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Identification of a Herbicide Safener AD-67 Inducible cDNA in Rice 被引量:1
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作者 YIN De Suo SUN Xiao qiong +3 位作者 LI Ke WANG Shi quan DENG Qi ming LI Ping 《Rice science》 SCIE 2007年第3期235-238,共4页
A herbicide safener AD-67 inducible cDNA was identified in an indica rice variety 9311 by mRNA differential display. The transcript was increased 6 h after sprayed with the safener solution, and 4 days later, the expr... A herbicide safener AD-67 inducible cDNA was identified in an indica rice variety 9311 by mRNA differential display. The transcript was increased 6 h after sprayed with the safener solution, and 4 days later, the expression still could be detected. The fragment was recycled from the polygel and sequenced, and homologous analysis revealed the cDNA was 100% identical to some ESTs and cDNAs in rice database, and the amino acid sequence was 60-84% homologous to those of the Yippee genes in several eukaryotes. The fragment was extended to the whole long cDNA, and thus a primer pair was designed. RT-PCR analysis for the designed primer supported the induction result. 展开更多
关键词 RICE chemical induction CDNA mRNA differential display herbicide safener inducible gene
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Effect of hydrogen content on dielectric strength of the silicon nitride film deposited by ICP-CVD
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作者 张玉栋 唐家乐 +8 位作者 胡永杰 袁杰 管路路 李星雨 崔虎山 丁光辉 石新颖 许开东 庄仕伟 《Chinese Physics B》 SCIE EI CAS CSCD 2021年第4期550-554,共5页
The inductively coupled plasma chemical vapor deposition(ICP-CVD) deposited silicon nitride(SiN_(x)) thin film was evaluated for its application as the electrical insulating film for a capacitor device.In order to ach... The inductively coupled plasma chemical vapor deposition(ICP-CVD) deposited silicon nitride(SiN_(x)) thin film was evaluated for its application as the electrical insulating film for a capacitor device.In order to achieve highest possible dielectric strength of SiN_(x),the process parameters of ICP-CVD were carefully tuned to control hydrogen in SiN_(x) films by means of tuning N_(2)/SiH_(4) ratio and radio frequency(RF) power.Besides electrical measurements,the hydrogen content in the films was measured by dynamic secondary ion mass spectrometry(D-SIMS).Fourier transform infrared spectroscopy(FTIR) and micro Raman spectroscopy were used to characterize the SiN_(x) films by measuring Si-H and N-H bonds’ intensities.It was found that the more Si-H bonds lead to the higher dielectric strength. 展开更多
关键词 dielectric strength silicon nitride film inductively coupled plasma chemical vapor deposition(ICP-CVD) hydrogen content
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