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ZnO Films Synthesized by Solid-Source Chemical Vapor Deposition with c-Axis Parallel to Substrate 被引量:7
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作者 吕建国 叶志镇 +2 位作者 张银珠 黄靖云 赵炳辉 《Journal of Semiconductors》 EI CAS CSCD 北大核心 2003年第1期1-5,共5页
ZnO films with c -axis parallel to the substrate are reported.ZnO films are synthesized by solid-source chemical vapor deposition,a novel CVD technique,using zinc acetate dihydrate (solid) as the source material.The p... ZnO films with c -axis parallel to the substrate are reported.ZnO films are synthesized by solid-source chemical vapor deposition,a novel CVD technique,using zinc acetate dihydrate (solid) as the source material.The properties are characterized by X-ray diffraction,atomic force microscopy and transmission spectra.The parallel oriented ZnO films with mixed orientation for (100) and (110) planes are achieved on glass at the substrate temperature of 200℃ and the source temperature of 280℃,and a qualitative explanation is given for the forming of the mixed orientation.AFM images show that the surface is somewhat rough for the parallel oriented ZnO films.The transmission spectrum exhibits a high transmittance of about 85% in the visible region and shows an optical band gap about 3.25eV at room temperature. 展开更多
关键词 zno films SS-CVD mixed orientation c -axis parallel to the substrate
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Influence of Argon Gas Pressure on the ZnO:Al Films Deposited on Flexible TPT Substrates at Room Temperature by Magnetron Sputtering 被引量:1
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作者 王晓晶 周文利 《Journal of Wuhan University of Technology(Materials Science)》 SCIE EI CAS 2011年第1期52-55,共4页
Aluminium doped ZnO thin films(ZnO︰Al) were deposited on transparent polymer substrates at room temperature by rf magnetron sputtering method from a ZnO target with Al2O3 of 2.0 wt%. Argon gas pressure varied from ... Aluminium doped ZnO thin films(ZnO︰Al) were deposited on transparent polymer substrates at room temperature by rf magnetron sputtering method from a ZnO target with Al2O3 of 2.0 wt%. Argon gas pressure varied from 0.5 Pa to 2.5 Pa with radio frequency power of 120 W. XRD results showed that all the ZnO︰Al films had a polycrystalline hexagonal structure and a (002) preferred orientation with the c-axis perpendicular to the substrate. The grain sizes of the films were 6.3-14.8 nm.SEM images indicated the ZnO︰Al film with low Argon gas pressure was denser and the deposition rate of the films depended strongly on the Argon gas pressure, increasing firstly and then decreasing with increasing the pressure. The highest deposition rate was 5.2 nm/min at 1 Pa. The optical transmittance of the ZnO︰Al films increased and the blue shift of the absorption edge appeared when the Argon gas pressure increased. The highest transmittance of obtained ZnO︰Al films at 2.5 Pa was about 85% in the visible region. The electrical properties of the films were worsened with the increase of the Argon gas power from 1 Pa to 2.5 Pa. The resistivity of obtained film at 1.0 Pa was 2.79×10-2 Ω·cm. 展开更多
