China has had 30 years experience in titanium research,development,production and appli-cation so far.It was really a rough and bumpy road for developing Ti working industry,however,since a large amount of work was do...China has had 30 years experience in titanium research,development,production and appli-cation so far.It was really a rough and bumpy road for developing Ti working industry,however,since a large amount of work was done and great many achievements were obtained by the scien-tists and engineers in this field,a firm base of Ti working industry has been established in China atlast.Especially since the beginning of 1980 s,it has been developed to a new level.On these bases,afavourable condition to speed up the development of Ti working industry arises in China.展开更多
Hangzhou Kelida Fabric Products Co.,Ltd is located in Yuhang RenHe , a cradle of Liangzhu Culture. Developed from Hangzhou Kelida Textile Mill Co.,Ltd , and as the National Fabric developing base, Kelida has imported ...Hangzhou Kelida Fabric Products Co.,Ltd is located in Yuhang RenHe , a cradle of Liangzhu Culture. Developed from Hangzhou Kelida Textile Mill Co.,Ltd , and as the National Fabric developing base, Kelida has imported more than 70 SMITG6300S360 jacquard looms from Italy, and STAWBLI2688展开更多
Products made by Raschel Jacquard(RSJ)high-speed jacquard warp knitting machine are used in ornament and apparel fabrics.However,most products are produced according to the existing samples.The capability of creative ...Products made by Raschel Jacquard(RSJ)high-speed jacquard warp knitting machine are used in ornament and apparel fabrics.However,most products are produced according to the existing samples.The capability of creative design is not enough at home.In this paper,based on the basic features,the knitting methods and the working principles of warp knitting jacquard machines,the rules for manufacturing jacquard products are summarized.The article provides the new thoughts for the development of fabrics,such as the pattern design,changing the cams,power-net and a special technology of without pillar,which were obtained from the practices in a factory.展开更多
Various types of rib and interlock fabrics found in the market depend on their structure such as 1 × 1 rib, 2 × 1 rib, 2 × 2 rib, 3 × 1 rib, 3 × 2 rib, 4 × 1 rib, 4 × 4 rib and 1 ...Various types of rib and interlock fabrics found in the market depend on their structure such as 1 × 1 rib, 2 × 1 rib, 2 × 2 rib, 3 × 1 rib, 3 × 2 rib, 4 × 1 rib, 4 × 4 rib and 1 × 1 interlock, 2 × 2 interlock etc. These all types of fabric can be possible to knit in circular knitting machine after machine setting. When these fabrics are knit on the machine, some needles are needed to drop or withdrawn from needle groove according to their design such as 1 × 1, 2 × 1, 2 × 2 etc. Due to needle dropping or withdrawing production per hour will changed as production per hour directly depends on the No. of active needle. No. of needle or active needle depends on machine gauge. This paper gives a new approach for machine gauge which is somewhat different from other thinking. This paper also shows the production calculation formula with their machine setting for various rib and interlock fabric with their derivation. By this paper, one can easily understood about machine gauge and calculated production of any type of rib and interlock knitted structure. Complexity of calculating production can be reduced by this paper.展开更多
The International Textile Manufacturers Federation (ITMF) released its latest STATE OF TRADE REPORT Q2/2010, indicating that the strong global recovery in yarn and fabric production since their recent lows in the firs...The International Textile Manufacturers Federation (ITMF) released its latest STATE OF TRADE REPORT Q2/2010, indicating that the strong global recovery in yarn and fabric production since their recent lows in the first quarter of 2009 continued also into the second quarter of 2010. Besides, all regions contribute to the continued recovery.展开更多
Direct synthesis of graphene on nonmetallic substrates via chemical vapor deposition (CVD) has become a frontier research realm targeting transfer-free applications of CVD graphene.However,the stable mass production o...Direct synthesis of graphene on nonmetallic substrates via chemical vapor deposition (CVD) has become a frontier research realm targeting transfer-free applications of CVD graphene.However,the stable mass production of graphene with a favorable growth rate and quality remains a grand challenge.Herein,graphene glass fiber fabric (GGFF) was successfully developed through the controllable growth of graphene on non-catalytic glass fiber fabric,employing a synergistic binary-precursor CVD strategy to alleviate the dilemma between growth rate and quality.The binary precursors consisted of acetylene and acetone,where acetylene with high decomposition efficiency fed rapid