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Microstructure evolution and mechanical properties of Ti-B-N coatings deposited by plasma-enhanced chemical vapor deposition 被引量:13
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作者 Jung Ho SHIN Kwang Soo CHOI +2 位作者 Tie-gang WANG Kwang Ho KIM Roman NOWAK 《中国有色金属学会会刊:英文版》 CSCD 2012年第S3期722-728,共7页
Ternary Ti-B-N coatings were synthesized on AISI 304 and Si wafer by plasma-enhanced chemical vapor deposition (PECVD) technique using a gaseous mixture of TiCl4,BCl3,H2,N2,and Ar.By virtue of X-ray diffraction analys... Ternary Ti-B-N coatings were synthesized on AISI 304 and Si wafer by plasma-enhanced chemical vapor deposition (PECVD) technique using a gaseous mixture of TiCl4,BCl3,H2,N2,and Ar.By virtue of X-ray diffraction analysis,X-ray photoelectron spectroscopy,scanning electron microscope,and high-resolution transmission electron microscope,the influences of B content on the microstructure and properties of Ti B N coatings were investigated systematically.The results indicated that the microstructure and mechanical properties of Ti-B-N coatings largely depend on the transformation from FCC-TiN phase to HCP-TiB2 phase.With increasing B content and decreasing N content in the coatings,the coating microstructure evolves gradually from FCC-TiN/a-BN to HCP-TiB2 /a-BN via FCC-TiN+HCP-TiB2/a-BN.The highest microhardness of about 34 GPa is achieved,which corresponds to the nanocomposite Ti-63%B-N (mole fraction) coating consisting of the HCP-TiB2 nano-crystallites and amorphous BN phase.The lowest friction-coefficient was observed for the nanocomposite Ti-41%B-N (mole fraction) coating consisting of the FCC-TiN nanocrystallites and amorphous BN 展开更多
关键词 Ti-B-N coating plasma-enhanced chemical vapor deposition (PECVD) nanocomposite coating hardness friction coefficient
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Preparation of ZrC-SiC composite coatings by chemical vapor deposition and study of co-deposition mechanism
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作者 Qiaomu Liu Jia Liu Xingang Luan 《Journal of Materials Science & Technology》 SCIE EI CAS CSCD 2019年第12期2942-2949,共8页
In this work, the Zr C-SiC composite coatings were co-deposited by chemical vapor deposition(CVD)using ZrCl4, MTS, CH4 and H2 as raw materials. The morphologies, compositions and phases of the composite coatings were ... In this work, the Zr C-SiC composite coatings were co-deposited by chemical vapor deposition(CVD)using ZrCl4, MTS, CH4 and H2 as raw materials. The morphologies, compositions and phases of the composite coatings were characterized by scanning electron microscopy(SEM), energy dispersive X-ray spectroscopy(EDS) and X-ray diffraction(XRD). The results indicated that the morphologies, compositions and phases of the composite coatings were related to the deposition temperature, the flow rate of the carrier H2 gas, and the ratio of C/Zr. Moreover, the co-deposition mechanism of the composite coatings was also studied. It was found that different deposition temperatures resulted in different deposition mechanisms. At temperatures in the range of 1150–1250℃, the Zr C-SiC co-deposition was controlled by the surface kinetic process. At temperatures in the range of 1250–1400℃, the Zr C-SiC co-deposition was controlled by the mass transport process. 展开更多
