Development of Debris-free Laser Plasma Sources for EUV Lithography in CIOMP

We have been developing debris-free laser plasma sources for EUV lithography since 1996. Two types of debris-free sources, such as cryogenic target and gas-puff target laser plasma sources, were designed and built up in CIOMP. EUV radiation spectra of the sources with a variety of targets have been obtained by different ways.

约瑟夫森电压标准的低温系统

主要介绍了采用G-M制冷机作为冷源,可以随时启停的用于约瑟夫森电压标准的低温系统,介绍了系统组成工作原理及技术难点的解决方法并给出了测量结果。结果表明该低温连系统的研制成功并启用,有效的降低了约瑟夫森阵列电压标准的运行费用,提高了经济效益。由于采用了自动化控制技术,实现了运行系统的全自动化运行模式,简化了操作步骤,提高了工作效率。