Aluminum films with thickness of 8.78-20.82μm were deposited on the AZ31B magnesium alloys by DC magnetron sputtering.The influences of aluminum film on the micro-mechanical properties and corrosion behavior of the m...Aluminum films with thickness of 8.78-20.82μm were deposited on the AZ31B magnesium alloys by DC magnetron sputtering.The influences of aluminum film on the micro-mechanical properties and corrosion behavior of the magnesium alloys were investigated.The morphology of aluminum film was examined by scanning electron microscopy and the microstructure of aluminum film was analyzed by X-ray diffiactometry.Nanoindentation and nanoscratch tests were conducted to investigate their micromechanical properties.Moreover,potentiodynamical polarization test performed in 3.5%NaCl solution was carried out to study their anticorrosion performances.The results show that the surface hardness of AZ31B magnesium alloy with aluminum film is 1.38-2.01 GPa,higher than that of the magnesium alloy substrate.The critical load of Al film/AZ31B substrate is in the range of 0.68-2.77 N. The corrosion current density of AZ31B with aluminum film is 2-3 orders of magnitude less than that of bare AZ31B.And the corrosion potential with aluminum film positively shifts.Thus aluminum film can increase the corrosion resistance of Mg alloys obviously.展开更多
High resistance thin film chip resistors(0603 type) were studied,and the specifications are as follows:1 k? with tolerance about ±0.1% after laser trimming and temperature coefficient of resistance(TCR) less than...High resistance thin film chip resistors(0603 type) were studied,and the specifications are as follows:1 k? with tolerance about ±0.1% after laser trimming and temperature coefficient of resistance(TCR) less than ±15×10-6/℃.Cr-Si-Ta-Al films were prepared with Ar flow rate and sputtering power fixed at 20 standard-state cubic centimeter per minute(sccm) and 100 W,respectively.The experiment shows that the electrical properties of Cr-SiTa-Al deposition films can meet the specification requirements of 0603 ty...展开更多
In this study we have used a combinatorial approach for producing binary and ternary alloy thin film libraries using a lab-scale RF co-sputtering system. Initially we used two elemental sputtering targets, i.e. alumin...In this study we have used a combinatorial approach for producing binary and ternary alloy thin film libraries using a lab-scale RF co-sputtering system. Initially we used two elemental sputtering targets, i.e. aluminum (Al) target and neodymium (Nd) target, to produce a film library of varying composition and successfully identified a suitable composition range (1.95–2.38 at% Nd) in which resistance to hillock formation and resistivity of the film spots were found to be satisfactory in annealed state (350°C, 30 min). In another case, in order to form ternary alloy composition library we have used two sputtering targets, i.e. an Al-0.5 at% Nd alloy target and an elemental Ni target. Though, co-sputtered Al-0.6 at% Nd-0.9 at% Ni alloy films showed satisfactory resistance to hillock formation and low resistivity after annealing, film deposited from a ternary alloy target with the same composition failed to show satisfactory resistance to hillock formation during annealing. In case of Al-0.6 at% Nd-0.9 at% Ni alloy target, 250 nm thick film showed poor resistance to hillock formation than the 500 nm thick film. This clearly showed thickness-dependent hillock performance of Al-0.6 at% Nd-0.9 at% Ni alloy. In this study it was found that, in addition to the process variables, metallurgical microstructure of the alloy sputtering targets had significant effect on the film properties which was not obvious from the results of films deposited using co-sputtering of the individual elemental targets.展开更多
Thin sheets (20 μm - 30 μm) of an aluminum-scandium alloy were manufactured by magnetron sputtering with a homogeneous thickness distribution. The influence of bias voltage on the sheet properties was investigated. ...Thin sheets (20 μm - 30 μm) of an aluminum-scandium alloy were manufactured by magnetron sputtering with a homogeneous thickness distribution. The influence of bias voltage on the sheet properties was investigated. Steel sheets of 100 μm were employed as substrate and were coated in a dc magnetron sputtering unit fitted with a rectangular target of aluminum 2.0 w% scandium master alloy. After deposition, the substrates were dissolved in an oxidizing medium and thus freestanding aluminum-scandium thin films were obtained. The homogeneous thickness was achieved by a reciprocal movement of the substrate. The influence of a radio frequency bias voltage on the coating properties was investigated. The bias voltage resulted in an important coarsening of the columnar structure as well as an increase of the roughness and hardness. Additionally, a low bias voltage could intensively reduce the coating defect density without altering too much the sheet properties.展开更多