关键词 al-doped zno zno︰Al) flexible substrate magnetron sputtering argon gas pressure structure and properties
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Seed Free Growth of Aligned ZnO Nanowire Arrays on AZO Substrate 被引量:1
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作者 LIU Liqing CAO Guangxia HONG Kunquan 《Journal of Wuhan University of Technology(Materials Science)》 SCIE EI CAS 2018年第6期1372-1375,共4页
In the absence of commonly used seed layer, we can still successfully synthesized aligned ZnO nanowire arrays by the hydrothermal method. By using aluminum-doped zinc oxide(AZO) glass as a substrate, high-density and ... In the absence of commonly used seed layer, we can still successfully synthesized aligned ZnO nanowire arrays by the hydrothermal method. By using aluminum-doped zinc oxide(AZO) glass as a substrate, high-density and vertically aligned ZnO nanowires were synthesized directly on the substrate in the absence of the ZnO seed layer. The current-voltage curve indicated that the sample grown on AZO glass substrate in the absence of seed layer possesses better conductivity than that synthesized on FTO glass substrate with ZnO seed layer. Thus, a simplified, seed-free and low-cost experimental protocol was reported here for large-scale production of high quality ZnO nanowire arrays with promoted conductivity. 展开更多
关键词 zno nanowire arrays seed layer free AZO substrate CONDUCTIVITY
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Surface Acoustic Wave Humidity Sensors Based on(1120) ZnO Piezoelectric Films Sputtered on R-Sapphire Substrates 被引量:3
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作者 王艳 张淑仪 +2 位作者 范理 水修基 杨跃涛 《Chinese Physics Letters》 SCIE CAS CSCD 2015年第8期123-126,共4页
ZnO films on R-sapphire substrates are prepared and characterized by x-ray diffraction and scanning electron microscopy, which indicate that the thin films are well crystallized with (1120) texture. Love wave and Ra... ZnO films on R-sapphire substrates are prepared and characterized by x-ray diffraction and scanning electron microscopy, which indicate that the thin films are well crystallized with (1120) texture. Love wave and Rayleigh wave are used for fabrications of humidity sensors, which are excited in [1100] and [0001] directions of the (1120) ZnO piezoelectric films, respectively. The experimental results show that both kinds of sensors have good humidity response and repeatability, and the performances of the Love wave sensors are better than those of the Rayleigh wave sensors at room temperature. Moreover, the theoretical calculations of the mass sensitivity of the sensors are a/so carried out and the calculated results are in good agreement with the experimental measurements. 展开更多
