减反射耐久性,在太阳能电池玻璃盖板上具有潜在的应用价值。 展开更多
关键词 溶胶-凝胶 SiO_(2)薄膜 减反射 润湿性 耐久性
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Al_(2)O_(3)-Ce_(2)O_(3)复合薄膜对304不锈钢抗高温氧化性能的影响
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作者 马静 王铁凝 +3 位作者 姜秋月 冯志浩 张欣 李建辉 《材料保护》 CAS CSCD 2024年第10期19-26,共8页
为提高304不锈钢的抗高温氧化性能,采用溶胶-凝胶法以异丙醇铝和CeCl_3·7H_(2)O为原料,在304不锈钢表面分别制备了Al_(2)O_(3)薄膜和Al_(2)O_(3)-Ce_(2)O_(3)复合薄膜,通过氧化动力学曲线、XRD、SEM和EDS分析,研究了不同Ce/Al比例... 为提高304不锈钢的抗高温氧化性能,采用溶胶-凝胶法以异丙醇铝和CeCl_3·7H_(2)O为原料,在304不锈钢表面分别制备了Al_(2)O_(3)薄膜和Al_(2)O_(3)-Ce_(2)O_(3)复合薄膜,通过氧化动力学曲线、XRD、SEM和EDS分析,研究了不同Ce/Al比例(摩尔比,下同)的Al_(2)O_(3)-Ce_(2)O_(3)复合薄膜对304不锈钢900℃抗高温氧化性能的影响。结果表明,涂覆Ce∶Al=1∶10的薄膜试样在900℃循环氧化100 h后的氧化增重与氧化剥落量仅为未涂覆试样的34.1%和51.8%,抗高温氧化性能最佳。Al_(2)O_(3)-Ce_(2)O_(3)复合薄膜降低了304不锈钢基体表面的氧分压,有利于生成保护性的Cr_2O_(3)氧化层,有效抑制了Cr_2O_(3)的挥发;添加Ce_(2)O_(3)降低了氧化层中的热应力,提高了其附着力;Ce_(2)O_(3)起到了活性元素效应,改变了氧化膜的生长机制,因此显著提高了不锈钢的抗高温氧化性能。 展开更多
关键词 溶胶-凝胶法 Al_(2)O_(3)-Ce_(2)O_(3)复合薄膜 高温氧化 活性元素效应
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5Cr油套管钢在含Cl^(-)的CO_(2)环境中的腐蚀特性研究
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作者 赵国仙 刘冉冉 +6 位作者 李琼玮 杨立华 孙雨来 丁浪勇 王映超 张思琦 宋洋 《表面技术》 EI CAS CSCD 北大核心 2024年第6期55-66,共12页
目的掌握油气井生产中CO_(2)腐蚀对油套管的影响规律,研究兼顾耐蚀性和经济性的5Cr油套管材料在含Cl^(-)的CO_(2)环境中不同时间下的腐蚀演变规律。方法采用XRD、XPS、SEM和EDS等技术分析5Cr油套管钢在不同时间下腐蚀产物膜的演变情况,... 目的掌握油气井生产中CO_(2)腐蚀对油套管的影响规律,研究兼顾耐蚀性和经济性的5Cr油套管材料在含Cl^(-)的CO_(2)环境中不同时间下的腐蚀演变规律。方法采用XRD、XPS、SEM和EDS等技术分析5Cr油套管钢在不同时间下腐蚀产物膜的演变情况,利用丝束电极(WBE)和阻抗测试(EIS)技术对其腐蚀电化学行为进行研究。结果5Cr油套管钢腐蚀后期的平均腐蚀速率约为初期的1/2,在腐蚀14 d后,腐蚀产物膜中的Cr富集大于30%,Cr、Fe质量比达到较高水平,约为基体的15倍。随着腐蚀的进行,电荷传递电阻和产物膜覆盖引起的电阻增大,电化学反应阻力增大。在腐蚀前期具有局部不均匀性,随着腐蚀的进行,电极腐蚀电位有负移现象,最终分布区间为−0.59~−0.61 V,电极表面阳极电流区域大幅减少。结论在腐蚀时间延长的条件下,5Cr油套管钢腐蚀产物膜的致密性增加,电荷传递电阻呈变大趋势。在产物膜下的5Cr油套管钢区域,电流发生由阴极向阳极极性转变的现象,产物膜存在的孔隙使5Cr油套管钢基体金属被腐蚀,从而导致阳极电流的出现。表面局部腐蚀电位阳极区的形成和扩展使其有产生点蚀的倾向,但腐蚀产物逐渐沉积在点蚀坑内壁,形成了Cr富集的保护性表面层,原发生点蚀区域由原阳极活性点位转变为阴极区,对其发展起到了抑制作用。 展开更多
关键词 5Cr油套管钢 CO_(2)腐蚀 腐蚀产物膜 Cr元素富集 电化学阻抗谱 丝束电极
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纳米TiO_(2)对NH_(3)-H_(2)O-LiBr工质降膜吸收性能的影响
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作者 李彦军 金正浩 李舒宏 《制冷技术》 2024年第1期16-23,共8页
为了探讨纳米TiO_(2)对三元NH_(3)-H_(2)O-LiBr工质降膜吸收的影响,本文利用数值分析建立了三元工作流体薄膜吸收的连续方程、能量方程和组分质量平衡方程,采用Matlab软件进行编程和计算纳米流体的降膜吸收性能,将其与实验数据进行对比... 为了探讨纳米TiO_(2)对三元NH_(3)-H_(2)O-LiBr工质降膜吸收的影响,本文利用数值分析建立了三元工作流体薄膜吸收的连续方程、能量方程和组分质量平衡方程,采用Matlab软件进行编程和计算纳米流体的降膜吸收性能,将其与实验数据进行对比验证,并进一步分析了纳米TiO_(2)质量分数、初始氨浓度、初始温度、冷却水进口温度、吸收压力和下降薄膜管长度对薄膜吸收性能的影响。研究表明:添加纳米TiO_(2)可以增强降膜吸收的传质速率,主要原因为液膜中氨的扩散系数增加。当纳米TiO_(2)质量分数从0%增加到0.1%、0.3%和0.5%时,扩散系数分别增加了3.44倍、6.42倍和11.76倍。此外,增加初始氨浓度、降低初始温度、提高冷却水进口温度或降低吸收压力都可以提高最终溶液的饱和度。 展开更多
