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FORMATION OF HEXAGONAL Co_(2—3)C IN Co BY CARBON ION IMPLANTATION 被引量:1
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作者 WANG Jian WU Xingfang CHEN Xunping CAI Jun University of Science and Technology Beijing,Beijing,China LIU Baixin Tsinghua University,Beijing,China FANG Zhengzhi Beijing Institute of Space Physics,Academia Sinica,Beijing,China 《Acta Metallurgica Sinica(English Letters)》 SCIE EI CAS CSCD 1992年第2期137-140,共4页
Co thin films were subjected to 50 keV carbon ion implantation.At the dose of 2.5× 10^(17)/cm^2,a hexagonal Co-carbide phase was observed for the first time.The lattice con- stants from electron diffraction are a... Co thin films were subjected to 50 keV carbon ion implantation.At the dose of 2.5× 10^(17)/cm^2,a hexagonal Co-carbide phase was observed for the first time.The lattice con- stants from electron diffraction are a=0.2685 nm and c=0.4335 nm.The phase does not dis- appear until the dose of 9×10^(17)/cm^2.Auger spectra showed that the stoichiometry was Co_(2-3)C.The behavior of the ferromagnetic carbides along the descending sequence of Ni-Fe-Co by Fermi energy of solids was interpreted.Furthermore,based on the kinetic con- dition of phase transformation and the band theory of solids,a possible explanation about the difference of the results of ion-metallurgy and thermal metallurgy was proposed. 展开更多
关键词 ion implantation PHASE Fermi energy cO co_(2_3)c
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Synthesis of Poly[(3-octanoylpyrrole-2,5-diyl)-p-(N,N-dimethylamino)benzylidene] and Its Properties by Nitrogen Ion Implantation 被引量:1
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作者 ZHANGZhi-gang WUHong-cai +1 位作者 LIUXiao-zeng YIWen-hui 《Chemical Research in Chinese Universities》 SCIE CAS CSCD 2005年第2期166-168,共3页
A novel soluble π-conjugated polymer, poly[(3-octanoylpyrrole-2,5-diyl)-p-(N,N-dimethylamino)benzylidene](POPDMABE), was synthesized firstly by the condensation of 3-octanoylpyrrole with para-dimethylaminobenzaldehyd... A novel soluble π-conjugated polymer, poly[(3-octanoylpyrrole-2,5-diyl)-p-(N,N-dimethylamino)benzylidene](POPDMABE), was synthesized firstly by the condensation of 3-octanoylpyrrole with para-dimethylaminobenzaldehyde. The chemical structure of the polymer was characterized by FTIR and 1H NMR spectrometries. The polymer is a potential nonlinear optical(NLO) material. According to the function of optical forbidden band gap(E_g) and photon energy(hν), the optical forbidden band gaps of the polymer before and after ion implantation were calculated. The resonant third-order nonlinear optical properties of POPDMABE before and after ion implantation were also studied by using the degenerate four-wave mixing(DFWM) technique at 532 nm. When the energy is 25 keV and the dose is 2.2×10 17 ions/cm 2, the {polymer′s} optical forbidden band gap is about 1.63 eV which is smaller than that of the non-implanted sample(1.98 eV) and the resonant third-order NLO susceptibility of POPDMABE is about 4.3×10 -7 esu, 1 order of magnitude higher than that of the non-implanted sample(4.1×10 -8 esu). The results show that nitrogen ion implantation is an effective method to improve the resonant third-order NLO property of the polymer. 展开更多