关键词 zno Piezoelectric Films Sputtered on R-Sapphire substrates Surface Acoustic Wave Humidity Sensors Based on
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Optical and Micro-Structural Properties of ZnO Thin Films Grown on Silicon Substrate by Pulsed Laser Deposition
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作者 He Jianting Zhuang Huizhao Xue Chengshan Tian Deheng Wu Yuxin Xue Shoubin Hu Lijun 《Journal of Rare Earths》 SCIE EI CAS CSCD 2006年第z1期26-28,共3页
ZnO thin films were deposited on n-Si (111) at various substrate temperatures and oxygen pressures by pulsed laser deposition (PLD) using a Nd∶YAG laser with the wavelength of 1064 nm. X-ray diffraction (XRD), photol... ZnO thin films were deposited on n-Si (111) at various substrate temperatures and oxygen pressures by pulsed laser deposition (PLD) using a Nd∶YAG laser with the wavelength of 1064 nm. X-ray diffraction (XRD), photoluminescence (PL), scanning electron microscopy (SEM) and transmission electron microscopy (TEM) were used to analyze the microstructure, optical property and morphology of the ZnO thin films. A comparatively optimal crystallized ZnO thin film was obtained at the substrate temperature of 600 ℃ in oxygen pressure of 50 mTorr. The intensity of the luminescence strongly depends on the stoichiometry of the film as well as the crystalline quality. 展开更多
关键词 PLD zno substrate temperature OXYGEN pressure
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AlGaN/GaN high-electron-mobility transistors with transparent gates by Al-doped ZnO
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作者 王冲 何云龙 +3 位作者 郑雪峰 马晓华 张进成 郝跃 《Chinese Physics B》 SCIE EI CAS CSCD 2013年第6期642-645,共4页
AlGaN/GaN high-electron-mobility transistors (HEMTs) with Al-doped ZnO (AZO) transparent gate electrodes are fabricated, and Ni/Au/Ni-gated HEMTs are produced in comparison. The AZO-gated HEMTs show good DC charac... AlGaN/GaN high-electron-mobility transistors (HEMTs) with Al-doped ZnO (AZO) transparent gate electrodes are fabricated, and Ni/Au/Ni-gated HEMTs are produced in comparison. The AZO-gated HEMTs show good DC characteristics and Schottky rectifying characteristics, and the gate electrodes achieve excellent transparencies. Compared with Ni/Au/Ni-gated HEMTs, AZO-gated HEMTs show a low saturation current, high threshold voltage, high Schottky barrier height, and low gate reverse leakage current. Due to the higher gate resistivity, AZO-gated HEMTs exhibit a current-gain cutoff frequency (fT) of 10 GHz and a power gain cutoff frequency (fmax) of 5 GHz, and lower maximum oscillation frequency than Ni/Au/Ni-gated HEMTs. Moreover, the C-V characteristics are measured and the gate interface characteristics of the AZO-gated devices are investigated by a C-V dual sweep. 展开更多
关键词 ALGAN/GAN high-electron-mobility transistor al-doped zno
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Surface properties of Al-doped ZnO thin film before and after CF_4/Ar plasma etching
