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Tetraalkyl-substituted zinc phthalocyanines used as anode buffer layers for organic light-emitting diodes 被引量:1
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作者 陈潜 杨松鹤 +3 位作者 董磊 蔡思源 许家驹 许宗祥 《Chinese Physics B》 SCIE EI CAS CSCD 2020年第1期417-423,共7页
Two soluble tetraalkyl-substituted zinc phthalocyanines(ZnPcs)for use as anode buffer layer materials in tris(8-hydroxyquinoline)aluminum(Alq3)-based organic light-emitting diodes(OLEDs)are presented in this work.The ... Two soluble tetraalkyl-substituted zinc phthalocyanines(ZnPcs)for use as anode buffer layer materials in tris(8-hydroxyquinoline)aluminum(Alq3)-based organic light-emitting diodes(OLEDs)are presented in this work.The holeblocking properties of these Zn Pc layers slowed the hole injection process into the Alq3 emissive layer greatly and thus reduced the production of unstable cationic Alq3(Alq3^+)species.This led to the enhanced brightness and efficiency when compared with the corresponding properties of OLEDs based on the popular poly-(3,4-ethylenedioxythiophene):poly(styrene sulfonate)(PEDOT:PSS)buffer layer.Furthermore,because of the high thermal and chemical stabilities of these Zn Pcs,a nonaqueous film fabrication process was realized together with improved charge balance in the OLEDs and enhanced OLED lifetimes. 展开更多
关键词 organic light-emitting diode anode buffer layer metal phthalocyanine solution process
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A new static induction thyristor with high forward blocking voltage and excellent switching performances 被引量:1
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作者 张彩珍 王永顺 +1 位作者 刘春娟 汪再兴 《Journal of Semiconductors》 EI CAS CSCD 北大核心 2010年第3期54-57,共4页
A new static induction thyristor (SITH) with a strip anode region and p- buffer layer structure (SAP-B) has been successfully designed and fabricated. This structure is composed of a p- buffer layer and lightly do... A new static induction thyristor (SITH) with a strip anode region and p- buffer layer structure (SAP-B) has been successfully designed and fabricated. This structure is composed of a p- buffer layer and lightly doped n- regions embedded in the p+-emitter. Compared with the conventional structure of a buffed-gate with a diffused source region (DSR buffed-gate), besides the simple fabrication process, the forward blocking voltage of this SITH has been increased to 1600 V from the previous value of 1000 V, the blocking gain increased from 40 to 70, and the turn-offtime decreased from 0.8 to 0.4μs. 展开更多
关键词 static induction thyristor strip anode region and p- buffer layer structure forward blocking voltage turn-off time
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