关键词 chemical vapor deposition(CVD) Zirconium carbide Silicon carbide Composite coatings Co-deposition mechanism
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PARTICLE COATING BY CHEMICAL VAPOR DEPOSITION IN A FLUIDIZED BED REACTOR 被引量:1
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作者 Gregor Czok Joachim Werther 《China Particuology》 SCIE EI CAS CSCD 2005年第1期105-112,共8页
Aluminum coatings were created onto glass beads by chemical vapor deposition in a fluidized bed reactor at different temperatures. Nitrogen was enriched with Triisobutylaluminum (TIBA) vapor and the latter was thermal... Aluminum coatings were created onto glass beads by chemical vapor deposition in a fluidized bed reactor at different temperatures. Nitrogen was enriched with Triisobutylaluminum (TIBA) vapor and the latter was thermally decomposed inside the fluidized bed to deposit the elemental aluminum. To ensure homogeneous coating on the bed material, the fluidizing conditions necessary to avoid agglomeration were investigated for a broad range of temperatures. The deposition reaction was modeled on the basis of a discrete particle simulation to gain insight into homogeneity and thickness of the coating throughout the bed material. In particular, the take-up of aluminum was traced for selected particles that exhibited a large mass of deposited aluminum. 展开更多
关键词 chemical vapor deposition fluidized bed reactor particle coating
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A comparative study of rhenium coatings prepared on graphite wafers by chemical vapor deposition and electrodeposition in molten salts 被引量:1
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作者 Jiang-Fan Wang Shu-Xin Bai +2 位作者 Yi-Cong Ye Li-An Zhu Hong Zhang 《Rare Metals》 SCIE EI CAS CSCD 2021年第1期202-211,共10页
The purity,preferred orientation,microstructure,microhardness,bonding strength,thickness uniformity and thermal stability of rhenium(Re)coatings prepared on graphite wafers by chemical vapor deposition(CVD)and electro... The purity,preferred orientation,microstructure,microhardness,bonding strength,thickness uniformity and thermal stability of rhenium(Re)coatings prepared on graphite wafers by chemical vapor deposition(CVD)and electrodeposition(ED)in molten salts were comparatively studied in this paper.It was found that carbon(0.0140 wt%)and oxygen(0.0067 wt%)were the primary impurities for CVD and ED Re coatings,respectively.The diffusion of carbon into CVD Re coating caused higher microhardness near the substrate and helped to improve the bonding strength at the same time.The preferred orientation,microstructure and microhardness of ED Re coating were all susceptible to oxygen.The coating deposition uniformity of ED Re is obviously better than that of CVD Re coating,due to its intrinsic characteristics.The(002)-oriented,coarse columnar CVD Re coating exhibited better thermal stability compared with that of the<110>-oriented,fiber-like columnar ED Re coating,while the ED Re grains grew remarkably and the microstructure evolved toward the similar structure of CVD Re after annealing treatment.The diversity of Re coatings in microstructure could be attributed to the mobility of grain boundaries(affected by temperature and impurity)during deposition processes. 展开更多
