纳米Ag-TiO_2/SiO_2的制备及其深度处理酿酒废水的研究

以硅胶为载体,采用溶胶凝胶-光还原法制备了掺Ag的TiO2薄膜催化剂(Ag-TiO2/SiO2),再以经厌氧处理后的酿酒废水为对象,考察催化剂的活性和酿酒废水的深度处理效果。实验结果表明:Ag-TiO2/SiO2薄膜具有较强的光催化活性,酿酒废水经光催化降解5h后,其CODCr去除率达87.5%,出水水质达国家(GB 8978-1996)二级排放标准;同时,样品表征结果说明Ag掺杂会促进TiO2由锐钛型向金红石型转变,并使催化剂粒径更小更均匀,催化薄膜与硅胶载体结合更牢固。

SiO_(2)表面金属包覆处理对铜基粉末冶金材料制动摩擦磨损性能的影响

为改善摩擦组元SiO_(2)颗粒与铜基体间界面结合性能,通过表面金属包覆处理的方式制备铜包覆SiO_(2)。分别以铜包覆SiO_(2)和普通SiO_(2)颗粒作为摩擦组元之一,利用SPS烧结技术制备2种铜基粉末冶金摩擦材料。分析2种摩擦材料的微观组织、力学及物理性能,在MM1000-Ⅱ型惯性制动试验台上测试2种摩擦材料的制动摩擦磨损性能,并对2种摩擦材料的摩擦表面及其三维形貌特征、磨屑特征和摩擦表面物相进行微观分析,研究SiO_(2)表面金属包覆处理对制动条件下铜基粉末冶金材料摩擦磨损性能的影响。结果表明:经铜包覆处理的SiO_(2)与Cu基体间的界面结合性能明显改善,提高了材料的硬度、致密度及导热系数,特别是导热系数得到了显著提升;随着制动初速度的升高,2种摩擦材料的平均摩擦因数均呈现先上升后下降的趋势;在相同的制动条件下,与含普通SiO_(2)材料相比,除了制动压力为0.8 MPa、制动初速度为100 km/h外,在其他各制动条件下含铜包覆SiO_(2)材料具有较高的平均摩擦因数和较低的磨损率,且其摩擦表面更为平整;提高制动初速度均能够促进2种摩擦材料表面形成以氧化膜为主的摩擦膜,且含铜包覆SiO_(2)材料的摩擦膜更均匀,因而保护作用更好,即磨损率低。

Microstructures and magnetic properties of [SiO_2/FePt]_5/Ag thin films

[SiO2/FePt]5/Ag thin films were deposited by RF magnetron sputtering on the glass substrates and post annealing at 550 ℃ for 30 min in vacuum. Vibrating sample magnetometer and X-ray diffraction analyser were applied to study the magnetic properties and microstructures of the films. The results show that without Ag underlayer [SiO2/FePt]5 films deposited onto the glass are FCC disordered; with the addition of Ag underlayer [SiO]FePt]5/Ag films are changed into L10 and （111） mixed texture. The variation of the SiO2 nonmagnetic layer thickness in [SiO2/FePt]5/Ag films indicates that SiO2-doping plays an important role in improving the order parameter and the perpendicular magnetic anisotropy, and reducing the grain size and intergrain interactions. By controlling SiO2 thickness the highly perpendicular magnetic anisotropy can be obtained in the [SiO2 （0.6 nm）/FePt （3 nm）]5/Ag （50 nm） films and highly （001）-oriented films can be obtained in the [SiO2 （2 nm）/FePt （3 nm）]5/Ag （50 nm） films.

Controlling Shell Thickness of PS/SiO_2 Core-Shell Particles and Their Crystallization into 3-D Ordered Thin Film

PS/SiO2 particles with core-shell structure were synthesized by coating silica on surface of polystyrene(PS) colloidal particles.The reaction parameters,such as initial tetraethyl orthosilicate(TEOS) concentration,water concentration and reaction temperature,have been investigated to control the thickness of silica shells.The shell thickness was prepositional to the square root of the initial concentration of TEOS and first increased with increasing water concentration,reached a maximum at about 2.0 mol/L and then started decreasing beyond that concentration.It was also found that the shell thickness decreased firstly with the reaction temperature added,then tended to a constant.The so-synthesized PS/SiO2 core-shell particles were directly crystallized into 3-D ordered thin film,then sintered at 570℃ into the ordered macroporous thin film.Compared with the conditional method,the present approach avoids repeatedly filling the precursor in the templetes and save time more.