关键词 Poly[(3-octanoylpyrrole-2 5-diyl)-p-(n n-dimethylamino)benzylidene] ion implantation Optical forbidden band gap Resonant third-order nonlinear optical property Degenerate four-wave mixing technique
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Influence of Target Temperature on Cemented Carbides for Dual Ion Implantation
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作者 赵青 李宏福 童洪辉 《Plasma Science and Technology》 SCIE EI CAS CSCD 2006年第6期690-692,共3页
A Cemented Carbide material was implanted with dual nitrogen plus tantalum ions at temperatures of 100℃ and 400℃ and a dose of 8× 10^17 ions cm^-2. The thickness of the implanted layers increased by about an or... A Cemented Carbide material was implanted with dual nitrogen plus tantalum ions at temperatures of 100℃ and 400℃ and a dose of 8× 10^17 ions cm^-2. The thickness of the implanted layers increased by about an order of magnitude when the temperature was elevated from 100℃ to 400℃. Higher surface hardness was also obtained in the high temperature implantation. X-ray diffraction showed the presence of nitrides of tantalum and tungsten in the implanted surface. 展开更多
关键词 cemented carbide Ta+n ion implantation TEMPERATURE
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Fluid simulation of the pulsed bias effect on inductively coupled nitrogen discharges for low-voltage plasma immersion ion implantation
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作者 Xiao-Yan Sun Yu-Ru Zhang +1 位作者 Xue-Chun Li You-Nian Wang 《Chinese Physics B》 SCIE EI CAS CSCD 2017年第1期290-297,共8页
Planar radio frequency inductively coupled plasmas(ICP) are employed for low-voltage ion implantation processes,with capacitive pulse biasing of the substrate for modulation of the ion energy. In this work, a two-di... Planar radio frequency inductively coupled plasmas(ICP) are employed for low-voltage ion implantation processes,with capacitive pulse biasing of the substrate for modulation of the ion energy. In this work, a two-dimensional(2D) selfconsistent fluid model has been employed to investigate the influence of the pulsed bias power on the nitrogen plasmas for various bias voltages and pulse frequencies. The results indicate that the plasma density as well as the inductive power density increase significantly when the bias voltage varies from 0 V to-4000 V, due to the heating of the capacitive field caused by the bias power. The N+fraction increases rapidly to a maximum at the beginning of the power-on time, and then it decreases and reaches the steady state at the end of the glow period. Moreover, it increases with the bias voltage during the power-on time, whereas the N2-+ fraction exhibits a reverse behavior. When the pulse frequency increases to 25 kHz and40 kHz, the plasma steady state cannot be obtained, and a rapid decrease of the ion density at the substrate surface at the beginning of the glow period is observed. 展开更多