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作者 Young-Hee JOO Gwan-Ha KIM +1 位作者 Doo-Seung UM Chang-Il KIM 《Plasma Science and Technology》 SCIE EI CAS CSCD 2022年第7期194-200,共7页
Al-doped ZnO(AZO) is considered as an alternative to transparent conductive oxide materials.Patterning and achieving a stable surface are important challenges in the development and optimization of dry etching process... Al-doped ZnO(AZO) is considered as an alternative to transparent conductive oxide materials.Patterning and achieving a stable surface are important challenges in the development and optimization of dry etching processes, which must be overcome for the application of AZO in various devices. Therefore, in this study, the etch rate and surface properties of an AZO thin film after plasma etching using the adaptive coupled plasma system were investigated. The fastest etch rate was achieved with a CF_(4)/Ar ratio of 50:50 sccm. Regardless of the ratio of CF_(4) to Ar,the transmittance of the film in the visible region exceeded 80%. X-ray photoelectron spectroscopy analysis of the AZO thin film confirmed that metal-F bonding persists on the surface after plasma etching. It was also shown that F eliminates O vacancies. Consequently, the work function and bandgap energy increased as the ratio of CF-4 increased. This study not only provides information on the effect of plasma on AZO thin film, but identifies the cause of changes in the device characteristics during device fabrication. 展开更多
关键词 al-doped zno plasma etching F-based plasma surface characteristics X-ray photoelectron spectroscopy ultraviolet photoelectron spectroscopy
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Effects of Substrate Temperature on Properties for Transparent Conducting ZnO:A1 Films on Organic Substrate Deposited by r.f. Sputtering
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作者 Deheng ZHANG, Dejun ZHANG and Qingpu WANG Department of Physics, Shandong University, Jinan 250100, China Tianlin YANG Institute of Zibo, Zibo 255091, China 《Journal of Materials Science & Technology》 SCIE EI CAS CSCD 2001年第5期517-520,共4页
This paper presents the substrate temperature dependence of opto-electrical properties for transparent conducting Al-doped ZnO films prepared on polyisocyanate (PI) substrates by r f sputtering. Polycrystalline ZnO:Al... This paper presents the substrate temperature dependence of opto-electrical properties for transparent conducting Al-doped ZnO films prepared on polyisocyanate (PI) substrates by r f sputtering. Polycrystalline ZnO:Al films with good adherence to the substrates having a (002) preferred orientation have been obtained with resistivities in the range from 4.1×10-3to 5.3×104 Ωcm, carrier densities more than 2.6×1020 cm-3 and Hall mobilities between 5.78 and 13.11 cm2/V/s for films. The average transmittance reaches 75% in the visible spectrum. The quality of obtained films depends on substrate temperature during film fabrication. 展开更多
