利用水热合成法合成了分子组成为(C6H11NH3)5H(P2Mo5O23)4H2O的杂多化合物, 用单晶X-ray衍射方法测定了它的结构,该晶体属于单斜晶系,空间群P21/c, a = 12.830(3), b = 14.848(3), c = 25.258(5) ? b = 92.95(3), Mr = 1483.62, V = 48...利用水热合成法合成了分子组成为(C6H11NH3)5H(P2Mo5O23)4H2O的杂多化合物, 用单晶X-ray衍射方法测定了它的结构,该晶体属于单斜晶系,空间群P21/c, a = 12.830(3), b = 14.848(3), c = 25.258(5) ? b = 92.95(3), Mr = 1483.62, V = 4805.1(17) 3, Z = 4, Dc = 2.051 g/cm3, m = 1.431 mm-1, F(000) = 3000, I >2s(I) 的可观察衍射点4426个, 最终结构偏差因子R = 0.0464, wR = 0.0801, S = 0.731。在[P2Mo5O23]6-杂多阴离子中5个MoO6八面体通过共边和共角相连, 形成1个近似的五角平面骨架, 2个PO4四面体加在五角平面的两侧。热性质研究表明杂多阴离子骨架在547.4 ℃左右分解。展开更多
A-C:F, H film have been studied because of their low dielectric constant for application in interlayer dielectric in ULSC. These films were deposited by ECR plasma Reactor with CHF3 and C6H6 mixture as source gas. Th...A-C:F, H film have been studied because of their low dielectric constant for application in interlayer dielectric in ULSC. These films were deposited by ECR plasma Reactor with CHF3 and C6H6 mixture as source gas. The effects of microwave power, pressure and CHF3/C6H6 ratios on the film deposition rates have been investigated. The fluorocarbon and hydrocarbon radical species in the plasma discharges were analyzed by using the optical emission spectra. It demonstrates that CF2, CF and CH radicals play the important roles in the films being formed.展开更多
文摘A-C:F, H film have been studied because of their low dielectric constant for application in interlayer dielectric in ULSC. These films were deposited by ECR plasma Reactor with CHF3 and C6H6 mixture as source gas. The effects of microwave power, pressure and CHF3/C6H6 ratios on the film deposition rates have been investigated. The fluorocarbon and hydrocarbon radical species in the plasma discharges were analyzed by using the optical emission spectra. It demonstrates that CF2, CF and CH radicals play the important roles in the films being formed.