关键词 Rhenium coating Graphite wafer chemical vapor deposition ELECTROdeposition Molten salt Grain boundary mobility
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Mechanical Properties and Residue Stress of Four Kinds of ZrC Coatings Prepared by Chemical Vapor Deposition
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作者 孙威 熊翔 +1 位作者 李小斌 李国栋 《Journal of Shanghai Jiaotong university(Science)》 EI 2012年第6期706-711,共6页
Four kinds of ZrC coatings with nearly the same thickness have been successfully prepared on graphite substrate by chemical vapor deposition (CVD) through controlling the ratio of inlet reacting gases. From backscat... Four kinds of ZrC coatings with nearly the same thickness have been successfully prepared on graphite substrate by chemical vapor deposition (CVD) through controlling the ratio of inlet reacting gases. From backscat- tered electron images, it can be inferred that ZrCIII coating has the best tightness of all coatings. Meanwhile, line energy spectrum curve shows that zirconium and carbon elements distribute uniformly along the normal direction of the ZrCIII coating. As for varied microstructures, the coatings show different mechanical properties and residue stress. The strength and elastic modulus of ZrCIII coating were up to 89.57 and 1 192.5 GPa, respectively. Those make it near the level of diamond. Value of residue tensile stress of ZrC+C composite coating was only 7.729 MPa and that of ZrCIII coatings was 349.632 MPa. The strong combination of small-size grains in ZrCIII coating plays a decisive role to the best mechanical properties. However, strong misfit of lattice between ZrCIII coating and substrate can induce high residue stress. 展开更多
关键词 zirconium carbide coating chemical vapor deposition (CVD) microstructure
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Characterization of the heteroepitaxial growth of 3C-SiC on Si during low pressure chemical vapor deposition
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作者 CHEN Da ZHANG YuMing ZHANG YiMen WANG YueHu JIA RenXu 《Chinese Science Bulletin》 SCIE EI CAS 2010年第27期3102-3106,共5页
3C-SiC heteroepitaxial layers were grown on Si substrates using a horizontal,hot-wall low pressure chemical vapor deposition system.The crystal quality,surface morphology and thickness uniformity of the layers were ch... 3C-SiC heteroepitaxial layers were grown on Si substrates using a horizontal,hot-wall low pressure chemical vapor deposition system.The crystal quality,surface morphology and thickness uniformity of the layers were characterized by X-ray diffraction,atomic force microcopy and Fourier transform infrared spectroscopy,respectively.Growth of the epitaxial layer was determined to follow a three-dimensional island mode initially and then switch to a step-flow mode as the growth time increases. 展开更多
关键词 低压化学气相沉积 sic 生长特性 3C 傅里叶变换红外光谱 化学气相沉积系统 外延层生长 原子力显微镜
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A novel coated-particle design and fluidized-bed chemical vapor deposition preparation method for fuel-element identification in a nuclear reactor 被引量:3
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作者 Rongzheng Liu Malin Liu +3 位作者 Youlin Shao Xiaotong Chen Jingtao Ma Bing Liu 《Particuology》 SCIE EI CAS CSCD 2017年第2期35-41,共7页