关键词 fluid simulation low-voltage plasma immersion ion implantation n2 inductive discharge
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Electrical and structural properties of diamond films implanted by various doses of oxygen ions
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作者 胡晓君 叶健松 +2 位作者 郑国渠 曹华珍 谭红川 《Chinese Physics B》 SCIE EI CAS CSCD 2006年第9期2170-2174,共5页
Oxygen-doped diamond films are prepared by implanting various dose oxygen ions into the diamond films synthesized by hot filament chemical vapour deposition, and their electrical and structural properties are investig... Oxygen-doped diamond films are prepared by implanting various dose oxygen ions into the diamond films synthesized by hot filament chemical vapour deposition, and their electrical and structural properties are investigated. Hall effect measurements show that lower dose oxygen ion implantation is beneficial to preparing n-type diamonds. The carrier concentration increases with the dose increasing, indicating that oxygen ions supply electrons to the diamonds. The results of AES spectrum indicate that oxygen ions are doped into the diamond films, and the O-implanted depth is around 0.1μm. Raman spectrum measurements indicate that the lower dose oxygen ion implantation at 10^14 cm^-2 or 10^15 cm^-2 is favourable for producing less damaged O-doDed diamond films. 展开更多
关键词 diamond films n-TYPE OXYGEn ion implantation
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蛋黄-壳NiCoP@N-C材料的制备及其储钠特性研究
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作者 侯宇欣 孙立 +3 位作者 刘凯月 党莹 蒋昊纯 赵冰 《高师理科学刊》 2024年第6期54-61,共8页
NiCo基磷化物因其优异的导电性和较高的理论容量,被认为是最有潜力的钠离子电极材料.然而,NiCo基磷化物在钠离子嵌入/脱出时会发生严重的体积应变,导致NiCo基磷化物的倍率特性降低,循环稳定性大幅度衰减.针对这些问题,采用多巴胺包覆-煅... NiCo基磷化物因其优异的导电性和较高的理论容量,被认为是最有潜力的钠离子电极材料.然而,NiCo基磷化物在钠离子嵌入/脱出时会发生严重的体积应变,导致NiCo基磷化物的倍率特性降低,循环稳定性大幅度衰减.针对这些问题,采用多巴胺包覆-煅烧-磷化处理法制备了蛋黄-壳结构的NiCoP@N-C材料,在该材料中,氮掺杂碳层有效地改善了电极材料固有的电导率和结构完整性;独特的蛋黄-壳结构显著减缓了在钠离子嵌入/脱出过程中的体积膨胀.当NiCoP@N-C作为钠离子电池负极材料时表现出优异的电化学性能.在0.1 A·g^(-1)电流密度下,循环100圈后的可逆比容量仍高达462.3 mAh·g^(-1). 展开更多
关键词 nico基磷化物 nicoP@n-c材料 钠离子电池 负极材料
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The Breeding of a Pigment Mutant Strain of Steroid Hydroxylation Aspergillus Flavus by Low Energy Ion Implantation 被引量:1
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作者 叶辉 马金铭 +3 位作者 冯春 程郢 朱苏文 程备久 《Plasma Science and Technology》 SCIE EI CAS CSCD 2009年第1期122-126,共5页
In the process of the fermentation of steroid C11α-hydroxylgenation strain Aspergillus flavus AF-ANo208, a red pigment is derived, which will affect the isolation and purification of the target product. Low energy io... In the process of the fermentation of steroid C11α-hydroxylgenation strain Aspergillus flavus AF-ANo208, a red pigment is derived, which will affect the isolation and purification of the target product. Low energy ion beam implantation is a new tool for breeding