基金Project(2070950)supported by the Key Research Projects of the Ministry of Education,ChinaProject(KJ070617)supported by theChongqing Municipal Education Commission,China
文摘Aluminum films with thickness of 8.78-20.82μm were deposited on the AZ31B magnesium alloys by DC magnetron sputtering.The influences of aluminum film on the micro-mechanical properties and corrosion behavior of the magnesium alloys were investigated.The morphology of aluminum film was examined by scanning electron microscopy and the microstructure of aluminum film was analyzed by X-ray diffiactometry.Nanoindentation and nanoscratch tests were conducted to investigate their micromechanical properties.Moreover,potentiodynamical polarization test performed in 3.5%NaCl solution was carried out to study their anticorrosion performances.The results show that the surface hardness of AZ31B magnesium alloy with aluminum film is 1.38-2.01 GPa,higher than that of the magnesium alloy substrate.The critical load of Al film/AZ31B substrate is in the range of 0.68-2.77 N. The corrosion current density of AZ31B with aluminum film is 2-3 orders of magnitude less than that of bare AZ31B.And the corrosion potential with aluminum film positively shifts.Thus aluminum film can increase the corrosion resistance of Mg alloys obviously.
基金Supported by Science and Technology Committee of Tianjin (No.06YFGPGX08400)Ministry of Science and Technology of China (No.2009GJF20022)Innovation Fund of Tianjin University
文摘High resistance thin film chip resistors(0603 type) were studied,and the specifications are as follows:1 k? with tolerance about ±0.1% after laser trimming and temperature coefficient of resistance(TCR) less than ±15×10-6/℃.Cr-Si-Ta-Al films were prepared with Ar flow rate and sputtering power fixed at 20 standard-state cubic centimeter per minute(sccm) and 100 W,respectively.The experiment shows that the electrical properties of Cr-SiTa-Al deposition films can meet the specification requirements of 0603 ty...
文摘In this study we have used a combinatorial approach for producing binary and ternary alloy thin film libraries using a lab-scale RF co-sputtering system. Initially we used two elemental sputtering targets, i.e. aluminum (Al) target and neodymium (Nd) target, to produce a film library of varying composition and successfully identified a suitable composition range (1.95–2.38 at% Nd) in which resistance to hillock formation and resistivity of the film spots were found to be satisfactory in annealed state (350°C, 30 min). In another case, in order to form ternary alloy composition library we have used two sputtering targets, i.e. an Al-0.5 at% Nd alloy target and an elemental Ni target. Though, co-sputtered Al-0.6 at% Nd-0.9 at% Ni alloy films showed satisfactory resistance to hillock formation and low resistivity after annealing, film deposited from a ternary alloy target with the same composition failed to show satisfactory resistance to hillock formation during annealing. In case of Al-0.6 at% Nd-0.9 at% Ni alloy target, 250 nm thick film showed poor resistance to hillock formation than the 500 nm thick film. This clearly showed thickness-dependent hillock performance of Al-0.6 at% Nd-0.9 at% Ni alloy. In this study it was found that, in addition to the process variables, metallurgical microstructure of the alloy sputtering targets had significant effect on the film properties which was not obvious from the results of films deposited using co-sputtering of the individual elemental targets.
文摘Thin sheets (20 μm - 30 μm) of an aluminum-scandium alloy were manufactured by magnetron sputtering with a homogeneous thickness distribution. The influence of bias voltage on the sheet properties was investigated. Steel sheets of 100 μm were employed as substrate and were coated in a dc magnetron sputtering unit fitted with a rectangular target of aluminum 2.0 w% scandium master alloy. After deposition, the substrates were dissolved in an oxidizing medium and thus freestanding aluminum-scandium thin films were obtained. The homogeneous thickness was achieved by a reciprocal movement of the substrate. The influence of a radio frequency bias voltage on the coating properties was investigated. The bias voltage resulted in an important coarsening of the columnar structure as well as an increase of the roughness and hardness. Additionally, a low bias voltage could intensively reduce the coating defect density without altering too much the sheet properties.