Particle coating is an important method that can be used to expand particle-technology applications. Coated-particle design and preparation for nuclear fuel-element trajectory tracing were focused on in this paper. Pa... Particle coating is an important method that can be used to expand particle-technology applications. Coated-particle design and preparation for nuclear fuel-element trajectory tracing were focused on in this paper. Particles that contain elemental cobalt were selected because of the characteristic gamma ray spectra of 60Co. A novel particle-structure design was proposed by coating particles that contain elemental cobalt with a high-density silicon-carbide (SiC) layer. During the coating process with the high-density SiC layer, cobalt metal was formed and diffused towards the coating, so an inner SiC–CoxSi layer was designed and obtained by fluidized-bed chemical vapor deposition coupled with in-situ chemical reaction. The coating layers were studied by X-ray diffractometry, scanning electron microscopy, and energy dispersive X-ray spectroscopy techniques. The chemical composition was also determined by inductively coupled plasma optical emission spectrometry. The novel particle design can reduce the formation of metallic cobalt and prevent cobalt diffusion in the coating process, which can maintain safety in a nuclear reactor for an extended period. The experimental results also validated that coated particles maintain their structural integrity at extremely high temperatures (~1950 °C), which meets the requirements of next-generation nuclear reactors. 展开更多
关键词 Particle coating Particle design Cobalt Pluidized-bed chemical vapor deposition Nuclear fuel
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A perspective of microplasma oxidation (MPO) and vapor deposition coatings in surface engineering of aluminum alloys 被引量:1
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作者 AWAD Samir Hamid 《Journal of Chongqing University》 CAS 2004年第2期4-11,共8页
Over the past years, great achievements have been made in the development of coating technologies for surface improvement of aluminum alloys. Despite these achievements, the role in the market strongly depends on the ... Over the past years, great achievements have been made in the development of coating technologies for surface improvement of aluminum alloys. Despite these achievements, the role in the market strongly depends on the ability of surface coating technology under technical and economic considerations to meet the increased demands for heavy tribological applications of aluminum alloys. Microplasma oxidation (MPO) technology has recently been studied as a novel and effective means to provide thick and hard ceramic coating with improved properties such as excellent load-bearing and wear resistance properties on aluminum alloys. The present work covers the evaluation of the performances of current single and duplex coatings combining MPO, physical vapor deposition (PVD), and plasma assisted chemical vapor deposition (PACVD) coatings on aluminum alloys. It suggests that the MPO coating is a promising candidate for design engineers to apply aluminum alloys to heavy load-bearing applications. The prospective future for the research on MPO coatings is introduced as well. 展开更多
关键词 aluminum alloys microplasma oxidation (MPO) duplex coating physical vapor deposition (PVD) plasma assisted chemical vapor deposition (PACVD)