excellent mutant strains. In this study, the ion beam implantation experiments were performed by infusing two different ions: argon ion (Ar^+) and nitrogen ion (N^+). The results showed that the optimal ion implantation was N^+ with an optimum dose of 2.08- 1015 ions/cm^2, with which the mutant strain AF-ANm16 that produced no red pigment was obtained. The strain had high genetic stability and kept the strong capacity of C11α-hydroxylgenation, which could be utilized in industrial fermentation. The differences between the original strain and the mutant strain at a molecular level were analyzed by randomly amplified polymorphic DNA (RAPD). The results indicated that the frequency of variation was 7.00%, which would establish the basis of application investigation into the breeding of pigment mutant strains by low energy ion implantation. 展开更多
关键词 ion implantation aspergillus flavus c11-αhydroxylgenation PIGMEnT RAPD
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Structural and electrical properties of carbon-ion-implanted ultrananocrystalline diamond films 被引量:1
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作者 Hui Xu Jian-Jun Liu +3 位作者 Hai-Tao Ye D J Coathup A V Khomich Xiao-Jun Hu 《Chinese Physics B》 SCIE EI CAS CSCD 2018年第9期426-433,共8页
We investigate the structural and electrical properties of carbon-ion-implanted ultrananocrystalline diamond(UNCD)films. Impedance spectroscopy measurements show that the impedance of diamond grains is relatively st... We investigate the structural and electrical properties of carbon-ion-implanted ultrananocrystalline diamond(UNCD)films. Impedance spectroscopy measurements show that the impedance of diamond grains is relatively stable, while that of grain boundaries(GBs)(Rb) significantly increases after the C~+ implantation, and decreases with the increase in the annealing temperature(Ta) from 650℃ to 1000℃. This implies that the C~+ implantation has a more significant impact on the conductivity of GBs. Conductive atomic force microscopy demonstrates that the number of conductive sites increases in GB regions at Ta above 900℃, owing to the formation of a nanographitic phase confirmed by high-resolution transmission electronic microscopy. Visible-light Raman spectra show that resistive trans-polyacetylene oligomers desorb from GBs at Ta above 900℃, which leads to lower Rb of samples annealed at 900 and 1000℃. With the increase in Ta to 1000℃, diamond grains become smaller with longer GBs modified by a more ordered nanographitic phase, supplying more conductive sites and leading to a lower Rb. 展开更多
关键词 ultrananocrystalline diamond c-ion implantation AnnEALInG electrical properties
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Investigation of Crystallization Incorporation of Er-implanted Silicon
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作者 万亚 李岱青 +3 位作者 章蓓 陈孔军 朱沛然 徐天冰 《Journal of Rare Earths》 SCIE EI CAS CSCD 1995年第2期109-113,共5页
