采用DC Arc Plasma JetCVD方法沉积微/纳米复合自支撑金刚石膜

在30kW级直流电弧等离子体喷射化学气相沉积(DC Arc P lasm a Jet CVD)设备上,采用Ar-H2-CH4混合气体,通过调节甲烷浓度以及控制其他沉积参数,在Mo衬底上沉积出微/纳米复合自支撑金刚石膜。实验表明,当微米金刚石膜层沉积结束后,在随后的沉积中,随着甲烷浓度的增加,金刚石膜表面的晶粒大小是逐渐减小的。当甲烷浓度达到20%以上时,金刚石膜生长面晶粒呈现菜花状的小晶团,膜体侧面已经没有了粗大的柱状晶,而是呈现出光滑的断口,对该层进行拉曼谱分析显示,位于1145 cm-1附近有一定强度的散射峰出现。这说明所沉积的晶粒全部变为纳米级尺寸。

Investigation on Plasma Jet Flow Phenomena During DC Air Arc Motion in Bridge-Type Contacts

Arc plasma jet flow in the air was investigated under a bridge-type contacts in a DC 270 V resistive circuit. We characterized the arc plasma jet flow appearance at different currents by using high-speed photography, and two polished contacts were used to search for the relationship between roughness and plasma jet flow. Then, to make the nature of arc plasma jet flow phenomena clear, a simplified model based on magnetohydrodynamic （MHD） theory was established and calculated. The simulated DC arc plasma was presented with the temperature distribution and the current density distribution. Furthermore, the calculated arc flow velocity field showed that the circular vortex was an embodiment of the arc plasma jet flow progress. The combined action of volume force and contact surface was the main reason of the arc jet flow.

OES study of the gas phase during diamond films deposition in high power DC arc plasma jet CVD system

This paper used optical emission spectroscopy （OES） to study the gas phase in high power DC arc plasma jet chemical vapour deposition （CVD） during diamond films growth processes. The results show that all the deposition parameters （methane concentration, substrate temperature, gas flow rate and ratio of H2/Ar） could strongly influence the gas phase. C2 is found to be the most sensitive radical to deposition parameters among the radicals in gas phase. Spatially resolved OES implies that a relative high concentration of atomic H exists near the substrate surface, which is beneficial for diamond film growth. The relatively high concentrations of C2 and CH are correlated with high deposition rate of diamond. In our high deposition rate system, C2 is presumed to be the main growth radical, and CH is also believed to contribute the diamond deposition.

Effects of deposition parameters on microstructure and thermal conductivity of diamond films deposited by DC arc plasma jet chemical vapor deposition

The uniform diamond films with 60 mm in diameter were deposited by improved DC arc plasma jet chemical vapor deposition technique. The structure of the film was characterized by scanning electronic microcopy(SEM) and laser Raman spectrometry. The thermal conductivity was measured by a photo thermal deflection technique. The effects of main deposition parameters on microstructure and thermal conductivity of the films were investigated. The results show that high thermal conductivity, 10.0 W/(K·cm), can be obtained at a CH4 concentration of 1.5% (volume fraction) and the substrate temperatures of 880-920 ℃ due to the high density and high purity of the film. A low pressure difference between nozzle and vacuum chamber is also beneficial to the high thermal conductivity.

Comparative Observation of Ar,Ar-H_2 and Ar-N_2 DC Arc Plasma Jets and Their Arc Root Behaviour at Reduced Pressure

Results observed experimentally are presented, about the DC arc plasma jets and their arc-root behaviour generated at reduced gas pressure without or with an applied magnetic field. Pure argon, argon-hydrogen or argon-nitrogen mixture was used as the plasma-forming gas. A specially designed copper mirror was used for a better observation of the arc-root behaviour on the anode surface of the DC non-transferred arc plasma torch. It was found that in the cases without an applied magnetic field, the laminar plasma jets were stable and approximately axisymmetrical. The arc-root attachment on the anode surface was completely diffusive when argon was used as the plasma-forming gas, while the arc-root attachment often became constrictive when hydrogen or nitrogen was added into the argon. As an external magnetic field was applied, the arc root tended to rotate along the anode surface of the non-transferred arc plasma torch.

Diagnosis of gas phase near the substrate surface in diamond film deposition by high-power DC arc plasma jet CVD

Optical emission spectroscopy （OES） was used to study the gas phase composition near the substrate surface during diamond deposition by high-power DC arc plasma jet chemical vapor deposition （CVD）. C2 radical was determined as the main carbon radical in this plasma atmosphere. The deposition parameters, such as substrate temperature, anode-substrate distance, methane concentration, and gas flow rate, were inspected to find out the influence on the gas phase. A strong dependence of the concentrations and distribution of radicals on substrate temperature was confirmed by the design of experiments （DOE）. An explanation for this dependence could be that radicals near the substrate surface may have additional ionization or dissociation and also have recombination, or are consumed on the substrate surface where chemical reactions occur.