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Oxidation behavior of oxidation protective coatings for C/C-SiC composites at 1500 ℃ 被引量:5
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作者 闫志巧 熊翔 +3 位作者 肖鹏 陈峰 张红波 黄伯云 《中国有色金属学会会刊:英文版》 CSCD 2009年第1期61-64,共4页
Porous carbon/carbon preforms were infiltrated with melted silicon to form C/C-SiC composites. Three-layer Si-Mo coating prepared by slurry painting and SiC/Si-Mo multilayer coating prepared by chemical vapor depositi... Porous carbon/carbon preforms were infiltrated with melted silicon to form C/C-SiC composites. Three-layer Si-Mo coating prepared by slurry painting and SiC/Si-Mo multilayer coating prepared by chemical vapor deposition(CVD) alternated with slurry painting were applied on C/C-SiC composites, respectively. The oxidation of three samples at 1 500 ℃ was compared. The results show that the C/C-SiC substrate is distorted quickly. Three-layer Si-Mo coating is out of service soon due to the formation of many bubbles on surface. The mass loss of coated sample is 0.76% after 1 h oxidation. The sample with SiC/Si-Mo multilayer coating gains mass even after 105 h oxidation. SiC/Si-Mo multilayer coating can provide longtime protection for C/C-SiC composites and has excellent thermal shock resistance. This is attributed to the combination of dense SiC layer and porous Si-Mo layer. Dense SiC layer plays the dual role of physical and chemical barrier, and resists the oxidation of porous Si-Mo layer. Porous Si-Mo layer improves the thermal shock resistance of the coating. 展开更多
关键词 C/C-sic复合材料 防氧化涂层 氧化性能 金属防护层 金属腐蚀
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C/C基体上ZrB_(2)/SiC复合涂层的抗烧蚀性增强方法
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作者 高志廷 马壮 +3 位作者 柳彦博 刘强 王一帆 王冬 《北京理工大学学报》 EI CAS CSCD 北大核心 2024年第1期76-82,共7页
研究高压热流场景下,在碳/碳(C/C)基体表面ZrB_(2)/SiC复合涂层的抗烧蚀性增强方法.在等离子体喷涂ZrB_(2)/SiC复合涂层表面,采用CH3SiCl3-H2-Ar系统,化学气相沉积(CVD)-SiC密封层.对ZrB_(2)/SiC涂层与CVD-SiC密封层的结构演化、烧蚀性... 研究高压热流场景下,在碳/碳(C/C)基体表面ZrB_(2)/SiC复合涂层的抗烧蚀性增强方法.在等离子体喷涂ZrB_(2)/SiC复合涂层表面,采用CH3SiCl3-H2-Ar系统,化学气相沉积(CVD)-SiC密封层.对ZrB_(2)/SiC涂层与CVD-SiC密封层的结构演化、烧蚀性能与烧蚀机理进行了研究.结果表明:CVD-SiC密封层增强的ZrB_(2)/SiC复合涂层经过两个600 s循环烧蚀后,仍然具备抗烧蚀性能,表面CVD-SiC由β相向α相转化.CVD-SiC密封层填充了等离子喷涂ZrB_(2)/SiC复合涂层的空隙,限制了氧沿着涂层裂纹和孔洞向C/C基体扩散,进而提高了抗烧蚀性. 展开更多
关键词 密封层 烧蚀 等离子喷涂 C/C复合材料 化学气相沉积
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硅基SiC薄膜制备与应用研究进展
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作者 杨晨光 王秀峰 《材料导报》 EI CAS CSCD 北大核心 2024年第7期26-39,共14页
碳化硅(SiC)材料具有极为优良的物理、化学及电学性能,可满足在高温、高腐蚀等极端条件下的应用,碳化硅还是极端工作条件下微机电系统(MEMS)的主要候选材料,成为国际上新材料、微电子和光电子领域研究的热点。同时,碳化硅有与硅同属立... 碳化硅(SiC)材料具有极为优良的物理、化学及电学性能,可满足在高温、高腐蚀等极端条件下的应用,碳化硅还是极端工作条件下微机电系统(MEMS)的主要候选材料,成为国际上新材料、微电子和光电子领域研究的热点。同时,碳化硅有与硅同属立方晶系的同质异形体,可与硅工艺技术相结合制备出适应大规模集成电路需要的硅基器件,因此用硅晶片作为衬底制备碳化硅薄膜的工作受到研究人员的特别重视。本文综述了近年来国内外硅基碳化硅薄膜的研究现状,就其制备方法进行了系统的介绍,主要包括各种化学气相沉积(Chemical vapor deposition,CVD)法和物理气相沉积(Physical vapor deposition,PVD)法,并归纳了对硅基碳化硅薄膜性能的研究,包括杨氏模量、硬度、薄膜反射率、透射率、发光性能、电阻、压阻、电阻率和电导率等,以及其在微机电系统传感器、生物传感器和太阳能电池等领域的应用,最后对硅基碳化硅薄膜未来的发展进行了展望。 展开更多
关键词 硅基碳化硅薄膜 化学气相沉积 物理气相沉积 微机电系统传感器 生物传感器 太阳能电池
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3C-SiC纳米线的化学气相沉积法制备及超声裁剪研究
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作者 彭善成 李一言 +3 位作者 马慧磊 杜铭骐 刘传歆 贺周同 《核技术》 EI CAS CSCD 北大核心 2024年第7期79-89,共11页