The thermal annealing temperature dependence of solid phase epitaxial recrystallization, migration and incorporation of Er in Er+-implanted Si(100) have been investigated. It is shown in our experiment that the bulk c... The thermal annealing temperature dependence of solid phase epitaxial recrystallization, migration and incorporation of Er in Er+-implanted Si(100) have been investigated. It is shown in our experiment that the bulk crystalline Si acts as a seed for the initial solid phase epitaxial recrystallization. When Er segregates at the crystalline/amorphous interface to some extent, the epitaxial recrystallization is disrupted and the remaining damaged region is polycrystalline. For the irradiation at 350 keV, the maximum incorporation concentration in the recrystallized region decreases with increasing annealing temperature. However, the maximum incorporation concentration is anomalously enhanced for the sample irradiated with 150 keV Er+ and annealed at 850 degrees C. 展开更多
关键词 ER ion implantation SOLID PHASE EPITAXIAL REcRYSTALLIZATion IncORPORATion cOncEnTRATion RBS/c SPEcTRA
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低能N^(+)注入诱导大肠杆菌的16S rRNA遗传进化
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作者 唐朝 王婷 +2 位作者 王雪瑞 陈明晖 蔡长龙 《辐射研究与辐射工艺学报》 CAS CSCD 2024年第1期52-61,共10页
为了探究低能N^(+)注入对大肠杆菌16S rRNA遗传进化与耐药表征的作用,本研究利用低能N^(+)注入诱变筛选耐药大肠杆菌,通过基因组de novo测序获得其16S rRNA基因序列,通过K-B法检测诱变菌株的耐药特征。结果共诱变获得了25株耐药菌株,其... 为了探究低能N^(+)注入对大肠杆菌16S rRNA遗传进化与耐药表征的作用,本研究利用低能N^(+)注入诱变筛选耐药大肠杆菌,通过基因组de novo测序获得其16S rRNA基因序列,通过K-B法检测诱变菌株的耐药特征。结果共诱变获得了25株耐药菌株,其中5株诱变菌16S rRNA基因分别出现片段缺失,点突变(A257C),GC%含量增高,二级结构变异,并获得多药耐药特性。结果提示:低能N^(+)注入可以驱动大肠杆菌16S rRNA基因的随机突变和进化,进而调节耐药基因从头合成或变异,使大肠杆菌耐药性改变。 展开更多
关键词 低能n^(+)注入 大肠杆菌 16S rRnA 耐药性
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The fabrication of nickel silicide ohmic contacts to n-type 6H-silicon carbide 被引量:2
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作者 郭辉 张义门 +2 位作者 乔大勇 孙磊 张玉明 《Chinese Physics B》 SCIE EI CAS CSCD 2007年第6期1753-1756,共4页
This paper reports that the nickel silicide ohmic contacts to n-type 6H-SiC have been fabricated. Transfer length method test patterns with NiSi/SiC and NiSi2/SiC structure axe formed on N-wells created by N^+ ion im... This paper reports that the nickel silicide ohmic contacts to n-type 6H-SiC have been fabricated. Transfer length method test patterns with NiSi/SiC and NiSi2/SiC structure axe formed on N-wells created by N^+ ion implantation into Si-faced p-type 6H-SiC epilayer respectively. NiSi and NiSi2 films are prepared by annealing the Ni and Si films separately deposited. A two-step annealing technology is performed for decreasing of oxidation problems occurred during high temperature processes. The specific contact resistance Pc of NiSi contact to n-type 6H-SiC as low as 1.78× 10^-6Ωcm^2 is achieved after a two-step annealing at 350 ℃for 20 min and 950℃ for 3 min in N2. And 3.84×10-6Ωcm^2 for NiSi2 contact is achieved. The result for sheet resistance Rsh of the N+ implanted layers is about 1210Ω/□. X-ray diffraction analysis shows the formation of nickel silicide phases at the metal/n-SiC interface after thermal annealing. The surfaces of the nickel silicide after thermal annealing are analysed by scanning electron microscope. 展开更多