Optical characterization of single-crystal diamond grown by DC arc plasma jet CVD

Optical centers of single-crystal diamond grown by DC arc plasma jet chemical vapor deposition(CVD) were examined using a low-temperature photoluminescence(PL) technique. The results show that most of the nitrogen-vacancy(NV) complexes are present as NV-centers, although some H2 and H3 centers and B-aggregates are also present in the single-crystal diamond because of nitrogen aggregation resulting from high N_2 incorporation and the high mobility of vacancies under growth temperatures of 950–1000°C. Furthermore, emissions of radiation-induced defects were also detected at 389, 467.5, 550, and 588.6 nm in the PL spectra. The reason for the formation of these radiation-induced defects is not clear. Although a Ni-based alloy was used during the diamond growth, Ni-related emissions were not detected in the PL spectra. In addition, the silicon-vacancy(Si-V)-related emission line at 737 nm, which has been observed in the spectra of many previously reported microwave plasma chemical vapor deposition(MPCVD) synthetic diamonds, was absent in the PL spectra of the single-crystal diamond prepared in this work. The high density of NV-centers, along with the absence of Ni-related defects and Si-V centers, makes the single-crystal diamond grown by DC arc plasma jet CVD a promising material for applications in quantum computing.

Influence of Jet Angle and Ion Density of Cathode Side on Low Current Vacuum Arc Characteristics

In this study, the influence of the initial jet angles （IJAs） and ion number densities （INDs） at the cathode side on the low current vacuum arc （LCVA） characteristics is simulated and analysed. The results show that the ion temperature, electron temperature, ion number density, axial current density and plasma pressure all decrease with the increase of the cathode IJAs. It is also shown that LCVA can cause a current constriction for lower cathode IND, and the anode sheath potential is more nonuniform, which is mainly related to the nonuniform distribution of the axial current density at the anode side.

Diagnosis of Electron,Vibrational and Rotational Temperatures in an Ar/N2 Shock Plasma Jet Produced by a Low Pressure DC Cascade Arc Discharge

In this paper, a low pressure Ar/N2 shock plasma jet with clearly multicycle al- ternating zones produced by a DC cascade arc discharge has been investigated by an emission spectral method combined with Abel inversion analysis. Plasma emission intensity, electron, vi- brational and rotational temperatures of the shock plasma have been measured in the expansion and compression zones. The results indicate that the ranges of the measured electron temperature, vibrational temperature and rotational temperature are 1.1 eV to 1.6 eV, 0.2 eV to 0.7 eV and 0.19 eV to 0.22 eV, respectively, and it is found for the first time that the vibrational and rota- tional temperatures increase while the electron temperature decreases in the compression zones. The electron temperature departs from the vibrational and the rotational temperatures due to non-equilibrium plasma effects. Electrons and heavy particles could not completely exchange energy via collisions in the shock plasma jet under the low pressure of 620 Pa or so.

基于微流道冷却的水卡式量热计结构优化与试验分析

高声速飞行器再入过程中面临严峻的气动加热环境,最高气流温度可达上万摄氏度,常用量热计在如此高的气流温度下,缺乏良好的热流测试性能和热负荷生存能力。为解决地面试验中高超声速飞行器模型表面高热流的连续、精准测量难题,研发了一种基于微流道冷却的新型水卡式量热计,其内部微型流道结构采用3D打印技术构建。通过数值仿真,确定了新型水卡式量热计的微流道尺寸与布局,与同一冷壁热流的传统水卡式量热计相比,其核心区域温升降低近50%,验证了微流道水卡式量热计在极端热环境下的测试能力和生存能力。电弧加热射流试验结果表明:微流道水卡式量热计可以同步测量压力、温度、热流数据,实现了高温流场参数的集成化辨识,并具有良好动态响应特性;最大热流测量值超过18 MW/m^(2),测量绝对偏差和平均偏差分别控制在3.44%与±1.72%以内。