3C-SiC又称β-SiC,有着优异的耐高温、耐腐蚀、耐辐照性能,是反应堆这类复杂环境中的理想材料。近年来,一维碳化硅纳米线材料成为碳化硅材料研究领域的热门研究方向,同时也面临加工手段匮乏、加工难度大的问题。我们通过化学气相沉积法... 3C-SiC又称β-SiC,有着优异的耐高温、耐腐蚀、耐辐照性能,是反应堆这类复杂环境中的理想材料。近年来,一维碳化硅纳米线材料成为碳化硅材料研究领域的热门研究方向,同时也面临加工手段匮乏、加工难度大的问题。我们通过化学气相沉积法成功制备了含有高密度堆叠层错的3C-SiC纳米线,并采用扫描电子显微镜(Scanning Electron Microscope,SEM)、透射电子显微镜(Transmission Electron Microscope,TEM)、X射线衍射(X-Ray Diffraction,XRD)以及拉曼光谱(Raman spectrum)等多种手段对制备出来的碳化硅纳米线进行了微观结构表征,揭示了其独特的微观形态和晶体结构特征;进一步研究了超声裁剪碳化硅纳米线,利用“气泡-射流”模型结合碳化硅纳米线的形态解释了碳化硅纳米线的超声裁剪过程,探索了碳化硅纳米线的直径、强度、缺陷等对其在超声过程中断裂行为的影响。本研究为碳化硅纳米线的超声裁剪加工和纳米线的强度研究提供了新的视角,对于未来碳化硅纳米线在核能领域的应用具有重要的意义。 展开更多
关键词 3C-sic 化学气相沉积 碳化硅纳米线 纳米线断裂行为 超声裁剪
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化学气相沉积SiC涂层的制备及水热腐蚀行为
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作者 毛健 陈招科 +1 位作者 徐振男 熊翔 《粉末冶金材料科学与工程》 2024年第5期373-383,共11页
采用化学气相沉积法在高纯石墨块上制备SiC涂层,并进行水热腐蚀实验,研究化学气相沉积工艺、涂层形貌结构与涂层水热腐蚀行为的关系。结果表明:随稀释氢气流量增大,涂层平均晶粒尺寸减小,涂层出现游离Si的可能性增大,其耐水热腐蚀性能... 采用化学气相沉积法在高纯石墨块上制备SiC涂层,并进行水热腐蚀实验,研究化学气相沉积工艺、涂层形貌结构与涂层水热腐蚀行为的关系。结果表明:随稀释氢气流量增大,涂层平均晶粒尺寸减小,涂层出现游离Si的可能性增大,其耐水热腐蚀性能逐渐降低;随沉积温度从1 000℃升高至1 300℃,涂层结晶度和平均晶粒尺寸都先增大后减小,在沉积温度为1 200℃时获得最大值,水热腐蚀后涂层结构和晶粒形貌保持完好;随三氯甲基硅烷水浴温度升高,涂层的平均晶粒尺寸增大,50℃水浴温度下制备的涂层结晶度最差且被腐蚀得最严重。 展开更多
关键词 sic涂层 化学气相沉积 水热腐蚀 晶粒尺寸 结晶度
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CVI-RMI联用法制备高性能C/(C-SiC)陶瓷基刹车材料 被引量:1
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作者 范丽君 《化工设计通讯》 CAS 2024年第5期105-106,123,共3页
采用化学气相渗透-反应熔体渗透(CVI-RMI)联用法制备C/(C-SiC)陶瓷基复合材料,并对材料的微观结构和力学性能、热学性能、摩擦磨损性能进行研究。结果表明:CVI化学气相渗透最佳C/C多孔坯体密度为1.40~1.55 g/cm^(3),RMI熔融渗硅最佳温度... 采用化学气相渗透-反应熔体渗透(CVI-RMI)联用法制备C/(C-SiC)陶瓷基复合材料,并对材料的微观结构和力学性能、热学性能、摩擦磨损性能进行研究。结果表明:CVI化学气相渗透最佳C/C多孔坯体密度为1.40~1.55 g/cm^(3),RMI熔融渗硅最佳温度为1650℃,制备的C/(C-SiC)复合材料密度2.10 g/cm^(3)。本方法制备的C/(C-SiC)复合材料力学性能优于采用前驱体浸渍裂解(PIP)法制备的复合材料,且导热性能优异,满足高温环境使用要求。研究发现C/(C-SiC)复合材料的摩擦系数适中,力矩曲线平稳,湿态下摩擦性能无衰减,静摩擦系数高满足低速刹车要求,且磨损量小。 展开更多
关键词 CVI化学气相沉积 RMI反应熔体渗透 C/(C-sic)陶瓷基刹车材料
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Characterization of SiC nanowires prepared on C/C composite without catalyst by CVD 被引量:3
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作者 葛毅成 刘云启 +3 位作者 武帅 吴皇 毛佩林 易茂中 《Transactions of Nonferrous Metals Society of China》 SCIE EI CAS CSCD 2015年第10期3258-3264,共7页
SiC nanowires were prepared on C/C composite surface without catalyst by chemical vapor deposition(CVD) using CH3 SiCl3 as precursor.SEM images of the CVD-product reveal that some long nanowires have grown to tens o... SiC nanowires were prepared on C/C composite surface without catalyst by chemical vapor deposition(CVD) using CH3 SiCl3 as precursor.SEM images of the CVD-product reveal that some long nanowires have grown to tens of micrometers with some gathered as a ball.Some short nanowires agglomerate like chestnut shell with many thorns accompanied by some deposited nano-particles.XRD,Raman-spectrum and FTIR patterns indicate that the product is a typical β-SiC.TEM images show that the nanowires have a wide diameter range from 10 to 100 nm,and some thin nanowires are bonded to the thick one by amorphous CVD-SiC.A SiC branch generates from an amorphous section of a thick one with an angle of 70° between them,which is consistent with the [111] axis stacking angle of the crystal.SAED and fast Fourier transform(FFT) patterns reveal that the nanowires can grow along with different axes,and the bamboo-nodes section is full of stacking faults and twin crystal.The twisted SiC lattice planes reveal that the screw dislocation growth is the main mechanism for the CVD-SiC nanowires. 展开更多