关键词 降膜 吸收 纳米TiO_(2) NH_(3)-H_(2)O-LiBr 模拟研究
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锌电积用Pb-Ag阳极MnO_(2)镀膜的电化学性能 被引量:1
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作者 王恩泽 郭孟伟 +3 位作者 邵伟春 高明远 徐存英 张启波 《中国有色金属学报》 EI CAS CSCD 北大核心 2024年第2期490-502,共13页
锌电积用Pb-Ag阳极存在析氧过电位高、表面铅易电化学氧化溶解,造成阴极电锌品质低等突出问题,如何减少阳极的溶铅污染并提升其催化析氧活性、降低反应能耗,成为亟待解决的难题。本文在Pb-Ag阳极表面电沉积一层均匀、致密的MnO_(2)薄膜... 锌电积用Pb-Ag阳极存在析氧过电位高、表面铅易电化学氧化溶解,造成阴极电锌品质低等突出问题,如何减少阳极的溶铅污染并提升其催化析氧活性、降低反应能耗,成为亟待解决的难题。本文在Pb-Ag阳极表面电沉积一层均匀、致密的MnO_(2)薄膜,采用SEM、XRD和ICP等对MnO_(2)催化层的表面微观形貌、晶体结构和溶液含铅量进行分析;采用CV、LSV、EIS和Tafel等对Pb-Ag/MnO_(2)阳极的析氧催化活性和耐腐蚀性能进行分析。结果表明:在MnSO_(4)-H_(2)SO_(4)溶液中,当循环速率为200 mL/min、温度为80℃时,以4 mA/cm^(2)电沉积120 min制备的Pb-Ag/MnO_(2)镀膜电极具有最佳的催化析氧和耐蚀性能;PbAg阳极经优化镀膜后,50 mA/cm^(2)时其析氧过电位由936 mV降低为648 mV,腐蚀电流密度由7.03μA/cm^(2)降低至0.66μA/cm^(2);相较于Pb-Ag阳极,基于Pb-Ag/MnO_(2)阳极的15 d长周期电锌体系中溶铅量由0.61 mg/L降至0.29 mg/L。 展开更多
关键词 锌电积 Pb-Ag阳极 MnO_(2)镀膜 催化析氧 耐蚀性能
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闭合场-磁控溅射制备Ti掺杂MoS_(2)复合薄膜及其摩擦学性能研究
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作者 王伟奇 陈欣仪 +5 位作者 赵旋 林鑫 田广科 郭月霞 王锐东 令晓明 《润滑与密封》 CAS CSCD 北大核心 2024年第8期28-35,共8页
采用闭合场-磁控溅射沉积技术,通过调节沉积过程中钛靶的溅射电流,分别在单晶Si(100)和304不锈钢基底上制备不同含量Ti掺杂MoS_(2)复合薄膜。利用场发射扫描电子显微镜、X射线光电子能谱仪和透射电子显微镜表征薄膜的形貌、微观结构及... 采用闭合场-磁控溅射沉积技术,通过调节沉积过程中钛靶的溅射电流,分别在单晶Si(100)和304不锈钢基底上制备不同含量Ti掺杂MoS_(2)复合薄膜。利用场发射扫描电子显微镜、X射线光电子能谱仪和透射电子显微镜表征薄膜的形貌、微观结构及元素含量;利用纳米压痕仪、球-盘摩擦试验机系统考察薄膜的力学性能和在大气环境下的摩擦学性能及其与薄膜中Ti元素含量之间的关系。结果表明:随着溅射电流增加,薄膜中Ti元素含量增加、MoS_(2)晶粒的生长尺寸变小,使MoS_(2)由尺寸较大的层状结构向短程有序、长程无序的无定型非晶结构转变。尤其在钛靶电流为1.0 A条件下制备的Ti元素原子分数为18.55%的Ti/MoS_(2)复合薄膜表现出较好的致密性和硬度,同时Ti元素相比于MoS_(2)可以在摩擦界面处优先与O结合,使薄膜中MoS_(2)抗氧化性能提升,从而改善了薄膜的摩擦学性能。 展开更多
关键词 闭合场-磁控溅射 MoS_(2)润滑薄膜 摩擦学性能 力学性能
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PE-BW-SiO_(2)复合包装膜对草鱼保鲜效果的研究
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作者 李娟华 王红蕾 +3 位作者 陈国健 高南 仲芸芸 肖乃玉 《包装工程》 CAS 北大核心 2024年第9期34-44,共11页
目的开发一种具有优良理化性能,并能有效应用于草鱼保鲜的新型活性包装膜。方法采用聚乙烯为基膜材料,以蜂蜡和纳米SiO_(2)为活性成分,采用熔融共混和造粒吹膜工艺制备PE-BW-SiO_(2)复合包装膜。测定包装膜的力学性能、阻隔性能和疏水性... 目的开发一种具有优良理化性能,并能有效应用于草鱼保鲜的新型活性包装膜。方法采用聚乙烯为基膜材料,以蜂蜡和纳米SiO_(2)为活性成分,采用熔融共混和造粒吹膜工艺制备PE-BW-SiO_(2)复合包装膜。测定包装膜的力学性能、阻隔性能和疏水性能,并研究它在4℃贮藏条件下对草鱼的保鲜效果。结果通过添加BW-SiO_(2)活性成分,包装膜的力学性能、阻隔性能和疏水性能得到提高。其中,BW-SiO_(2)添加量(质量分数)为2%的包装膜的力学性能、阻隔性能等综合性能达到最佳水平。将不同包装膜包装的草鱼置于4℃下贮藏11 d,结果表明,与纯PE包装膜相比,添加BW-SiO_(2)功效因子的复合PE包装膜对草鱼的保鲜效果更好,能够减缓鱼肉的水分流失和脂质氧化反应,有效延缓鱼肉的腐败变质进程,从而延长鱼肉的贮藏期。结论PE-BW-SiO_(2)复合包装膜具有良好的理化性能和保鲜效果,它有效地阻隔了外界水分的渗透和氧气的进入,从而减缓了水分流失和脂质氧化反应,同时还能防止微生物的滋长。此包装膜有效延缓了草鱼的腐败变质进程,在4℃下贮藏时将草鱼的货架期延长至11 d。 展开更多
