Sputter-deposited Au/NisoFeso bilayer films were annealed in a vacuum of 5×10^-4 Pa at 523 to 723 K for 30 or 90 min. The characteristics of the bilayer films were determined by Auger electron spectroscopy, field...Sputter-deposited Au/NisoFeso bilayer films were annealed in a vacuum of 5×10^-4 Pa at 523 to 723 K for 30 or 90 min. The characteristics of the bilayer films were determined by Auger electron spectroscopy, field emission scanning electron microscopy, X- ray diffractometry, a four-point probe technique, and an alternating gradient magnetometer. When the annealing temperature and time reached 723 K and 90 min, Ni and Fe atoms markedly diffused into the Au layer. The grain size of the Au layer did not change markedly with the annealing condition. As the annealing time was 30 min and the annealing temperature exceeded 573 K, the resistance of the bilayer film increased with increasing the annealing temperature. Furthermore, the resistance of the bilayer film annealed at 723 K for 90 ,nin was lower than that of the bilayer film annealed at 723 K for 30 min. All the bilayer films showed magnetic hysteresis loops. The as-deposited bilayer film showed a hard magnetization. The bilayer film represented an easy magnetization with increasing the annealing temperature. The Au/Ni50Fe50 film that annealed at 723 K for 90 min had the lowest saturation magnetization.展开更多
110 nm-thick Au layers were sputter-deposited on unheated glasses coatedabout a 10 nm-thick and a 50 nm-thick Cr layer respectively. The Au/Cr bilayer films were annealedin a vacuum of 1 mPa at 300℃ for 2, 5 and 30 m...110 nm-thick Au layers were sputter-deposited on unheated glasses coatedabout a 10 nm-thick and a 50 nm-thick Cr layer respectively. The Au/Cr bilayer films were annealedin a vacuum of 1 mPa at 300℃ for 2, 5 and 30 min, respectively. Auger electron spectroscopy, X-raydiffraction and Field emission scanning electron microscopy were used to analyze the composition andstructure of the Au layers. The resistivity of the bilayer films was measured by using four-pointprobe technique. The adhesion of the bilayer films to the substrate was tested using tape tests. Theamount of Cr atoms diffusing into the Au layer increases with increasing the annealing time,resulting in a decrease in lattice constant and an increase in resistivity of the Au layer. Thecontent of Cr inside the Au layer grown on the thinner Cr layer is less than that grown on thethicker Cr layer. For the Au/Cr bilayer films, the lower resistivity and the good adhesion to theglass substrate can be obtained at a shorter annealing time for a thinner Cr layer.展开更多
文摘Sputter-deposited Au/NisoFeso bilayer films were annealed in a vacuum of 5×10^-4 Pa at 523 to 723 K for 30 or 90 min. The characteristics of the bilayer films were determined by Auger electron spectroscopy, field emission scanning electron microscopy, X- ray diffractometry, a four-point probe technique, and an alternating gradient magnetometer. When the annealing temperature and time reached 723 K and 90 min, Ni and Fe atoms markedly diffused into the Au layer. The grain size of the Au layer did not change markedly with the annealing condition. As the annealing time was 30 min and the annealing temperature exceeded 573 K, the resistance of the bilayer film increased with increasing the annealing temperature. Furthermore, the resistance of the bilayer film annealed at 723 K for 90 ,nin was lower than that of the bilayer film annealed at 723 K for 30 min. All the bilayer films showed magnetic hysteresis loops. The as-deposited bilayer film showed a hard magnetization. The bilayer film represented an easy magnetization with increasing the annealing temperature. The Au/Ni50Fe50 film that annealed at 723 K for 90 min had the lowest saturation magnetization.
文摘110 nm-thick Au layers were sputter-deposited on unheated glasses coatedabout a 10 nm-thick and a 50 nm-thick Cr layer respectively. The Au/Cr bilayer films were annealedin a vacuum of 1 mPa at 300℃ for 2, 5 and 30 min, respectively. Auger electron spectroscopy, X-raydiffraction and Field emission scanning electron microscopy were used to analyze the composition andstructure of the Au layers. The resistivity of the bilayer films was measured by using four-pointprobe technique. The adhesion of the bilayer films to the substrate was tested using tape tests. Theamount of Cr atoms diffusing into the Au layer increases with increasing the annealing time,resulting in a decrease in lattice constant and an increase in resistivity of the Au layer. Thecontent of Cr inside the Au layer grown on the thinner Cr layer is less than that grown on thethicker Cr layer. For the Au/Cr bilayer films, the lower resistivity and the good adhesion to theglass substrate can be obtained at a shorter annealing time for a thinner Cr layer.