关键词 zno SPUTTERING Effects of substrate Temperature on Properties for Transparent Conducting zno Al
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Heterogeneous Growth of ZnO Crystal on GaN/Al_(2)O_(3) Substrate
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作者 FAN Long ZHONG Changjie +6 位作者 WANG Xuemin CAO Linhong WANG Jin PENG Liping ZHAN Zhiqiang XIONG Zhengwei WU Weidong 《Journal of Wuhan University of Technology(Materials Science)》 SCIE EI CAS 2022年第4期576-579,共4页
Hydrothermal(HT)ZnO substrates were usually used as seeds for the vapor growth of ZnO crystals.In this work,ZnO bulk crystals were grown using the relatively low-cost GaN/AlOsubstrates as seeds by chemical vapor trans... Hydrothermal(HT)ZnO substrates were usually used as seeds for the vapor growth of ZnO crystals.In this work,ZnO bulk crystals were grown using the relatively low-cost GaN/AlOsubstrates as seeds by chemical vapor transport(CVT).With the increase of growth time,the dislocation densities in the crystal decreased from about 1×10^(6) to 6×10^(3) cm^(-2).The carrier concentration decreased from 1.24×10^(19) to 1.57×10^(17)cm^(-3),while the carrier mobility increased from 63.8 to 179 cm^(2)/(V·s).The optical transmittance in the VIS-NIR wavelength increased significantly in combination with the decreasing dislocation densities and impurity concentrations.The dislocation lines and related fast diffusion paths gradually decreased and disappeared in the late growth stage,and the crystal qualities were consequently improved.The experimental results show that the properties of as-grown ZnO crystals are comparable with bulk ZnO grown on the HT substrates to some extent.The GaN/Al_(2)O_(3) seeds may have a potential application value in the industrial production of ZnO single crystals. 展开更多
关键词 zno single crystal GaN/Al_(2)O_(3)substrates chemical vapor transport heterogeneous growth
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Growth of ZnO nanorod arrays on soft substrates by hydrothermal process
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作者 董林 贾晓林 +2 位作者 童艳红 马莹 刘京伟 《中国有色金属学会会刊:英文版》 CSCD 2007年第A02期721-724,共4页
ZnO nanorod arrays with quite homogeneous size and shape were fabricated by introducing ZnO seed-layer as nucleation centers on the soft ITO substrates prior to the hydrothermal reaction. The samples were characterize... ZnO nanorod arrays with quite homogeneous size and shape were fabricated by introducing ZnO seed-layer as nucleation centers on the soft ITO substrates prior to the hydrothermal reaction. The samples were characterized by scanning electron microscopy,transmission electron microscopy,X-ray diffraction and photoluminescence method. After the ZnO seed-layer is introduced,the resulting deposits on the substrates develop into nanorods,and the diameter decreases obviously to about 100 nm. Influences of the coated nanocrystal seed nuclei on the morphology of ZnO