关键词 草鱼 保鲜 蜂蜡 纳米SiO_(2) PE-BW-SiO_(2)复合包装膜
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基于ZrO_(2)-SiO_(2)和介孔SiO_(2)凝胶膜制备可见光区双层减反射膜
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作者 汪文文 肖志葳 +3 位作者 邓志文 贾红宝 王颖 朱世海 《辽宁科技大学学报》 CAS 2024年第1期75-80,共6页
采用溶胶-凝胶法,以正丙醇锆、正硅酸四乙酯为原料,在乙醇体系中以原位混合方式成功制备ZrO_(2)-SiO_(2)混合溶胶,Zr摩尔分数为20%~80%。在熔融石英基底上镀制混合凝胶膜,所得ZrO_(2)-SiO_(2)薄膜折射率在1.55~1.75之间可调。以有序介孔... 采用溶胶-凝胶法,以正丙醇锆、正硅酸四乙酯为原料,在乙醇体系中以原位混合方式成功制备ZrO_(2)-SiO_(2)混合溶胶,Zr摩尔分数为20%~80%。在熔融石英基底上镀制混合凝胶膜,所得ZrO_(2)-SiO_(2)薄膜折射率在1.55~1.75之间可调。以有序介孔SiO_(2)薄膜为外层,选择与之匹配的ZrO_(2)-SiO_(2)薄膜为内层,构建λ/4~λ/2双层宽谱带减反射涂层。根据实际膜层的光学常数进行双层膜的优化设计,成功制备出在可见光区平均透射率达到99.17%的双层减反射薄膜。 展开更多
关键词 ZrO_(2)-SiO_(2)混合溶胶 溶胶-凝胶法 原位混合 减反射膜
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Al掺杂对β-Ga_(2)O_(3)薄膜光学性质的影响研究
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作者 钟琼丽 王绪 +1 位作者 马奎 杨发顺 《人工晶体学报》 CAS 北大核心 2024年第8期1352-1360,共9页
近年来,半导体器件向着高散热性、高击穿场强和低能耗的方向发展,因此超宽禁带半导体材料β-Ga_(2)O_(3)具有广阔的应用前景,而有效掺杂是实现β-Ga_(2)O_(3)器件的基础。实验采用磁控溅射法制备Ga_(2)O_(3)/Al/Ga_(2)O_(3)/Al/Ga_(2)O_... 近年来,半导体器件向着高散热性、高击穿场强和低能耗的方向发展,因此超宽禁带半导体材料β-Ga_(2)O_(3)具有广阔的应用前景,而有效掺杂是实现β-Ga_(2)O_(3)器件的基础。实验采用磁控溅射法制备Ga_(2)O_(3)/Al/Ga_(2)O_(3)/Al/Ga_(2)O_(3)复合结构,经高温退火使Al原子热扩散进入薄膜中,形成Al掺杂的β-Ga_(2)O_(3)薄膜。采用激光区熔法使薄膜区域熔化再结晶,进一步提升掺杂质量。对Al掺杂β-Ga_(2)O_(3)薄膜的晶体性质、杂质含量及光学性质进行了测试表征。结果表明:Al掺杂不改变β-Ga_(2)O_(3)薄膜的晶体结构;随着Al层溅射时间延长,掺杂含量逐渐增加;当Al溅射时间为5和10 s时,薄膜紫外吸收率分别为40%和50%;随着Al溅射时间的增加,Al掺杂β-Ga_(2)O_(3)薄膜紫外区域光吸收率逐渐增强,Al溅射时间为300 s时,β-Ga_(2)O_(3)薄膜的光吸收率接近90%;低浓度的Al掺杂会导致β-Ga_(2)O_(3)薄膜的禁带宽度变窄。 展开更多
关键词 β-Ga_(2)O_(3)薄膜 AL掺杂 磁控溅射 Ga_(2)O_(3)/Al/Ga_(2)O_(3)/Al/Ga_(2)O_(3)复合结构 光吸收 光学带隙
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基于SF_(6)/Ar的电感耦合等离子体干法刻蚀β-Ga_(2)O_(3)薄膜
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作者 曾祥余 马奎 杨发顺 《半导体技术》 CAS 北大核心 2024年第7期624-628,共5页
使用SF_(6)/Ar混合气体作为刻蚀气体,采用电感耦合等离子体(ICP)刻蚀方法,研究了不同激励功率和偏置功率对Ga_(2)O_(3)薄膜刻蚀速率的影响以及不同刻蚀时间对表面粗糙度的影响,并观察了光刻胶的损伤情况以调整刻蚀工艺参数。实验结果表... 使用SF_(6)/Ar混合气体作为刻蚀气体,采用电感耦合等离子体(ICP)刻蚀方法,研究了不同激励功率和偏置功率对Ga_(2)O_(3)薄膜刻蚀速率的影响以及不同刻蚀时间对表面粗糙度的影响,并观察了光刻胶的损伤情况以调整刻蚀工艺参数。实验结果表明,适度地增大激励功率和偏置功率可以提高刻蚀速率;合适的刻蚀时间可以在得到低粗糙度表面的同时不会过度损伤光刻胶掩膜。通过优化工艺参数,在激励功率为600 W、偏置功率为150 W、刻蚀时间为17 min下,可得到30 nm/min的Ga_(2)O_(3)薄膜刻蚀速率,刻蚀表面的垂直度高、粗糙度低,同时光刻胶掩膜形貌完好。 展开更多
关键词 电感耦合等离子体(ICP)刻蚀 Ga_(2)O_(3)薄膜 刻蚀速率 光刻胶掩膜 低粗糙度表面