Laser-induced damage threshold in HfO_2/SiO_2 multilayer films irradiated by β-ray

Post-processing can effectively improve the resistance to laser damage in multilayer films used in a high power laser system. In this work, HfO_2/SiO_2 multilayer films are prepared by e-beam evaporation and then β-ray irradiation is employed as the post-processing method. The particle irradiation affects the laser induced damage threshold(LIDT),which includes defects, surface roughness, packing density and residual stress. The residual stress that is relaxed during irradiation changes from compressive stress into tensile stress. Our results indicate that appropriate tensile stress can improve LIDT remarkably. In view of the fact that LIDT rises from 8 J/cm^2 to 12 J/cm^2, i.e., 50% increase, after the film has been irradiated by 2.2×10^(13)/cm^2 β-ray, the particle irradiation can be used as a controllable and desirable postprocessing method to improve the resistance to laser induced damage.

Optical and Magnetic Properties of Fe_2O_3/SiO_2 Nano-composite Films

Fe2O3/SiO2 nano-composite films were prepared by sol-gel technique combining heat treatment in the range of 100-900 ℃. The particle size was observed by FE-SEM. Optical properties of the films were investigated by UV-visible spectra. Structural and magnetic characteristics were investigated through FT-IR and VSM. The transparency of the Fe2O3/SiO2 nano-composite films decreased with the content of the Fe2O3. Water and organic solvent in the films were evaporated with heat treatment, so the transparency of the films was enhanced under high temperature. It is also found that the saturation magnetization （Ms） of the films increases with the temperature. As the content of the Fe2O3 increases, when the content of the Fe2O3 is around 30wt%, the Ms of the films has a maximum value.

The effects of radiation damage on power VDMOS devices with composite SiO_2-Si_3N_4 films

Total dose effects and single event effects on radiation-hardened power vertical double-diffusion metal oxide semiconductor（VDMOS） devices with composite SiO2-Si3N4 film gates are investigated.The relationships among the important electrical parameters of the samples with different thickness SiO2-Si3N4 films,such as threshold voltage,breakdown voltage,and on-state resistance in accumulated dose,are discussed.The total dose experiment results show that the breakdown voltage and the on-state resistance barely change with the accumulated dose.However,the relationships between the threshold voltages of the samples and the accumulated dose are more complex,and not only positively drift,but also negatively drift.At the end of the total dose experiment,we select the group of samples which have the smaller threshold voltage shift to carry out the single event effect studies.We find that the samples with appropriate thickness ratio SiO2-Si3N4 films have a good radiation-hardening ability.This method may be useful in solving both the SEGR and the total dose problems with the composite SiO2-Si3N4 films.

Enhanced nonlinear optical absorption of Au/SiO_2 nano-composite thin films

Nano metal-particle dispersed glasses are the attractive candidates for nonlinear optical material applications. Au/SiO2 nano-composite thin films with 3 vol% to 65 vol% Au are prepared by inductively coupled plasma sputtering. Au particles as perfect spheres with diameters between 10 nm and 30 nm are uniformly dispersed in the SiO2 matrix. Optical absorption peaks due to the surface plasmon resonance of Au particles are observed. The absorption property is enhanced with the increase of Au content, showing a maximum value in the films with 37 vol% Au. The absorption curves of the Au/SiO2 thin films with 3 vol% to 37 vol% Au accord well with the theoretical optical absorption spectra obtained from Mie resonance theory. Increasing Au content over 37 vol% results in the partial connection of Au particles, whereby the intensity of the absorption peak is weakened and ultimately replaced by the optical absorption of the bulk. The band gap decreases with Au content increasing from 3 vol% to 37 vol % but increases as Au content further increases.