nanorod arrays were discussed. The results show that each nanorod is monocrystalline with wurtzite-type structure and oriented in c-axis direction. The increase of the intensity ratio of ultraviolet to visible emissions in room-temperature photoluminescence spectra and the decrease of the ultraviolet PL linewidths show the improvement of the quality of ZnO nanorods. A simple and effective method to synthesize ZnO nanorod arrays with fairly uniform size and shape on soft substrates is dip-coating ZnO nanocrystals prior to hydrothermal reaction,and it may be also feasible for the fabrication of other small-size metal oxide nanostructures on soft substrates. 展开更多
关键词 纳米氧化锌 热液反应 制备方法 晶体生长
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Design and Analysis of MEMS Based Aluminum Nitride (AlN), Lithium Niobate (LiNbO<sub>3</sub>) and Zinc Oxide (ZnO) Cantilever with Different Substrate Materials for Piezoelectric Vibration Energy Harvesters Using COMSOL Multiphysics Software
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作者 Ahmad M.Alsaad Ahmad A.Ahmad +2 位作者 Qais M.Al-Bataineh Nermeen S.Daoud Mais H.Khazaleh 《Open Journal of Applied Sciences》 2019年第4期181-197,共17页
Interest in energy harvesters has grown rapidly over the last decade. The cantilever shaped piezoelectric energy harvesting beam is one of the most employed designs, due to its simplicity and flexibility for further p... Interest in energy harvesters has grown rapidly over the last decade. The cantilever shaped piezoelectric energy harvesting beam is one of the most employed designs, due to its simplicity and flexibility for further performance enhancement. The research effort in the MEMS Piezoelectric vibration energy harvester designed using three types of cantilever materials, Lithium Niobate (LiNbO3), Aluminum Nitride (AlN) and Zinc Oxide (ZnO) with different substrate materials: aluminum, steel and silicon using COMSOL Multiphysics package were designed and analyzed. Voltage, mechanical power and electrical power versus frequency for different cantilever materials and substrates were modeled and simulated using Finite element method (FEM). The resonant frequencies of the LiNbO3/Al, AlN/Al and ZnO/Al systems were found to be 187.5 Hz, 279.5 Hz and 173.5 Hz, respectively. We found that ZnO/Al system yields optimum voltage and electrical power values of 8.2 V and 2.8 mW, respectively. For ZnO cantilever on aluminum, steel and silicon substrates, we found the resonant frequencies to be 173.5 Hz, 170 Hz and 175 Hz, respectively. Interestingly, ZnO/steel yields optimal voltage and electrical power values of 9.83 V and 4.02 mW, respectively. Furthermore, all systems were studied at different differentiate frequencies. We found that voltage and electrical power have increased as the acceleration has increased. 展开更多
关键词 MEMS PIEZOELECTRIC Energy Harvester CANTILEVER Lithium Niobate (LiNbO3) Aluminum Nitride (AlN) Zinc Oxide (zno) Aluminium substrate Steel substrate Silicon substrate COMSOL Finite Element Method