关键词 ohmic contact silicon carbide nickel silicide n^+ ion implantation
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Improved method for measuring the δ15N compound-specific amino acids: Application on mesopelagic fishes in the South China Sea 被引量:1
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作者 Fuqiang Wang Ying Wu +4 位作者 Lin Zhang Jie Jin Zuozhi Chen Jun Zhang Wing-man Lee 《Acta Oceanologica Sinica》 SCIE CAS CSCD 2022年第1期30-38,共9页
Compound-specific stable isotope analysis of individual amino acids(CSIA-AA)has been widely used in ecological and biogeochemical studies.It has been proven to be powerful in tracing the diet sources and trophic inter... Compound-specific stable isotope analysis of individual amino acids(CSIA-AA)has been widely used in ecological and biogeochemical studies.It has been proven to be powerful in tracing the diet sources and trophic interactions.However,assessing the N sources of mesopelagic fishes has been inconclusive because the mesopelagic fishes’unique domain(water depth ranged from 0 to 1000 m)and unresolved nitrogen isotopes of various forms.This study proposes a new method for coupling instruments(ion chromatography and PreconIRMS)and chemical method of oxidation-reduction of amino acids,and also combinedδ15N of AAs withδ13C of fatty acids(FAs)to analyze the trophic interactions of mesopelagic fishes in the South China Sea(SCS).AAs were isolated by ion chromatography with high peak resolution and collected by an automated fraction collector.The chemical method then converted the AAs into N2 O with a robust oxidation yields and suitable molar ratio of NH2 OH to.Finally,theδ15N of AAs at 20 nmol were measured with a reasonable precision(<0.6‰).With this method,this study report the first batch high precisionδ15N of AAs andδ13C of FAs of mesopelagic fishes collected from SCS.Diaphus luetkeni,Chauliodus minimus and Bathygadus antrodes showed similarδ13C values of 20:4 n-6(~-28‰),while Argyropelecus affinis and Stomias had similar values(~-32‰).These results reflect that mesopelagic fishes had complex diet sources.An increase of 4‰inδ15N of glutamic acid(Glu)was found between piscivorous and planktivorous fishes,which might suggest a trophic discrimination factor of mesopelagic fishes in the SCS.This study usedδ13C of 20:4 n-6 to reveal the diet sources of mesopelagic fishes andδ15N of Glu to clarify trophic level between piscivorous and planktivorous fishes.Thus,this combinative method could therefore ultimately be applied in a variety of deep-sea ecosystem. 展开更多
关键词 δ13c of fatty acids δ15n of amino acids ion chromatography mesopelagic fishes Precon-IRMS
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Influences of nitrogen flow rate on the structures and properties of Ti and N co-doped diamond-like carbon films deposited by arc ion plating 被引量:1