特征信号图像测速法在超声速多组分等离子体射流中的应用

高速稀薄等离子体流场在航空航天领域有重要的应用.等离子体射流不同于常规的气体或液体的流动,其内部的电离状态、丰富的反应活性、多样的特征尺度、热平衡与非平衡共存等特点导致传统测速方法难以应用.特征信号图像测速法(SSIV)通过将羽流光强波动作为示踪信号来测量流体速度,从而拥有更好的流体跟随性和测量精度.利用低气压(约为100 Pa)直流电弧等离子体实验平台,文章基于特征信号图像测速方法,通过跟踪发生器输入功率周期变化引起的光强波动来测量纯氩以及氩-氦多组分两种工况下的羽流轴向平均速度分布.将中心波长为696.5 nm的窄带滤光片安装到光学镜头上,进一步获取两种工况下氩原子(ArI)单一谱线所对应的射流速度.结果分析表明,相同工况(电功率、气体质量流量及背景气压)下,氩-氦多组分等离子体的射流平均速度显著高于纯氩等离子体射流的平均速度.并且在氩-氦多组分等离子体的射流中,基于整体光强波动得到的射流速度要明显高于基于Ar I特征谱线获得的速度,表明SSIV方法不仅能够测量可压缩等离子体射流的平均速度,还具有分辨不同组分速度场的能力.研究结果展示了特征信号图像测速方法在复杂流场测量中的适用性和优势.

空气电弧射流表面改性提高硅橡胶电缆抗印字污染性能

硅橡胶电缆经常发生印字污染,影响使用。大气压等离子体表面改性技术广泛用于材料表面性能提升,但解决印字污染问题的相关条件、方法和效果等尚需研究。本工作利用高频交流电源驱动空气电弧射流对硅橡胶进行表面改性,通过发光图像、电学特性和光谱谱线强度表征射流的放电特性,并通过热成像仪获得射流处理下硅橡胶表面温升情况。模拟实际处理工艺,以不同移动速率处理硅橡胶表面。结果表明,射流处理能够有效解决硅橡胶表面印字污染问题,同时使硅橡胶表面的水接触角下降。在低速处理条件下,由于电弧的烧蚀作用,闪络电压和击穿场强均会降低。扫描电子显微镜(SEM)和X射线能谱仪(EDS)检测结果表明,处理后的硅橡胶表面交联聚合程度提高,抑制硅橡胶界面分子的扩散运动,从而提高了其抗印字污染性能。

金刚石涂层游动芯头制备及其在铜管生产中的应用

通过沉积方式和旋转装置设计,采用直流电弧等离子体喷射法在硬质合金游动芯头表面均匀沉积金刚石涂层,并利用白光干涉仪、扫描电子显微镜、Raman光谱仪和压痕法对涂层的表面粗糙度、形貌、质量均匀性和膜–基附着力等进行测试分析。结果表明:金刚石涂层抛光后的表面平均粗糙度S_(a)为76.4 nm,金刚石涂层脱落位置到压痕中心的平均距离为287.9μm,且各位置的金刚石涂层厚度均匀性和质量均较好。将制备的金刚石涂层游动芯头应用于高精度精密铜管生产线中,与硬质合金游动芯头对比,其在降低劳动强度、保证铜管一致性和延长芯头使用寿命方面都有显著效果。

大孔径不锈钢薄壁焊管金刚石涂层拉拔模具制备及应用

研究了利用直流电弧等离子体喷射法,在硬质合金拉拔模具表面沉积CVD金刚石涂层。采用孔径测量仪、接触式粗糙度仪和Raman光谱仪对金刚石涂层厚度、表面粗糙度和质量进行了测试分析。结果表明:金刚石涂层厚度d为24.5μm,沉积速率v为2.45μm/h,抛光后定径区表面平均粗糙度Ra为46 nm,拉拔模具入口区、压缩区和定径区在1 332 cm~(-1)附近都有明显的金刚石涂层特征峰。将制备的金刚石涂层拉拔模具应用于不锈钢焊管生产线中,经与硬质合金拉拔模具对比,使用寿命提高200倍,并在环保、降低劳动强度和管材一致性上都有了明显的优势。

大尺寸低损耗金刚石窗片制备及微波窗口封接

为满足长脉冲大功率回旋管研制需求,采用直流电弧等离子体喷射化学气相沉积法合成大尺寸低损耗金刚石厚膜窗片;通过表面金属化和钎焊工艺进行微波窗口的封接。采用法布里-玻罗(Fabry-Perot)开放激励腔、激光导热仪、三维轮廓仪、激光干涉仪等对金刚石窗片介电损耗、热导率、表面平坦度、粗糙度等性能参数进行了表征;采用氦质谱检漏仪、高功率长脉冲微波测试平台测试了窗口气密性和微波吸收特性。实验结果表明,抛光厚度1.36 mm的金刚石窗片具有高尺寸精度,热导率达到17.9~18.7 W·cm^(-1)·K^(-1);波导窗片介电损耗tanδ=1.76×10^(-4),回旋管窗片tanδ=2.6×10^(-4)。计算结果表明,在1 MW微波输入功率下波导窗损耗功率约2.34 kW,窗片中心热应力在安全数值内,相同损耗功率条件下回旋管窗口可承受至少680 kW的输出功率。