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射频磁控溅射ZnO薄膜的光致发光 被引量:19
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作者 王卿璞 张德恒 薛忠营 《Journal of Semiconductors》 EI CAS CSCD 北大核心 2003年第2期157-161,共5页
用射频磁控溅射法在硅衬底上沉积出具有良好的择优取向的多晶 Zn O薄膜 .在室温下进行光致发光测量 ,观察到明显的紫光发射 (波长为 4 0 2 nm )和弱的紫外光发射 (波长为 384 nm ) .紫光发射源于氧空位浅施主能级到价带顶的电子跃迁 ;... 用射频磁控溅射法在硅衬底上沉积出具有良好的择优取向的多晶 Zn O薄膜 .在室温下进行光致发光测量 ,观察到明显的紫光发射 (波长为 4 0 2 nm )和弱的紫外光发射 (波长为 384 nm ) .紫光发射源于氧空位浅施主能级到价带顶的电子跃迁 ;紫外光发射则源于导带与价带之间的电子跃迁 .随着光激发强度的增加 ,紫光发射强度超线性增强 ,且稍有蓝移 ,而紫外光发光强度则近似线性增加 .在氧气中高温退火后 ,薄膜结晶质量明显提高 ,紫光发射强度变弱 ,紫外光发射相对增强 . 展开更多
关键词 zno薄膜 射频磁控溅射 SI衬底 光致发光
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基于ZnO压电薄膜的柔性声表面波器件 被引量:15
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作者 周剑 何兴理 +2 位作者 金浩 王德苗 骆季奎 《光学精密工程》 EI CAS CSCD 北大核心 2014年第2期346-350,共5页
提出并制备了基于聚酰亚胺柔性衬底的声表面波(SAW)器件。在柔性聚酰亚胺衬底上低温反应磁控溅射沉积了ZnO压电薄膜;采用X射线衍射仪,扫描电子显微镜,原子力显微镜等设备对ZnO薄膜进行了检测,结果表明:ZnO薄膜晶粒呈柱状生长并且(002)... 提出并制备了基于聚酰亚胺柔性衬底的声表面波(SAW)器件。在柔性聚酰亚胺衬底上低温反应磁控溅射沉积了ZnO压电薄膜;采用X射线衍射仪,扫描电子显微镜,原子力显微镜等设备对ZnO薄膜进行了检测,结果表明:ZnO薄膜晶粒呈柱状生长并且(002)择优取向,膜粗糙度小于9nm,适合制作压电器件。在柔性衬底上制备了基于ZnO压电薄膜的SAW器件,该器件表现出良好的谐振性能。采用矢量网络分析仪检测器件的传输曲线,实验结果与仿真结果具有很好的一致性。随着波长减小,谐振频率和相速度增加,当ZnO厚度为4μm,波长为8μm时,器件的谐振频率为268MHz,相速度为2 144m/s,机电耦合系数为1.1%;当ZnO厚度增加时,此叠层结构的声表面器件的叠层声速也增加。 展开更多
关键词 柔性衬底 zno薄膜 压电薄膜 声表面波器件
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衬底温度对PLD方法制备的ZnO薄膜的光学和电学特性的影响 被引量:5
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作者 赵子文 胡礼中 +4 位作者 张贺秋 孙景昌 刘维峰 骆英民 霍炳至 《人工晶体学报》 EI CAS CSCD 北大核心 2007年第1期129-133,共5页
利用脉冲激光沉积法(PLD)在c面蓝宝石衬底上制备了ZnO薄膜并对其进行了X射线衍射(XRD)、反射式高能电子衍射(RHEED)、光致发光(PL)谱和霍尔(Hall)测试。RHEED和XRD分析表明,温度在350℃至550℃之间时,ZnO薄膜的结晶质量随着衬底温度的... 利用脉冲激光沉积法(PLD)在c面蓝宝石衬底上制备了ZnO薄膜并对其进行了X射线衍射(XRD)、反射式高能电子衍射(RHEED)、光致发光(PL)谱和霍尔(Hall)测试。RHEED和XRD分析表明,温度在350℃至550℃之间时,ZnO薄膜的结晶质量随着衬底温度的升高而提高,当衬底温度进一步升高后,ZnO薄膜的结晶质量开始下降。四个样品中,衬底温度为550℃的样品具有最清晰的规则点状RHEED图像和半高宽最窄的(0002)衍射峰。PL谱和Hall测量的结果表明,衬底温度为550℃的样品还具有最好的发光性质和最大的霍尔迁移率。 展开更多
关键词 zno薄膜 脉冲激光沉积 衬底温度
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ZnO薄膜肖特基二极管的研制(英文) 被引量:5
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作者 叶志镇 李蓓 +2 位作者 黄靖云 袁国栋 赵炳辉 《发光学报》 EI CAS CSCD 北大核心 2004年第3期283-286,共4页
采用直流反应磁控溅射的方法 ,在Al Si(1 0 0 )衬底上沉积了ZnO晶体薄膜。利用Al和Pt作为与ZnO接触的欧姆电极与肖特基电极 ,制作了ZnO薄膜肖特基二极管。X射线衍射测试结果表明ZnO薄膜具有高度的c轴择优取向。原子力显微分析表明 :样... 采用直流反应磁控溅射的方法 ,在Al Si(1 0 0 )衬底上沉积了ZnO晶体薄膜。利用Al和Pt作为与ZnO接触的欧姆电极与肖特基电极 ,制作了ZnO薄膜肖特基二极管。X射线衍射测试结果表明ZnO薄膜具有高度的c轴择优取向。原子力显微分析表明 :样品表面光洁平整 ,晶粒尺寸约 1 0 0nm ,扩展电阻分析表明ZnO薄膜的厚度为 0 4 μm ,载流子浓度为 1 8× 1 0 1 5cm- 3,此后的霍尔测试证实了这一结果并说明ZnO的导电类型为n型。室温下的I V测试显示ZnO肖特基二极管具有明显的整流特性。Pt与n型ZnO接触的势垒高度为 0 5 4eV。文中的ZnO肖特基二极管为首次研制的原型器件 ,其性能可以通过器件结构与制作工艺的进一步优化而得到改善。 展开更多
关键词 zno薄膜 Al/Si(100)衬底 基特基势垒
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基于柔性玻璃衬底ZnO∶B薄膜的非晶硅太阳能电池的制备及其光电性能研究 被引量:7
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作者 李旺 朱登华 +6 位作者 刘石勇 刘路 王仕鹏 黄海燕 杨德仁 牛新伟 杜国平 《人工晶体学报》 EI CAS CSCD 北大核心 2015年第8期2057-2062,共6页
