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A nano-metallic-particles-based CMOS image sensor for DNA detection 被引量:1
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作者 何进 苏艳梅 +5 位作者 马玉涛 陈沁 王若楠 叶韵 马勇 梁海浪 《Chinese Physics B》 SCIE EI CAS CSCD 2012年第7期416-421,共6页
In this paper we report on a study of the CMOS image sensor detection of DNA based on self-assembled nano- metallic particles, which are selectively deposited on the surface of the passive image sensor. The nano-metal... In this paper we report on a study of the CMOS image sensor detection of DNA based on self-assembled nano- metallic particles, which are selectively deposited on the surface of the passive image sensor. The nano-metallic particles effectively block the optical radiation in the visible spectrum of ordinary light source. When such a technical method is applied to DNA detection, the requirement for a special UV light source in the most popular fluorescence is eliminated. The DNA detection methodology is tested on a CMOS sensor chip fabricated using a standard 0.5 gm CMOS process. It is demonstrated that the approach is highly selective to detecting even a signal-base mismatched DNA target with an extremely-low-concentration DNA sample down to 10 pM under an ordinary light source. 展开更多
关键词 cmos image sensor nano-metallic particles dna detection 0.5 gm cmos process
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