graphene growth while oxygencontaining acetone was adopted for improving the layer uniformity and quality.Notably,the bifurcating introducing-confluent premixing (BI-CP) system was self-built for the controllable introduction of gas and liquid precursors,enabling the stable production of GGFF.GGFF features solar absorption and infrared emission properties,based on which the self-adaptive dual-mode thermal management film was developed.This film can automatically switch between heating and cooling modes by spontaneously perceiving the temperature,achieving excellent thermal management performances with heating and cooling power of~501.2 and~108.6 W m-2,respectively.These findings unlock a new strategy for the large-scale batch production of graphene materials and inspire advanced possibilities for further applications.展开更多
Electron beam lithography(EBL)involves the transfer of a pattern onto the surface of a substrate byfirst scanning a thin layer of organicfilm(called resist)on the surface by a tightly focused and precisely controlled el...Electron beam lithography(EBL)involves the transfer of a pattern onto the surface of a substrate byfirst scanning a thin layer of organicfilm(called resist)on the surface by a tightly focused and precisely controlled electron beam(exposure)and then selectively removing the exposed or nonexposed regions of the resist in a solvent(developing).It is widely used for fabrication of integrated cir-cuits,mask manufacturing,photoelectric device processing,and otherfields.The key to drawing circular patterns by EBL is the graphics production and control.In an EBL system,an embedded processor calculates and generates the trajectory coordinates for movement of the electron beam,and outputs the corresponding voltage signal through a digital-to-analog converter(DAC)to control a deflector that changes the position of the electron beam.Through this procedure,it is possible to guarantee the accuracy and real-time con-trol of electron beam scanning deflection.Existing EBL systems mostly use the method of polygonal approximation to expose circles.A circle is divided into several polygons,and the smaller the segmentation,the higher is the precision of the splicing circle.However,owing to the need to generate and scan each polygon separately,an increase in the number of segments will lead to a decrease in the overall lithography speed.In this paper,based on Bresenham’s circle algorithm and exploiting the capabilities of afield-programmable gate array and DAC,an improved real-time circle-producing algorithm is designed for EBL.The algorithm can directly generate cir-cular graphics coordinates such as those for a single circle,solid circle,solid ring,or concentric ring,and is able to effectively realizes deflection and scanning of the electron beam for circular graphics lithography.Compared with the polygonal approximation method,the improved algorithm exhibits improved precision and speed.At the same time,the point generation strategy is optimized to solve the blank pixel and pseudo-pixel problems that arise with Bresenham’s circle algorithm.A complete electron beam deflection system is established to carry out lithography experiments,the results of which show that the error between the exposure results and the preset pat-terns is at the nanometer level,indicating that the improved algorithm meets the requirements for real-time control and high precision of EBL.展开更多
文摘China has had 30 years experience in titanium research,development,production and appli-cation so far.It was really a rough and bumpy road for developing Ti working industry,however,since a large amount of work was done and great many achievements were obtained by the scien-tists and engineers in this field,a firm base of Ti working industry has been established in China atlast.Especially since the beginning of 1980 s,it has been developed to a new level.On these bases,afavourable condition to speed up the development of Ti working industry arises in China.
文摘Hangzhou Kelida Fabric Products Co.,Ltd is located in Yuhang RenHe , a cradle of Liangzhu Culture. Developed from Hangzhou Kelida Textile Mill Co.,Ltd , and as the National Fabric developing base, Kelida has imported more than 70 SMITG6300S360 jacquard looms from Italy, and STAWBLI2688
文摘Products made by Raschel Jacquard(RSJ)high-speed jacquard warp knitting machine are used in ornament and apparel fabrics.However,most products are produced according to the existing samples.The capability of creative design is not enough at home.In this paper,based on the basic features,the knitting methods and the working principles of warp knitting jacquard machines,the rules for manufacturing jacquard products are summarized.The article provides the new thoughts for the development of fabrics,such as the pattern design,changing the cams,power-net and a special technology of without pillar,which were obtained from the practices in a factory.