采用低压化学气相沉积法(LPCVD)在大面积(40 cm×40 cm)超薄柔性玻璃和硬质玻璃衬底上分别制备了B掺杂的ZnO(BZO)透明导电薄膜及非晶硅薄膜太阳能电池,对比了两种衬底上BZO薄膜的形貌、光学和导电性能及其非晶硅薄膜电池的性能。结... 采用低压化学气相沉积法(LPCVD)在大面积(40 cm×40 cm)超薄柔性玻璃和硬质玻璃衬底上分别制备了B掺杂的ZnO(BZO)透明导电薄膜及非晶硅薄膜太阳能电池,对比了两种衬底上BZO薄膜的形貌、光学和导电性能及其非晶硅薄膜电池的性能。结果表明,在相同LPCVD工艺下,超薄柔性玻璃衬底上BZO薄膜的生长速率相对减小;当生长相同厚度BZO薄膜时,超薄柔性玻璃衬底的透光率相对于硬质玻璃衬底提高约2%,同时并具有相同的导电能力。在柔性玻璃衬底上制备的非晶硅薄膜电池的初始和稳定转化效率也相对提高,分别达到9.16%和7.82%。 展开更多
关键词 柔性衬底 低压化学气相沉积 B掺杂zno 非晶硅薄膜 太阳能电池
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蓝光ZnO薄膜的特性研究 被引量:3
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作者 朋兴平 杨扬 +2 位作者 耿伟刚 杨映虎 王印月 《发光学报》 EI CAS CSCD 北大核心 2005年第4期531-534,i0002,共5页
采用反应溅射法在n型硅(100)衬底上制备了ZnO薄膜,分别用X射线衍射仪、原子力显微镜和荧光分光光度计对样品的结构、表面形貌和光致发光特性进行了表征。X射线衍射结果表明,实验中制备出了应变小的c轴择优取向的ZnO薄膜;原子力显微镜观... 采用反应溅射法在n型硅(100)衬底上制备了ZnO薄膜,分别用X射线衍射仪、原子力显微镜和荧光分光光度计对样品的结构、表面形貌和光致发光特性进行了表征。X射线衍射结果表明,实验中制备出了应变小的c轴择优取向的ZnO薄膜;原子力显微镜观察表明,薄膜表面平整,颗粒大小约为50 nm,为柱状结构,颗粒垂直于硅衬底表面生长;在室温光致发光(PL)谱中观察到了波长位于434 nm处的较窄的强蓝光发射峰,该蓝光峰的半峰全宽约为50 m eV。对蓝光峰的发光机制进行了讨论,并推断出该蓝光峰来源于电子从Zn填隙缺陷能级向价带顶跃迁。 展开更多
关键词 zno薄膜 硅衬底 光致发光 射频反应溅射
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高阻ITO基板上电化学沉积ZnO薄膜的研究 被引量:5
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作者 侯旭峰 荆海 +1 位作者 谷长栋 张会平 《液晶与显示》 CAS CSCD 北大核心 2007年第1期15-20,共6页
利用电化学沉积法,以65±1℃的0.1mol/LZn(NO3)2水溶液作为电解质溶液,在方块电阻为118Ω/□的氧化铟锡(ITO)玻璃基板上制备了ZnO薄膜。利用扫描电镜观察了ZnO薄膜表面形貌,结果表明随着电极电势的降低或沉积时间的增加,ZnO薄膜表... 利用电化学沉积法,以65±1℃的0.1mol/LZn(NO3)2水溶液作为电解质溶液,在方块电阻为118Ω/□的氧化铟锡(ITO)玻璃基板上制备了ZnO薄膜。利用扫描电镜观察了ZnO薄膜表面形貌,结果表明随着电极电势的降低或沉积时间的增加,ZnO薄膜表面颗粒的六方形结构逐渐明显。利用X射线衍射技术分析了阴极电势和沉积时间对ZnO薄膜择优取向的影响,结果表明ZnO薄膜的(002)择优取向是随电极电势的下降而逐渐减弱的,而且随沉积时间的增加(002)择优取向也逐渐减弱。透射光谱测量表明,实验所获得的ZnO薄膜在可见光范围内是透光的,平均透过率高达80%~90%,不同阴极电势下的禁带宽度均为3.5eV左右,且在阴极电势为-2.5V时,禁带宽度随沉积时间的增加而逐渐减小。 展开更多
关键词 zno薄膜 电化学沉积 ITO基板 禁带宽度
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SiC缓冲层对Si表面生长的ZnO薄膜结构和光电性能的改善 被引量:3
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作者 康朝阳 赵朝阳 +4 位作者 刘峥嵘 孙柏 唐军 徐彭寿 谢家纯 《发光学报》 EI CAS CSCD 北大核心 2009年第6期807-811,共5页
用脉冲激光沉积(PLD)技术制备了ZnO/SiC/Si和ZnO/Si薄膜并制成了紫外探测器。利用X射线衍射(XRD),光致发光(PL)谱,I-V曲线和光电响应谱对薄膜的结构和光电性能进行了研究。实验结果表明:SiC缓冲层改善了ZnO薄膜的结晶质量和光电性能,其... 用脉冲激光沉积(PLD)技术制备了ZnO/SiC/Si和ZnO/Si薄膜并制成了紫外探测器。利用X射线衍射(XRD),光致发光(PL)谱,I-V曲线和光电响应谱对薄膜的结构和光电性能进行了研究。实验结果表明:SiC缓冲层改善了ZnO薄膜的结晶质量和光电性能,其原因可能是SiC作为柔性衬底能够减少ZnO与Si之间大的晶格失配和热失配导致的界面缺陷和界面态。 展开更多
关键词 zno薄膜 SI(111)衬底 SiC缓冲层 光电性能
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磁控溅射制备柔性衬底ZnO:Ga透明导电膜微结构及性能研究 被引量:8
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作者 李素敏 赵玉涛 张钊 《太阳能学报》 EI CAS CSCD 北大核心 2007年第11期1233-1238,共6页
室温条件下,采用磁控溅射法在有机柔性衬底聚酰亚胺(PI)表面制备出ZnO:Ga透明导电膜,XRD表明ZnO:Ga薄膜为六角纤锌矿结构的多晶薄膜。研究了溅射功率、氩气分压、溅射时间及衬底负偏压等溅射工艺参数对薄膜结构及光电性能的影响,得出最... 室温条件下,采用磁控溅射法在有机柔性衬底聚酰亚胺(PI)表面制备出ZnO:Ga透明导电膜,XRD表明ZnO:Ga薄膜为六角纤锌矿结构的多晶薄膜。研究了溅射功率、氩气分压、溅射时间及衬底负偏压等溅射工艺参数对薄膜结构及光电性能的影响,得出最佳溅射参数分别为:功率100W,氩气分压0.1Pa,溅射时间60min,衬底负偏压40V。结果表明:磁控溅射制备的ZnO:Ga膜附着性良好,电阻率为9.4×10^(-4)Ω·cm,可见光透过率为78%。 展开更多
关键词 光电特性 柔性衬底 磁控溅射 结构 zno:Ga膜
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