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Enhancing performance of low-temperature processed CsPbI2Br all-inorganic perovskite solar cells using polyethylene oxide-modified TiO_(2)
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作者 Xu Zhao Naitao Gao +2 位作者 Shengcheng Wu Shaozhen Li Sujuan Wu 《International Journal of Minerals,Metallurgy and Materials》 SCIE EI CAS CSCD 2024年第4期786-794,共9页
CsPbX_(3)-based(X=I,Br,Cl)inorganic perovskite solar cells(PSCs)prepared by low-temperature process have attracted much attention because of their low cost and excellent thermal stability.However,the high trap state d... CsPbX_(3)-based(X=I,Br,Cl)inorganic perovskite solar cells(PSCs)prepared by low-temperature process have attracted much attention because of their low cost and excellent thermal stability.However,the high trap state density and serious charge recombination between low-temperature processed TiO_(2)film and inorganic perovskite layer interface seriously restrict the performance of all-inorganic PSCs.Here a thin polyethylene oxide(PEO)layer is employed to modify TiO_(2)film to passivate traps and promote carrier collection.The impacts of PEO layer on microstructure and photoelectric characteristics of TiO_(2)film and related devices are systematically studied.Characterization results suggest that PEO modification can reduce the surface roughness of TiO_(2)film,decrease its average surface potential,and passivate trap states.At optimal conditions,the champion efficiency of CsPbI_(2)Br PSCs with PEO-modified TiO_(2)(PEO-PSCs)has been improved to 11.24%from 9.03%of reference PSCs.Moreover,the hysteresis behavior and charge recombination have been suppressed in PEO-PSCs. 展开更多
关键词 polyethylene oxide-modified TiO_(2) film low-temperature process CsPbI_(2)Br-based all-inorganic perovskite solar cells photo-voltaic performance
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p-Si/n-Ga_(2)O_(3)异质结制备与特性研究
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作者 陈沛然 焦腾 +6 位作者 陈威 党新明 刁肇悌 李政达 韩宇 于含 董鑫 《人工晶体学报》 北大核心 2024年第1期73-81,共9页
本实验采用金属有机化学气相沉积(MOCVD)工艺,在p(111)型Si衬底上制备了p-Si/n-Ga_(2)O_(3)结构的PN结。通过X射线衍射仪、原子力显微镜等对样品进行了晶体结构、表面形貌、表面粗糙度等的表征分析;通过磁控溅射与蒸镀方法在样品上生长T... 本实验采用金属有机化学气相沉积(MOCVD)工艺,在p(111)型Si衬底上制备了p-Si/n-Ga_(2)O_(3)结构的PN结。通过X射线衍射仪、原子力显微镜等对样品进行了晶体结构、表面形貌、表面粗糙度等的表征分析;通过磁控溅射与蒸镀方法在样品上生长Ti/Au电极并进行I-V特性曲线、开启电压、开关电流比、反向饱和电流、理想因子、零偏压下的势垒高度等结特性测试,研究了掺杂浓度与薄膜厚度对PN结特性的影响,并对其原因进行了分析;通过二步生长法和缓冲层温度优化实验,减少了Si衬底与β-Ga_(2)O_(3)之间的晶格失配与热失配带来的影响,对薄膜与器件特性进行了优化。最终获得了表面粗糙度最低可达到4.21 nm的高质量n型β-Ga_(2)O_(3)薄膜,以及具有较低理想因子(42.1)的PN结。 展开更多