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作者 张林 马国佳 +2 位作者 林国强 马贺 韩克昌 《Chinese Physics B》 SCIE EI CAS CSCD 2014年第4期616-621,共6页
In this paper, Ti-C-N nanocomposite films are deposited under different nitrogen flow rates by pulsed bias arc ion plating using Ti and graphite targets in the Ar/N2 mixture gas. The surface morphologies, compositions... In this paper, Ti-C-N nanocomposite films are deposited under different nitrogen flow rates by pulsed bias arc ion plating using Ti and graphite targets in the Ar/N2 mixture gas. The surface morphologies, compositions, microstructures, and mechanical properties of the Ti-C-N films are investigated systematically by field emission scanning electron mi- croscopy (FE-SEM), x-ray photoelectron spectroscopy (XPS), grazing incident x-ray diffraction (GIXRD), Raman spectra, and nano-indentation. The results show that the nanocrystalline Ti(C,N) phase precipitates in the film from GIXRD and XPS analysis, and Raman spectra prove the presence of diamond-like carbon, indicating the formation of nanocomposite film with microstructures comprising nanocrystalline Ti(C,N) phase embedded into a diamond-like matrix. The nitrogen flow rate has a significant effect on the composition, structure, and properties of the film. The nano-hardness and elastic modulus first increase and then decrease as nitrogen flow rate increases, reaching a maximum of 34.3 GPa and 383.2 GPa, at a nitrogen flow rate of 90 sccm, respectively. 展开更多
关键词 arc ion plating Ti-c-n film nitrogen flow rate microstructure
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磁过滤电弧离子镀TiN与N离子注入性能研究
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作者 付天佐 赵红 +2 位作者 田振刚 李晓其 谢宛鋆 《表面技术》 EI CAS CSCD 北大核心 2024年第14期139-145,共7页
目的研究磁过滤电弧离子镀TiN与N离子注入对金属基体的保护效果。方法采用磁过滤电弧离子镀和离子注入在不锈钢表面分别制备了TiN薄膜与N注入改性层,以及二者的复合膜层。对薄膜的相结构、微观形貌进行了表征,对薄膜进行了极化曲线测试... 目的研究磁过滤电弧离子镀TiN与N离子注入对金属基体的保护效果。方法采用磁过滤电弧离子镀和离子注入在不锈钢表面分别制备了TiN薄膜与N注入改性层,以及二者的复合膜层。对薄膜的相结构、微观形貌进行了表征,对薄膜进行了极化曲线测试,同时在半球样品表面制备涂层并进行盐雾测试。结果所制备的TiN涂层为(111)晶面择优取向,离子注N预处理后沉积的TiN薄膜,仍保持(111)面的择优取向;电化学测试结果显示,TiN和N离子注入能够使不锈钢基体自腐蚀电位分别提高0.64、0.25 V,TiN薄膜具有最低的维钝电流密度4.9×10^(-6) A/cm^(2),N离子注入+TiN复合薄膜的维钝电流密度与N离子注入样品接近;盐雾试验结果表明,TiN以及N离子注入+TiN复合薄膜样品能够保证铜半球在12h的中性盐雾试验中无明显腐蚀痕迹。结论N离子注入预处理对MFAIPTiN涂层耐蚀性能的提升效果有限,单一的MFAIP TiN涂层便可应用于复杂形状的工程材料表面镀膜,可以增强其抗腐蚀能力,延长使用寿命。 展开更多
关键词 TIn 磁过滤电弧离子镀 n离子注入 腐蚀防护
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离子注入Ni-C修饰电极伏安法测定痢特灵 被引量:4
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作者 赵敏 胡劲波 +2 位作者 来永春 尚军 李启隆 《北京师范大学学报(自然科学版)》 CAS CSCD 北大核心 1997年第4期517-520,共4页
痢特灵在0.1mol·L-1盐酸中,用注入镍的玻碳电极作为工作电极进行伏安测定,形成一良好的还原峰,峰电位Ep=-0.34V(vs.SCE).峰电流与痢特灵浓度在1.0×10-5~1.0×10-4mol·L-1范围内成线性关系,检出限... 痢特灵在0.1mol·L-1盐酸中,用注入镍的玻碳电极作为工作电极进行伏安测定,形成一良好的还原峰,峰电位Ep=-0.34V(vs.SCE).峰电流与痢特灵浓度在1.0×10-5~1.0×10-4mol·L-1范围内成线性关系,检出限为5.0×10-6mol·L-1.用于片剂测定,得到满意的结果.用循环伏安法研究了该物质的电化学行为及其反应机理,认为痢特灵的电极反应过程属于准可逆过程。 展开更多
关键词 痢特灵 伏安法 离子注入 修饰电极 玻碳电极
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N型SiC的Ni基欧姆接触研究(英文) 被引量:5
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作者 郭辉 张义门 +2 位作者 张玉明 张健 郜锦侠 《电子器件》 CAS 2007年第2期356-360,364,共6页