Morphology and Structure of SiO_2 Film Using Thermal Oxidation Process on(111)Silicon Crystals in Dry Oxygen Atmosphere

By means of scanning electron microscope(SEM)and high voltage electron microscope(HVEM)we have observed and analysed morphology and micro-structure of silicon oxide film with different thickness formed on(111)silicon monocrystal under dry oxygen atmosphere at 1100℃.Compared with their oxidation kinetic curves consisted of three stages,we suggested a mechanism on forming silicon oxide film.According to electron and X-ray diffraction analyses the silicon oxide films consisted of silica with different crystal structure.We also have discussed a stacking fault and a dislocation formed in the Si-Sio_2 interface region simulaneously forming silicon oxide film.

Crystallization Process of Superlattice-Like Sb/SiO_2 Thin Films for Phase Change Memory Application

After compositing with SiO_2 layers, it is shown that superlattice-like Sb/SiO_2 thin films have higher crystallization temperature（~240°C）, larger crystallization activation energy（6.22 e V）, and better data retention ability（189°C for 10 y）. The crystallization of Sb in superlattice-like Sb/SiO_2 thin films is restrained by the multilayer interfaces. The reversible resistance transition can be achieved by an electric pulse as short as 8 ns for the Sb（3 nm）/SiO_2（7 nm）-based phase change memory cell. A lower operation power consumption of 0.09 m W and a good endurance of 3.0 × 10~6 cycles are achieved. In addition, the superlattice-like Sb（3 nm）/SiO_2（7 nm） thin film shows a low thermal conductivity of 0.13 W/（m·K）.

Study of SiO_2 Films Prepared by Electron CyclotronResonant Microwave Plasma

Microwave electron cyclotron resonance plasma enhanced chemical vapor depositionwas used to grow silicon dioxide films on crystalline silicon substrate for planar optical waveguides.The relationship between plasma parameters and deposition rates was investigated, and the influ-ence of radio frequency substrate bias on properties of SiO2 films was also preliminarily studied.X-ray photoelectron spectroscopy, Fourier transform infrared spectroscopy, scanning electron mi-croscopy, atomic force microscopy and elllipsometry were used to characterize the deposited films,showing that SiO2 films with good structural and optical properties prepared at low temperaturehave been achieved. They can basically meet the requirements of integrated optical waveguides.

Fe^(3+)-TiO_2/SiO_2光催化降解罗丹明B的研究

以硅胶为载体 ,采用溶胶 -凝胶法制备了不同掺杂量的 Fe3 +-Ti O2 /Si O2 光催化剂 ,并采用 SEM,Raman和 DRS等手段对其进行了分析和表征 .以氙灯为光源 ,通过对可溶性染料罗丹明 B的降解反应 ,考察了 Fe3 +-Ti O2 /Si O2 催化剂的光催化活性 ,探讨了光催化反应中溶液 p H值和起始浓度对催化反应的影响 .

超亲水TiO_2和TiO_2-SiO_2表面的动态润湿性

The dynamic wetting of water spreading on TiO 2 and TiO 2 SiO 2 films prepared by sol gel method and subsequently treated by air plasma and UV irradiation was investigated. Water completely spread on TiO 2 surface within 3 s and its dynamic contact angles can be expressed by a power law θ d= k(t+a) -n with the n value 0.98. Less than 50%(molar fraction) SiO 2 addition can accelerate the dynamic water spreading rate on the TiO 2 SiO 2 films and the optimum molar fraction of SiO 2 amount corresponding to as annealed, air plasma, and UV irradiation treatment process is 15%, 10% and 20%, respectively.

热处理对离子束溅射SiO_2薄膜结构特性的影响分析

采用离子束溅射沉积技术,在熔融石英基底上制备了SiO2薄膜,研究了热处理对离子束溅射SiO2薄膜结构特性的影响。热处理温度对表面粗糙度影响较大,低温热处理可降低表面粗糙度,高温热处理则增大表面粗糙度,选择合适的热处理温度,可以使表面粗糙度几乎不变。采用X射线衍射仪(XRD)物相分析方法,分析了热处理对离子束溅射SiO2薄膜的无定形结构特性的影响,当退火温度为550℃,离子束溅射SiO2薄膜的短程有序范围最大、最近邻原子平均距离最小,与熔融石英基底很接近,结构稳定。实验结果表明,采用合适的热处理温度,能大大改善离子束溅射SiO2薄膜的结构特性。