关键词 β-Ga_(2)O_(3)薄膜 金属有机化学气相沉积 p-Si/n-Ga_(2)O_(3) PN结 晶体质量 电学特性
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Preparation,Characterization and Photothermal Study of PVA/Ti_(2)O_(3) Composite Films
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作者 尚蒙娅 HE Yanyan +3 位作者 YU Jianhui YAN Jiahui XIE Haodi 李金玲 《Journal of Wuhan University of Technology(Materials Science)》 SCIE EI CAS CSCD 2024年第3期658-663,共6页
In this work,flexible photothermal PVA/Ti_(2)O_(3) composite films with different amount(0 wt%,5 wt%,10 wt%,15 wt%)of Ti_(2)O_(3) particles modified by steric acid were prepared by a simple solution casting method.The... In this work,flexible photothermal PVA/Ti_(2)O_(3) composite films with different amount(0 wt%,5 wt%,10 wt%,15 wt%)of Ti_(2)O_(3) particles modified by steric acid were prepared by a simple solution casting method.The microstructures,XRD patterns,FTIR spectra,UV-Vis-NIR spectra thermo-conductivity,thermo-stability and photothermal effects of these composite films were all characterized.These results indicated that Ti_(2)O_(3) particles were well dispersed throughout the polyvinyl alcohol(PVA)matrix in the PVA/Ti_(2)O_(3) composite films.And Ti_(2)O_(3) particles could also effectively improve the photothermal properties of the composite films which exhibited high light absorption and generated a high temperature(about 57.4℃for film with 15 wt%Ti_(2)O_(3) amount)on the surface when it was irradiated by a simulated sunlight source(1 kW/m^(2)). 展开更多
关键词 Ti_(2)O_(3)particles solution casting method composite film photothermal conversion
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Uniform deposition of ultra-thin TiO_(2) film on mica substrate by atmospheric pressure chemical vapor deposition: Effect of precursor concentration 被引量:2
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作者 Ming Liu Ying Li +4 位作者 Rui Wang Guoqiang Shao Pengpeng Lv Jun Li Qingshan Zhu 《Chinese Journal of Chemical Engineering》 SCIE EI CAS CSCD 2023年第8期99-107,共9页
The performance of pearlescent pigment significantly affected by the grain size and the roughness of deposited film. The effect of TiCl_(4) concentration on the initial deposition of TiO_(2) on mica by atmospheric pre... The performance of pearlescent pigment significantly affected by the grain size and the roughness of deposited film. The effect of TiCl_(4) concentration on the initial deposition of TiO_(2) on mica by atmospheric pressure chemical vapor deposition(APCVD) was