Generally, the non-equilibrium plasma is produced at low pressure by a glow discharge (1.33Pa-1.33 kPa) including the radio frequency (13.56 MHz), microwave (2450 MHz), AC or DC high voltage discharges. As a method to...Generally, the non-equilibrium plasma is produced at low pressure by a glow discharge (1.33Pa-1.33 kPa) including the radio frequency (13.56 MHz), microwave (2450 MHz), AC or DC high voltage discharges. As a method to directly apply energy to a reaction system, some successful applications have been obtained in the fields such as chemical synthesis and decomposition at plasma, sputtering and filming, deposition at the gas state, polymerization, modification on the material surface, etching, ashing at low temperature and so on. For example,展开更多
文摘Generally, the non-equilibrium plasma is produced at low pressure by a glow discharge (1.33Pa-1.33 kPa) including the radio frequency (13.56 MHz), microwave (2450 MHz), AC or DC high voltage discharges. As a method to directly apply energy to a reaction system, some successful applications have been obtained in the fields such as chemical synthesis and decomposition at plasma, sputtering and filming, deposition at the gas state, polymerization, modification on the material surface, etching, ashing at low temperature and so on. For example,
