Multilayered TiAlN/CrN coatings have been synthesized on stainless steel substrates by cathodic arc plasma deposition using TiAl and Cr targets.Influences of the bias voltage,cathode current ratio ITiAl/ICr,and deposi...Multilayered TiAlN/CrN coatings have been synthesized on stainless steel substrates by cathodic arc plasma deposition using TiAl and Cr targets.Influences of the bias voltage,cathode current ratio ITiAl/ICr,and deposition pressure on the hardness and friction coefficient of the coatings were investigated.The measurement revealed existence of two cubic phases,face-centercubic （Cr,Al）N and（Ti,Al）N,in the coatings deposited under various bias voltages except for the coating deposited at -400 V,which is amorphous.The hardness of the coatings was strongly dependent on the Itial/Icr ratio and deposition pressure,and reached a maximum of 33 GPa at an ITiAI/ICr ratio of 1.0 and a pressure of 1.0 Pa.The incorporation of the element chromium can reduce the density of pinholes in the coatings and assist the optimization of deposition conditions for high quality TiAlN/CrN coatings.展开更多
基金supported by the Ministry of Industry and Information Technology of China(No.2009ZX04012-32)the International Cooperation Program of Ministry of Science and Technology of China(No.2011DFR50580)
文摘Multilayered TiAlN/CrN coatings have been synthesized on stainless steel substrates by cathodic arc plasma deposition using TiAl and Cr targets.Influences of the bias voltage,cathode current ratio ITiAl/ICr,and deposition pressure on the hardness and friction coefficient of the coatings were investigated.The measurement revealed existence of two cubic phases,face-centercubic （Cr,Al）N and（Ti,Al）N,in the coatings deposited under various bias voltages except for the coating deposited at -400 V,which is amorphous.The hardness of the coatings was strongly dependent on the Itial/Icr ratio and deposition pressure,and reached a maximum of 33 GPa at an ITiAI/ICr ratio of 1.0 and a pressure of 1.0 Pa.The incorporation of the element chromium can reduce the density of pinholes in the coatings and assist the optimization of deposition conditions for high quality TiAlN/CrN coatings.