investigated. The precursor concentration significantly affected the deposition and morphology of TiO_(2) grains assembling the film. The deposition time for fully covering the surface of mica decreased from 120 to 10 s as the TiCl_(4) concentration increased from 0.38%to 2.44%. The grain size increased with the TiCl_(4) concentration. The AFM and TEM analysis demonstrated that the aggregation of TiO_(2) clusters at the initial stage finally result to the agglomeration of fine TiO_(2) grains at high TiCl_(4) concentrations. Following the results, it was suggested that the nucleation density and size was easy to be adjusted when the TiCl_(4) concentration is below 0.90%. 展开更多
关键词 Chemical vapor deposition TiO_(2)thin film Nucleation reaction Precursor concentration Pearlescent pigment
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Enhanced Electrical Properties of Bi_(2−x)Sb_(x)Te_(3) Nanoflake Thin Films Through Interface Engineering
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作者 Xudong Wu Junjie Ding +8 位作者 Wenjun Cui Weixiao Lin Zefan Xue Zhi Yang Jiahui Liu Xiaolei Nie Wanting Zhu Gustaaf Van Tendeloo Xiahan Sang 《Energy & Environmental Materials》 SCIE EI CAS CSCD 2024年第6期359-366,共8页
The structure–property relationship at interfaces is difficult to probe for thermoelectric materials with a complex interfacial microstructure.Designing thermoelectric materials with a simple,structurally-uniform int... The structure–property relationship at interfaces is difficult to probe for thermoelectric materials with a complex interfacial microstructure.Designing thermoelectric materials with a simple,structurally-uniform interface provides a facile way to understand how these interfaces influence the transport properties.Here,we synthesized Bi_(2−x)Sb_(x)Te_(3)(x=0,0.1,0.2,0.4)nanoflakes using a hydrothermal method,and prepared Bi_(2−x)Sb_(x)Te_(3) thin films with predominantly(0001)interfaces by stacking the nanoflakes through spin coating.The influence of the annealing temperature and Sb content on the(0001)interface structure was systematically investigated at atomic scale using aberration-corrected scanning transmission electron microscopy.Annealing and Sb doping facilitate atom diffusion and migration between adjacent nanoflakes along the(0001)interface.As such it enhances interfacial connectivity and improves the electrical transport properties.Interfac reactions create new interfaces that increase the scattering and the Seebeck coefficient.Due to the simultaneous optimization of electrical conductivity and Seebeck coefficient,the maximum power factor of the Bi_(1.8)Sb_(0.2)Te_(3) nanoflake films reaches 1.72 mW m^(−1)K^(−2),which is 43%higher than that of a pure Bi_(2)Te_(3) thin film. 展开更多