关键词 sic nanowires C/C composite chemical vapor deposition growth mechanism CHARACTERIZATION
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200 mm SiC外延炉及同质外延工艺研究
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作者 谢添乐 李苹 +4 位作者 杨宇 巩小亮 巴赛 陈国钦 万胜强 《电子工业专用设备》 2024年第4期11-16,29,共7页
目前SiC产业正由150 mm(6英寸)向200 mm(8英寸)转型,为满足行业对大尺寸、高质量SiC同质外延片的迫切需求,采用自主研制的200 mmSiC外延生长设备在国产衬底上成功制备出150 mm、200 mm 4H-SiC同质外延片,并开发了适用于150 mm及200 mm... 目前SiC产业正由150 mm(6英寸)向200 mm(8英寸)转型,为满足行业对大尺寸、高质量SiC同质外延片的迫切需求,采用自主研制的200 mmSiC外延生长设备在国产衬底上成功制备出150 mm、200 mm 4H-SiC同质外延片,并开发了适用于150 mm及200 mm的同质外延工艺,其中外延生长速率可大于60μm/h,在满足高速外延的同时,外延片质量优异,其中150 mm、200 mm SiC外延片厚度均匀性都可控制在1.5%以内,浓度均匀性均小于3%,致命缺陷密度小于0.3颗/cm2,外延表面粗糙度均方根Ra小于0.15 nm,各核心工艺指标均处于行业先进水平。 展开更多
关键词 碳化硅 200 mm外延炉 化学气相沉积 同质外延
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CVD SiC致密表面涂层制备及表征 被引量:14
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作者 刘荣军 张长瑞 +2 位作者 周新贵 曹英斌 刘晓阳 《材料工程》 EI CAS CSCD 北大核心 2005年第4期3-6,共4页
考察了沉积温度、稀释气体流量对化学气相沉积(CVD)SiC涂层的显微结构及晶体结构的影响,分析得出:沉积温度为1100℃,稀释气体Ar流量<400mL/min时,制备的SiC涂层晶体结构完整、致密。在该制备工艺条件下沉积的SiC涂层密度为3.204g/cm3... 考察了沉积温度、稀释气体流量对化学气相沉积(CVD)SiC涂层的显微结构及晶体结构的影响,分析得出:沉积温度为1100℃,稀释气体Ar流量<400mL/min时,制备的SiC涂层晶体结构完整、致密。在该制备工艺条件下沉积的SiC涂层密度为3.204g/cm3,显微硬度为HV4459.2,弹性模量为471GPa,涂层具有优异的光学加工性能,光学加工后表面粗糙度为0.429nm,能满足光学应用的要求。 展开更多
关键词 化学气相沉积 sic涂层 制备工艺 性能表征
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CVD法制备SiC先进陶瓷材料研究进展 被引量:16
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作者 刘荣军 周新贵 +1 位作者 张长瑞 曹英斌 《材料工程》 EI CAS CSCD 北大核心 2002年第7期46-49,共4页
Si C陶瓷材料具有许多优异的性能如高比强度、高比模量、低密度、高硬度、高导热系数、低的热膨胀系数、耐腐蚀、抗氧化等 ,从而被广泛用作高温结构部件。CVD工艺灵活 ,制备的 Si C陶瓷具有很高纯度和致密度 ,因而是制备先进 Si C陶瓷... Si C陶瓷材料具有许多优异的性能如高比强度、高比模量、低密度、高硬度、高导热系数、低的热膨胀系数、耐腐蚀、抗氧化等 ,从而被广泛用作高温结构部件。CVD工艺灵活 ,制备的 Si C陶瓷具有很高纯度和致密度 ,因而是制备先进 Si C陶瓷的最有希望的工艺之一。对 CVD法制备 Si C涂层和 Si 展开更多
关键词 制备 sic 陶瓷材料 研究进展 CVD 碳化硅 化学气相沉积 复合材料 涂层
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化学气相沉积工艺制备SiC涂层 被引量:12
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作者 刘荣军 周新贵 +1 位作者 张长瑞 曹英斌 《宇航材料工艺》 CAS CSCD 北大核心 2002年第5期42-44,共3页
利用化学气相沉积工艺制备了SiC涂层 ,对涂层进行了SEM及XRD分析。考察了温度、载气和稀释气体对涂层微观结构的影响 ;对不同基体进行了对照试验。在 110 0℃~ 130 0℃沉积时 ,随着温度的升高 ,SiC涂层沉积速度加快 ,SiC颗粒变大 ,同... 利用化学气相沉积工艺制备了SiC涂层 ,对涂层进行了SEM及XRD分析。考察了温度、载气和稀释气体对涂层微观结构的影响 ;对不同基体进行了对照试验。在 110 0℃~ 130 0℃沉积时 ,随着温度的升高 ,SiC涂层沉积速度加快 ,SiC颗粒变大 ,同时颗粒间的孔隙也变大 ,涂层的致密度降低 ;Ar流量相对小时 ,制备的涂层致密、光滑。以SiCp/SiC作基体时 ,涂层和基体结合得很牢固 ,SiC颗粒会向基体中渗透 。 展开更多
关键词 制备 化学气相沉积 碳化硅 涂层材料
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沉积温度对CVD SiC涂层显微结构的影响 被引量:15
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作者 张长瑞 刘荣军 曹英斌 《无机材料学报》 SCIE EI CAS CSCD 北大核心 2007年第1期153-158,共6页
以MTS为先驱体原料,在950-1300℃、负压条件下沉积了CVD SiC涂层.利用SEM对涂层的表面形貌和断口特征进行了表征.沉积温度和SiC涂层表面形貌的关系如下:950℃时,沉积的SiC颗粒非常细小,为独立的球形堆积;1000-1100℃时,CVD SiC涂层表... 以MTS为先驱体原料,在950-1300℃、负压条件下沉积了CVD SiC涂层.利用SEM对涂层的表面形貌和断口特征进行了表征.沉积温度和SiC涂层表面形貌的关系如下:950℃时,沉积的SiC颗粒非常细小,为独立的球形堆积;1000-1100℃时,CVD SiC涂层表面光滑、致密;1150-1300℃沉积的SiC涂层呈现出球状或瘤状结构且表面粗糙.结合热力学和晶体形核-长大理论,研究了沉积温度对SiC涂层表面形貌的作用机制.沉积温度和SiC涂层断口形貌的关系如下:1200℃以下沉积的SiC涂层断面致密、无孔洞;而1300℃沉积的SiC涂层断面非常疏松.利用岛状生长模型揭示了SiC涂层内部显微结构的形成机理. 展开更多
关键词 化学气相沉积 sic 温度 涂层 显微结构
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