对n型SiC的Ni基欧姆接触的机理进行了研究.通过在p型4H-SiC外延层上使用N离子注入来形成N阱,并在此基础上制作Ni/n型SiC欧姆接触的TLM结构,得到的比接触电阻约为1.7×10-4Ω.cm2.合金化的高温退火过程导致了C空位(VC)的出现,起到了... 对n型SiC的Ni基欧姆接触的机理进行了研究.通过在p型4H-SiC外延层上使用N离子注入来形成N阱,并在此基础上制作Ni/n型SiC欧姆接触的TLM结构,得到的比接触电阻约为1.7×10-4Ω.cm2.合金化的高温退火过程导致了C空位(VC)的出现,起到了施主的作用,降低了有效肖特基势垒高度,从而形成欧姆接触.通过模拟估计了有效载流子密度的增加,结果表明,高温退火中形成的C空位对于最终欧姆接触的形成起到了重要作用,甚至超过了掺杂水平的影响. 展开更多
关键词 SIc 欧姆接触 nI n离子注入 c空位
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电弧离子镀法制备高硬度Cr-Si-C-N薄膜 被引量:5
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作者 聂朝胤 Akiro Ando +1 位作者 卢春灿 贾晓芳 《金属学报》 SCIE EI CAS CSCD 北大核心 2009年第11期1320-1324,共5页
采用电弧离子反应沉积技术在SCM415渗碳淬火钢基片上沉积了Cr-Si-C-N薄膜,三甲基硅烷(TMS)反应气体作为Si和C掺杂源,通过改变TMS流量实现了薄膜中Si和C含量的调节.利用XPS,XRD,HRTEM和显微硬度计研究了Cr-Si-C-N薄膜的化学状态、显微组... 采用电弧离子反应沉积技术在SCM415渗碳淬火钢基片上沉积了Cr-Si-C-N薄膜,三甲基硅烷(TMS)反应气体作为Si和C掺杂源,通过改变TMS流量实现了薄膜中Si和C含量的调节.利用XPS,XRD,HRTEM和显微硬度计研究了Cr-Si-C-N薄膜的化学状态、显微组织和显微硬度.Cr-Si-C-N薄膜中的Si和C含量随TMS流量的增加而单调增加.在TMS流量小于90 mL/min时,薄膜中Si和C含量较少,薄膜由Cr(C,N)纳米晶与Si_3N_4非晶(nc-Cr(C,N)/a Si_3N_4)组成,薄膜硬度随流量的增加而单调增大,最大至4500 HK.硬度的增加源于固溶强化及薄膜中纳米晶/非晶复合结构的形成;当TMS流量大于90 mL/min时,薄膜中Si和C含量较多,多余的C以游离态形式存在,且随TMS流量的增加而增多,薄膜硬度下降. 展开更多
关键词 电弧离子镀 cr-Si-c-n薄膜 纳米晶 显微硬度
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不锈钢离子镀Ti(C,N)膜后的抗氧化性能研究 被引量:4
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作者 沈星 万建国 刘德俊 《材料保护》 CAS CSCD 北大核心 2002年第4期26-27,共2页
采用空心阴极离子镀的方法在奥氏体不锈钢 (1Cr18Ni9Ti)的表面沉积了Ti(C ,N)膜。通过扫描电镜、X射线衍射分析等观察了试样的氧化情况 ,进行了物象分析 ,研究了镀膜的抗氧化性能。结果表明 ,该膜层能大大提高基体的抗氧化性能。另外 。
关键词 不锈钢 Ti(c n)膜 抗氧化性能 心阴极离子镀 表面沉积 扫描电镜 X射线衍射分析
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N^+离子注入陆地棉花粉对胚珠DNA及M1代cDNA表达的影响 被引量:5
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作者 岳洁瑜 杨郁文 +3 位作者 于艳杰 倪万潮 吴李君 唐灿明 《核农学报》 CAS CSCD 北大核心 2009年第1期54-59,共6页
通过对胚珠DNA的SSR标记分析,在DNA水平上检测氮离子束诱变后胚珠的多态性变化,结果表明,离子注入陆地棉花粉后再授粉雌蕊,会对胚珠的DNA多态性产生影响,表明在一定程度上改变了花粉中精细胞的DNA序列;利用抑制性消减杂交(SSH)分离N+离... 通过对胚珠DNA的SSR标记分析,在DNA水平上检测氮离子束诱变后胚珠的多态性变化,结果表明,离子注入陆地棉花粉后再授粉雌蕊,会对胚珠的DNA多态性产生影响,表明在一定程度上改变了花粉中精细胞的DNA序列;利用抑制性消减杂交(SSH)分离N+离子诱变花粉和正常花粉(对照)分别给雌蕊授粉后产生的M1代植株叶片间表达有差异的cDNA片段,建立差异表达cDNA文库。已测序的有50个缩减cDNA克隆,根据BLAST网络服务检索查询EMBL、Gen Bank、DDBJ和PDB的核苷酸序列数据库以及蛋白质氨基酸序列数据库,进行序列联配,结果发现52%序列在数据库中都有同源的棉属来源的EST。38个EST与其他物种已知基因部分区域的同源性为56%~100%,占总EST的76%;5条EST序列能在数据库中检索到同源性序列,但其功能(占10%)尚不清楚;9个EST能在数据库中发现为推测蛋白,占18%;4个EST在GenBank中没有查到对应的同源序列,占8%。 展开更多
关键词 抑制性消减杂交(SSH) SSR分子标记 n^+离子注入 陆地棉
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离子束加速电压对真空电弧沉积Ti(C,N)涂层性能的影响 被引量:3
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作者 余东海 曾鹏 +1 位作者 胡社军 汝强 《电镀与涂饰》 CAS CSCD 2005年第4期4-6,共3页
 利用等离子辅助真空电弧沉积技术分别在高速钢片和单晶硅片制备了Ti(C,N)涂层,通过X 射线衍射和扫描电镜研究了不同离子加速电压对单晶硅片上涂层结构和组织形貌的影响,并测定了高速钢片上涂层的显微硬度,同时进行了耐磨性实验。结果...  利用等离子辅助真空电弧沉积技术分别在高速钢片和单晶硅片制备了Ti(C,N)涂层,通过X 射线衍射和扫描电镜研究了不同离子加速电压对单晶硅片上涂层结构和组织形貌的影响,并测定了高速钢片上涂层的显微硬度,同时进行了耐磨性实验。结果表明:涂层主要由TiN和Ti(C,N)组成;随着离子束加速电压的增大,涂层的沉积速度增大,Ti(C,N)的衍射峰不断宽化,晶格尺寸发生变化,但其表面形貌不受影响;当离子束加速电压为1500V时,涂层有较高的耐磨性和显微硬度;当离子束加速电压为2500V时,涂层的耐磨性和显微硬度都有所下降。 展开更多
关键词 离子束 真空电孤沉积 Ti(c n)涂层
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