关键词 Bi_(2)Te_(3) nanoflakes interface engineering scanning transmission electron microscopy thermoelectric thin film
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Optimal parameter space for stabilizing the ferroelectric phase of Hf_(0.5)Zr_(0.5)O_(2) thin films under strain and electric fields
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作者 王侣锦 王聪 +4 位作者 周霖蔚 周谐宇 潘宇浩 吴幸 季威 《Chinese Physics B》 SCIE EI CAS CSCD 2024年第7期509-517,共9页
Hafnia-based ferroelectric materials, like Hf_(0.5)Zr_(0.5)O_(2)(HZO), have received tremendous attention owing to their potentials for building ultra-thin ferroelectric devices. The orthorhombic(O)-phase of HZO is fe... Hafnia-based ferroelectric materials, like Hf_(0.5)Zr_(0.5)O_(2)(HZO), have received tremendous attention owing to their potentials for building ultra-thin ferroelectric devices. The orthorhombic(O)-phase of HZO is ferroelectric but metastable in its bulk form under ambient conditions, which poses a considerable challenge to maintaining the operation performance of HZO-based ferroelectric devices. Here, we theoretically addressed this issue that provides parameter spaces for stabilizing the O-phase of HZO thin-films under various conditions. Three mechanisms were found to be capable of lowering the relative energy of the O-phase, namely, more significant surface-bulk portion of(111) surfaces, compressive c-axis strain,and positive electric fields. Considering these mechanisms, we plotted two ternary phase diagrams for HZO thin-films where the strain was applied along the in-plane uniaxial and biaxial, respectively. These diagrams indicate the O-phase could be stabilized by solely shrinking the film-thickness below 12.26 nm, ascribed to its lower surface energies. All these results shed considerable light on designing more robust and higher-performance ferroelectric devices. 展开更多
关键词 Hf_(0.5)Zr_(0.5)O_(2) orthorhombic phase ferroelectric films phase stability thickness-dependent ternary phase diagrams
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Thickness effect on solar-blind photoelectric properties of ultrathinβ-Ga_(2)O_(3)films prepared by atomic layer deposition 被引量:1
