Thick-film thermistor with negative temperature coefficient（NTC）, low room-temperature resistivity and modest thermistor constant was screen-printed on the alumina substrate by the combination of 30.94III0.04II0.02 ...Thick-film thermistor with negative temperature coefficient（NTC）, low room-temperature resistivity and modest thermistor constant was screen-printed on the alumina substrate by the combination of 30.94III0.04II0.02 B OBi Coa Co with Ba0.5Bi0.5Fe0.9Sn0.1O3. The electrical properties of the thick films were characterized by a digital multimeter, a Keithley 2400 and an impedance analyzer. The results show that with the Ba0.5Bi0.5Fe0.9Sn0.1O3 content increasing from 0.05 to 0.25, the values of room-temperature resistivity, thermistor constant and peak voltage of the thick films increases and are in the ranges of 1.47-26.5 ？·cm, 678-1345 K and 18.9-47.0 V, respectively. The corresponding current at the peak voltage of the thick films decreases and is in the range of 40-240 m A. The impedance spectroscopy measurement demonstrates that the as-prepared thick films show the abnormal electrical heterogeneous microstructure, consisting of high-resistive grains and less resistive grain boundary regions. It can be concluded that the addition of Ba0.5Bi0.5Fe0.9Sn0.1O3 into 30.94III0.04II0.02 Ba Co OBi Co improves the thermistor behavior and but also deteriorates the current characteristics.展开更多
Inter-growth bismuth layer-structured ferroelectrics（BLSFs）, Bi_4Ti_3O_（12）-Na_（0.5）Bi_（4.5）Ti_4O_（15）（BIT-NBT）, were successfully synthesized using the traditional solid-state reaction method. X-ray diffr...Inter-growth bismuth layer-structured ferroelectrics（BLSFs）, Bi_4Ti_3O_（12）-Na_（0.5）Bi_（4.5）Ti_4O_（15）（BIT-NBT）, were successfully synthesized using the traditional solid-state reaction method. X-ray diffraction（XRD） Rietveld refinements were conducted using GSAS software. Good agreement and low residual are obtained. The XRD diffraction peaks can be well indexed into I2 cm space group. The inter-growth structure was further observed in the high-resolution TEM image. Dielectric and impedance properties were measured and systematically analyzed. At the temperature range 763-923 K（below T_c）, doubly ionized oxygen vacancies（OVs） are localized and the short-range hopping leads to the relaxation processes with an activation energy of 0.79-1.01 eV. Above T_c, the doubly charged OVs are delocalized and become free ones, which contribute to the long-range dc conduction. The reduction in relaxation species gives rise to a higher relaxation activation energy ~ 1.6 eV.展开更多
One-dimensional and quasi-one-dimensional nanostructure materials are promising building blocks for electromagnetic devices and nanosystems.In this work,the composite Ni0.5Zn0.5Fe2O4（NZFO）/ Pb（Zr0.52Ti0.48）O3（PZT...One-dimensional and quasi-one-dimensional nanostructure materials are promising building blocks for electromagnetic devices and nanosystems.In this work,the composite Ni0.5Zn0.5Fe2O4（NZFO）/ Pb（Zr0.52Ti0.48）O3（PZT） nanofibers with average diameters about 65 nm are prepared by electrospinning from poly（vinyl pyrrolidone） （PVP） and metal salts.The precursor composite NZFO/PZT/PVP nanofibers and the subsequent calcined NZFO/PZT nanofibers are investigated by Fourier transform infrared spectroscopy （FT- IR） ,X-ray diffraction （XRD）,scanning electron microscopy （SEM）.The magnetic properties for nanofibers are measured by vibrating sample magnetometer（VSM）.The NZFO/PZT nanofibers obtained at calcination temperature of 900 °C for 2 h consist of the ferromagnetic spinel NZFO and ferroelectric perovskite PZT phases,which are constructed from about 37 nm NZFO and 17 nm PZT grains.The saturation magnetization of these NZFO/PZT nanofibers increases with increasing calcination temperature and contents of NZFO in the composite.展开更多
采用固相烧结法制备铋层结构Na 0.5 Bi 4.5 Ta x Ti 4-x O 15+0.5 x(NBT-Ta-x)(x=0~0.20)压电陶瓷。采用X射线衍射、扫描电镜和自动控温测试系统研究Ta 5+的B位掺杂对NBT-Ta-x陶瓷的微观结构、电导、介电和压电性能的影响。结果表明:随T...采用固相烧结法制备铋层结构Na 0.5 Bi 4.5 Ta x Ti 4-x O 15+0.5 x(NBT-Ta-x)(x=0~0.20)压电陶瓷。采用X射线衍射、扫描电镜和自动控温测试系统研究Ta 5+的B位掺杂对NBT-Ta-x陶瓷的微观结构、电导、介电和压电性能的影响。结果表明:随Ta掺杂量的增加,晶粒尺寸和长径比逐渐减小,表现出沿c轴的取向生长,同时,陶瓷的理论密度和体积密度增加,在掺杂量x=0.05时达到最高的相对密度96.1%,Ta在NBT晶格中的固溶极限在0.10附近。随Ta 5+掺杂量x增加到0.20,陶瓷的居里温度从680℃降至658℃。Ta 5+掺杂使NBT-Ta-x陶瓷的电阻率增加了两个数量级,压电常数d 33从13.8 pC/N增加到23 pC/N。当x=0.04~0.05时,NBT-Ta-x陶瓷的综合电性能良好:T c=670~672℃,d 33=21.8~23 pC/N,k p=7.9%~8.3%。展开更多