文摘Various types of rib and interlock fabrics found in the market depend on their structure such as 1 × 1 rib, 2 × 1 rib, 2 × 2 rib, 3 × 1 rib, 3 × 2 rib, 4 × 1 rib, 4 × 4 rib and 1 × 1 interlock, 2 × 2 interlock etc. These all types of fabric can be possible to knit in circular knitting machine after machine setting. When these fabrics are knit on the machine, some needles are needed to drop or withdrawn from needle groove according to their design such as 1 × 1, 2 × 1, 2 × 2 etc. Due to needle dropping or withdrawing production per hour will changed as production per hour directly depends on the No. of active needle. No. of needle or active needle depends on machine gauge. This paper gives a new approach for machine gauge which is somewhat different from other thinking. This paper also shows the production calculation formula with their machine setting for various rib and interlock fabric with their derivation. By this paper, one can easily understood about machine gauge and calculated production of any type of rib and interlock knitted structure. Complexity of calculating production can be reduced by this paper.
文摘The International Textile Manufacturers Federation (ITMF) released its latest STATE OF TRADE REPORT Q2/2010, indicating that the strong global recovery in yarn and fabric production since their recent lows in the first quarter of 2009 continued also into the second quarter of 2010. Besides, all regions contribute to the continued recovery.
基金National Natural Science Foundation of China (52272032, T2188101, and 52021006)Beijing Nova Program of Science and Technology (20220484079)。
文摘Direct synthesis of graphene on nonmetallic substrates via chemical vapor deposition (CVD) has become a frontier research realm targeting transfer-free applications of CVD graphene.However,the stable mass production of graphene with a favorable growth rate and quality remains a grand challenge.Herein,graphene glass fiber fabric (GGFF) was successfully developed through the controllable growth of graphene on non-catalytic glass fiber fabric,employing a synergistic binary-precursor CVD strategy to alleviate the dilemma between growth rate and quality.The binary precursors consisted of acetylene and acetone,where acetylene with high decomposition efficiency fed rapid graphene growth while oxygencontaining acetone was adopted for improving the layer uniformity and quality.Notably,the bifurcating introducing-confluent premixing (BI-CP) system was self-built for the controllable introduction of gas and liquid precursors,enabling the stable production of GGFF.GGFF features solar absorption and infrared emission properties,based on which the self-adaptive dual-mode thermal management film was developed.This film can automatically switch between heating and cooling modes by spontaneously perceiving the temperature,achieving excellent thermal management performances with heating and cooling power of~501.2 and~108.6 W m-2,respectively.These findings unlock a new strategy for the large-scale batch production of graphene materials and inspire advanced possibilities for further applications.
基金supported by the Focused Ion Beam/Electron Beam Double Beam Microscopy(Grant No.2021YFF0704702).
文摘Electron beam lithography(EBL)involves the transfer of a pattern onto the surface of a substrate byfirst scanning a thin layer of organicfilm(called resist)on the surface by a tightly focused and precisely controlled electron beam(exposure)and then selectively removing the exposed or nonexposed regions of the resist in a solvent(developing).It is widely used for fabrication of integrated cir-cuits,mask manufacturing,photoelectric device processing,and otherfields.The key to drawing circular patterns by EBL is the graphics production and control.In an EBL system,an embedded processor calculates and generates the trajectory coordinates for movement of the electron beam,and outputs the corresponding voltage signal through a digital-to-analog converter(DAC)to control a deflector that changes the position of the electron beam.Through this procedure,it is possible to guarantee the accuracy and real-time con-trol of electron beam scanning deflection.Existing EBL systems mostly use the method of polygonal approximation to expose circles.A circle is divided into several polygons,and the smaller the segmentation,the higher is the precision of the splicing circle.However,owing to the need to generate and scan each polygon separately,an increase in the number of segments will lead to a decrease in the overall lithography speed.In this paper,based on Bresenham’s circle algorithm and exploiting the capabilities of afield-programmable gate array and DAC,an improved real-time circle-producing algorithm is designed for EBL.The algorithm can directly generate cir-cular graphics coordinates such as those for a single circle,solid circle,solid ring,or concentric ring,and is able to effectively realizes deflection and scanning of the electron beam for circular graphics lithography.Compared with the polygonal approximation method,the improved algorithm exhibits improved precision and speed.At the same time,the point generation strategy is optimized to solve the blank pixel and pseudo-pixel problems that arise with Bresenham’s circle algorithm.A complete electron beam deflection system is established to carry out lithography experiments,the results of which show that the error between the exposure results and the preset pat-terns is at the nanometer level,indicating that the improved algorithm meets the requirements for real-time control and high precision of EBL.