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作者 王少青 程妮妮 +6 位作者 王海安 贾一凡 陆芹 宁静 郝跃 刘祥泰 陈海峰 《Chinese Physics B》 SCIE EI CAS CSCD 2023年第4期707-713,共7页
Theβ-Ga_(2)O_(3)films with different thicknesses are prepared by an atomic layer deposition system.The influence of film thickness on the crystal quality is obvious,indicating that the thicker films perform better cr... Theβ-Ga_(2)O_(3)films with different thicknesses are prepared by an atomic layer deposition system.The influence of film thickness on the crystal quality is obvious,indicating that the thicker films perform better crystal quality,which is verified from x-ray diffraction(XRD)and scanning electron microscope(SEM)results.The Ga_(2)O_(3)-based solar blind photodetectors with different thicknesses are fabricated and studied.The experimental results show that the responsivity of the photodetectors increases exponentially with the increase of the film thickness.The photodetectors with inter-fingered structure based on 900 growth cyclesβ-Ga_(2)O_(3)active layers(corresponding film thickness of 58 nm)exhibit the best performances including a low dark current of 134 fA,photo-to-dark current ratio of 1.5×10^(7),photoresponsivity of 1.56 A/W,detectivity of 2.77×10^(14)Jones,and external quantum efficiency of 764.49%at a bias voltage of 10 V under 254-nm DUV illumination.The photoresponse rejection ratio(R_(254)/R_(365))is up to 1.86×10^(5).In addition,we find that the photoelectric characteristics also depend on the finger spacing of the MSM structure.As the finger spacing decreases from 50μm to10μW,the photoresponsivity,detectivity,and external quantum efficiency increase significantly. 展开更多
关键词 β-Ga_(2)O_(3) film thickness solar blind photodetectors photoelectric response
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不同介电层对Hf_(x)Zr_(1-x)O_(2)薄膜铁电性能影响的研究进展
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作者 袁晓博 何慧凯 +2 位作者 唐文涛 刘宗芳 苏铭吉 《半导体技术》 CAS 北大核心 2024年第4期297-309,共13页
近年来,铁电Hf_(x)Zr_(1-x)O_(2)(HZO)薄膜受到越来越多的关注,但是铁电层与电极材料层以及铁电层与半导体衬底层之间的界面问题并没有得到解决,阻碍了HZO薄膜的进一步应用。总结了通过引入不同介电层材料,如Al_(2)O_(3)、ZrO_(2)、HfO_... 近年来,铁电Hf_(x)Zr_(1-x)O_(2)(HZO)薄膜受到越来越多的关注,但是铁电层与电极材料层以及铁电层与半导体衬底层之间的界面问题并没有得到解决,阻碍了HZO薄膜的进一步应用。总结了通过引入不同介电层材料,如Al_(2)O_(3)、ZrO_(2)、HfO_(2)、Ta_(2)O_5等,调节HZO薄膜铁电性能的方法及其机理;详细介绍了各种介电层材料作为封盖层对HZO薄膜铁电性能的影响,如对HZO薄膜提供平面内应力、控制铁电层的晶粒尺寸及作为铁电层形核核心的作用;最后,总结并展望了利用介电层调控HZO薄膜铁电性能的一般规律,为后续相关研究的开展提供了指导。 展开更多
关键词 铁电性能 HZO薄膜 介电层 Al_(2)O_(3) ZrO_(2)
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