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离子束刻蚀碲镉汞中转型宽度 被引量:1
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作者 徐国庆 刘向阳 +5 位作者 王仍 储开慧 汤亦聃 乔辉 贾嘉 李向阳 《红外与毫米波学报》 SCIE EI CAS CSCD 北大核心 2014年第5期477-480,共4页
用Ar+离子束在p型HgCdTe(碲镉汞)上刻蚀出不同体积的环孔,利用激光诱导电流方法测试转型后的n区宽度.研究发现,在相同的刻蚀条件下,n区宽度取决于材料的汞空位浓度和被刻蚀HgCdTe体积.当被刻蚀HgCdTe体积相同时,n区宽度随汞空位浓度的... 用Ar+离子束在p型HgCdTe(碲镉汞)上刻蚀出不同体积的环孔,利用激光诱导电流方法测试转型后的n区宽度.研究发现,在相同的刻蚀条件下,n区宽度取决于材料的汞空位浓度和被刻蚀HgCdTe体积.当被刻蚀HgCdTe体积相同时,n区宽度随汞空位浓度的增加呈线性减小;当汞空位浓度一定时,n区宽度随被刻蚀HgCdTe体积的增加呈线性增加. 展开更多
关键词 激光诱导电流 p型HgCdTe ar+离子刻蚀 转型宽度
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High-Power and High-Efficiency 650nm-Band AlGaInP Visible Laser Diodes Fabricated by Ion Beam Etching
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作者 徐云 曹青 +4 位作者 孙永伟 叶晓军 侯识华 郭良 陈良惠 《Journal of Semiconductors》 EI CAS CSCD 北大核心 2004年第9期1079-1083,共5页
High power and high-slope efficiency 650nm band real-refractive-index ridge w aveguide AlGaInP laser diodes with compressive strained MQW active layer are for med by pure Ar ion beam etching process.Symmetric laser me... High power and high-slope efficiency 650nm band real-refractive-index ridge w aveguide AlGaInP laser diodes with compressive strained MQW active layer are for med by pure Ar ion beam etching process.Symmetric laser mesas with high perpendi cularity,which are impossible to obtain by traditional wet etching method due to the use of a 15°-misoriented substrate,are obtained by this dry etching metho d.Laser diodes with 4μm wide,600μm long and 10%/90% coat are fabricated.Th e typical threshold current of these devices is 46mA at room temperature,and a s table fundamental-mode operation over 40mW is obtained.Very high slope efficien cy of 1.4W/A at 10mW and 1.1W/A at 40mW are realized. 展开更多
关键词 AlGaInP visible lasers ar ion beam dry etching
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