基金Projects(5110205551462005)supported by the National Natural Science Foundation of China
文摘Thick-film thermistor with negative temperature coefficient（NTC）, low room-temperature resistivity and modest thermistor constant was screen-printed on the alumina substrate by the combination of 30.94III0.04II0.02 B OBi Coa Co with Ba0.5Bi0.5Fe0.9Sn0.1O3. The electrical properties of the thick films were characterized by a digital multimeter, a Keithley 2400 and an impedance analyzer. The results show that with the Ba0.5Bi0.5Fe0.9Sn0.1O3 content increasing from 0.05 to 0.25, the values of room-temperature resistivity, thermistor constant and peak voltage of the thick films increases and are in the ranges of 1.47-26.5 ？·cm, 678-1345 K and 18.9-47.0 V, respectively. The corresponding current at the peak voltage of the thick films decreases and is in the range of 40-240 m A. The impedance spectroscopy measurement demonstrates that the as-prepared thick films show the abnormal electrical heterogeneous microstructure, consisting of high-resistive grains and less resistive grain boundary regions. It can be concluded that the addition of Ba0.5Bi0.5Fe0.9Sn0.1O3 into 30.94III0.04II0.02 Ba Co OBi Co improves the thermistor behavior and but also deteriorates the current characteristics.
基金Project supported by the National Natural Science Foundation of China(Grant Nos.51562014,51262009,and 51602135)
文摘Inter-growth bismuth layer-structured ferroelectrics（BLSFs）, Bi_4Ti_3O_（12）-Na_（0.5）Bi_（4.5）Ti_4O_（15）（BIT-NBT）, were successfully synthesized using the traditional solid-state reaction method. X-ray diffraction（XRD） Rietveld refinements were conducted using GSAS software. Good agreement and low residual are obtained. The XRD diffraction peaks can be well indexed into I2 cm space group. The inter-growth structure was further observed in the high-resolution TEM image. Dielectric and impedance properties were measured and systematically analyzed. At the temperature range 763-923 K（below T_c）, doubly ionized oxygen vacancies（OVs） are localized and the short-range hopping leads to the relaxation processes with an activation energy of 0.79-1.01 eV. Above T_c, the doubly charged OVs are delocalized and become free ones, which contribute to the long-range dc conduction. The reduction in relaxation species gives rise to a higher relaxation activation energy ~ 1.6 eV.
基金Funded by the National Natural Science Foundation of China (No. 50674048)Research Fund for the Doctoral Program of Higher Education of China(No.20103227110006)
文摘One-dimensional and quasi-one-dimensional nanostructure materials are promising building blocks for electromagnetic devices and nanosystems.In this work,the composite Ni0.5Zn0.5Fe2O4（NZFO）/ Pb（Zr0.52Ti0.48）O3（PZT） nanofibers with average diameters about 65 nm are prepared by electrospinning from poly（vinyl pyrrolidone） （PVP） and metal salts.The precursor composite NZFO/PZT/PVP nanofibers and the subsequent calcined NZFO/PZT nanofibers are investigated by Fourier transform infrared spectroscopy （FT- IR） ,X-ray diffraction （XRD）,scanning electron microscopy （SEM）.The magnetic properties for nanofibers are measured by vibrating sample magnetometer（VSM）.The NZFO/PZT nanofibers obtained at calcination temperature of 900 °C for 2 h consist of the ferromagnetic spinel NZFO and ferroelectric perovskite PZT phases,which are constructed from about 37 nm NZFO and 17 nm PZT grains.The saturation magnetization of these NZFO/PZT nanofibers increases with increasing calcination temperature and contents of NZFO in the composite.
文摘采用固相烧结法制备铋层结构Na 0.5 Bi 4.5 Ta x Ti 4-x O 15+0.5 x(NBT-Ta-x)(x=0~0.20)压电陶瓷。采用X射线衍射、扫描电镜和自动控温测试系统研究Ta 5+的B位掺杂对NBT-Ta-x陶瓷的微观结构、电导、介电和压电性能的影响。结果表明:随Ta掺杂量的增加,晶粒尺寸和长径比逐渐减小,表现出沿c轴的取向生长,同时,陶瓷的理论密度和体积密度增加,在掺杂量x=0.05时达到最高的相对密度96.1%,Ta在NBT晶格中的固溶极限在0.10附近。随Ta 5+掺杂量x增加到0.20,陶瓷的居里温度从680℃降至658℃。Ta 5+掺杂使NBT-Ta-x陶瓷的电阻率增加了两个数量级,压电常数d 33从13.8 pC/N增加到23 pC/N。当x=0.04~0.05时,NBT-Ta-x陶瓷的综合电性能良好:T c=670~672℃,d 33=21.8~23 pC/N,k p=7.9%~8.3%。