Characteristics of helium DC plasma jets at atmospheric pressure with multiple cathodes

A novel DC plasma torch with multiple cathodes is developed for generating laminar, transitional and turbulent plasma jets. The jet＇s characteristics, including jet appearance, voltage fluctuation, thermal efficiency, specific enthalpy, and distributions of temperature, pressure, and velocity, are experimentally investigated. The results show that as the gas flow rate increases, the plasma jet transforms first from the laminar state to the transitional state and second to the turbulent state. Compared with the transitional/turbulent jet, the laminar jet possesses not only a better stability and a longer hightemperature zone but also a higher average/core temperature and a higher specific enthalpy at the nozzle＇s outlet. With the change of jet states from the laminar to the turbulent flow, the core pressure and velocity at the nozzle＇s outlet increase,while the decaying rates of temperature/pressure/velocity along the jet＇s axial direction increase sharply. Furthermore, applications of laminar, transitional and turbulent jets for zirconia spray coating are described. The test results indicate that the long laminar jet is favorable for the deposition of a high-quality coating because the powder particles injected into the laminar jet may have better heating and lower kinetic energy.

Diamond Film Synthesis with a DC Plasma Jet:Effect of the Contacting Interface between Substrate and Base on the Substrate Temperature

The contacting interface between the substrate and water-cooled base is vital to the substrate temperature during diamond films deposition by a DC （direct current） plasma jet. The effects of the solid contacting area,conductive materials and fixing between the substrate and the base were investigated without affecting the other parameters. Experimental results indicated that the preferable solid contacting area was more than 60% of total contacting areal; the particular Sn-Pb alloy was more suitable for conducting heat and the concentric fixing ring was a better setting for controlling the substrate temperature. The result was explained in terms of the variable thermal contact resistance at the interface between substrate and base. The diamond films were analyzed by scanning electron microscopy （SEM） for morphology, X-ray diffraction （XRD） for the intensity of characteristic spectroscopy and Raman spectroscopy for structure.

淮钢70t电弧炉PTI JetBOx系统的应用

淮钢 70t电弧炉安装 3套PTIJetBOx集束射流氧枪系统后 ,冶炼周期降低 3～ 5min ,电耗降低 2 5～ 4 0kWh t,电极消耗降低 0 4kg t。

Mechanisms for non-ideal flow in low-power arc-heated supersonic nozzles

The flow in a low-powered arc gas heater com- bined with a supersonic nozzle of throat diameter less than 1 mm is quite complicated and difficult to describe in quan- titative detail. Experiments on arc-heated supersonic jet thrusters of monatomic gases argon and helium have been carried out and their performance measured. The flow charac- teristics are analyzed with the help of numerical simulation. Results show that the viscous effect is the most important factor causing the large difference between ideal and real performance. A large outer section of the exit flow is slow- moving. This is especially pronounced in helium, where 70 % of the exit area of the nozzle might be in subsonic flow. Fric- tion forces can be much larger than the net thrust, reaching several times higher in helium, resulting in very low efficien- cies. Other factors causing the differences between ideal and real flow include： complex flow in the throat region, electric arc extending to the nozzle expansion section, heat transfer to the inlet gas and from the hot plasma, and environmen- tal pressure in the vacuum chamber. It is recognized that the ordinary concepts of supersonic nozzle flow must be greatly modified when dealing with such complicated situations. The general concepts presented in this paper could be helpful in guiding the design and operation of this equipment.

Hydrogen Peroxide Formation in Saline Solution with Atmospheric He/H2O Plasma Jet

Electrical discharges in or in contact with liquid can produce H2O2effectively.However,wound treatment requires not only high energy yield,but also low temperature,stability,safety and reproducibility in H2O2generation.Thus a method of producing H2O2in saline solution reacting with He/H2O plasma jet is described in this paper.Two working modes(bullet and arc modes)are stable while keeping at low temperature in the H2O2production.The production is much faster under the arc mode,but has rather high production rate and energy efficiency under the bullet mode.Plus,the energy efficiency increases with treatment time and higher moist helium flow rate under both modes,but especially the bullet mode.Moreover,55 min after the plasma treatment,there is only 6%degradation of H2O2concentration in the saline solution,and this indicates the potential of He/H2O plasma jet in plasma pharmacy.