SiO_2纳米粉掺杂对薄膜光催化剂结构和活性的影响

针对固定膜光催化剂吸附能力差的缺陷 ,在催化剂的涂覆溶胶中掺杂具有较大比表面积的SiO2 纳米粉制备了一种新的TiO2 薄膜 .通过X射线衍射 (XRD)、扫描电镜 (TEM)和红外光谱 (FTIR)等手段对催化剂进行表征发现 ,催化剂的晶相以锐钛矿为主 ,并含有少量的金红石 ,平均晶粒尺寸为 2 7nm左右 .其中掺杂的SiO2 以十几到几十纳米的无定型团簇形式分散于薄膜中 ,除了能增大薄膜的表面积外 ,对TiO2 的晶体结构和表面基团等性质几乎没有影响 .光催化降解试验表明 ,SiO2 掺杂后薄膜的活性大大改善 ,并受掺杂SiO2 的原始粒径和掺杂量影响很大 .此外 ,该催化剂还具有很好的稳定性 ,在连续 3 0多天的使用中 ,对活性艳红X 3B的去除率一直维持在80 %左右 ,活性未见降低 .

纳米Ag—TiO_2/SiO_2薄膜催化剂的制备及其性能研究

以硅胶为载体,采用溶胶凝胶—光还原法制备了掺杂Ag的TiO2薄膜催化剂(Ag—TiO2/SiO2);以甲基橙为目标降解物,对其光催化活性进行了考察。实验结果表明,Ag改性的TiO2/SiO2薄膜光催化性能是未改性催化剂性能的2.06倍。以XRD、SEM、BET等手段进行表征,结果表明Ag的掺杂会促进薄膜催化剂中的TiO2由锐钛型向金红石型转变,同时Ag对电子的捕获使电子—空穴对有效分离,导致了其催化活性的提高。

TiO_2-SiO_2系统凝胶玻璃薄膜折射率的研究

应用光度法研究了溶胶 凝胶系统组成、热处理温度对TiO2 SiO2 系统凝胶玻璃薄膜折射率的影响规律。随薄膜中TiO2 含量的增加以及热处理温度的升高 ,薄膜的折射率逐渐增大。通过调整TiO2 SiO2 系统的组成及适当的热处理温度 ,可实现TiO2 SiO2 系统薄膜折射率在 1.5～ 2 .

ZrO_2-SiO_2膜的制备和结构研究

以正硅酸乙酯和氧氯化锆为原料 ,用溶胶 -凝胶法制备了无支撑ZrO2 -SiO2 膜。应用DTA -TG、XRD、SEM和BET等测试技术对无支撑ZrO2 -SiO2 膜的结构、表面形貌和孔径进行了表征 ,结果表明ZrO2 -SiO2 凝胶膜虽在 46 7℃开始出现少量单斜ZrO2 ,但在 5 0 0℃和 12 0 0℃热处理后的主晶相均为四方ZrO2 ,显然SiO2 的存在阻碍了四方相ZrO2 向单斜相ZrO2 转变的过程 ,ZrO2 -SiO2 膜具有比ZrO2 膜更高的热稳定性 ,在95 0℃烧结的无支撑ZrO2 -SiO2 膜孔径稍呈双峰分布 ,其最可几孔径为 3 .3 5nm。

SiO_2溶胶及其静电自组装薄膜的制备

采用HCl催化、NH3 ·H2 O催化、HCl与NH3 ·H2 O分步催化三种途径制备了SiO2 胶体 ,用透射电镜观察了胶体粒子的形貌 .用静电自组装 (ESAM)法制备了聚电解质PDDA与SiO2 胶体粒子的有机 /无机复合光学薄膜 .实验结果表明 ,用HCl催化制备的SiO2 透明溶胶不适合于用ESAM法制备薄膜 ,用HCl与NH3 ·H2 O分步催化以及用NH3 ·H2 O单独催化制备的SiO2 胶体适合于用ESAM法制备光学薄膜 .薄膜的透射电镜微观察结果表明 ,以HCl与NH3 ·H2 O分步催化的SiO2 胶体制备的PDDA/SiO2 薄膜为连续结构 ,NH3 ·H2 O单独催化的为颗粒堆积 .研究了薄膜透光率与薄膜层数的关系 ,考察了薄膜的机械强度 .结果显示 ,以NH3 ·H2 O单独催化的SiO2 胶体制备的光学薄膜的增透效果较好 。