采用DC Arc Plasma JetCVD方法沉积微/纳米复合自支撑金刚石膜

在30kW级直流电弧等离子体喷射化学气相沉积(DC Arc P lasm a Jet CVD)设备上,采用Ar-H2-CH4混合气体,通过调节甲烷浓度以及控制其他沉积参数,在Mo衬底上沉积出微/纳米复合自支撑金刚石膜。实验表明,当微米金刚石膜层沉积结束后,在随后的沉积中,随着甲烷浓度的增加,金刚石膜表面的晶粒大小是逐渐减小的。当甲烷浓度达到20%以上时,金刚石膜生长面晶粒呈现菜花状的小晶团,膜体侧面已经没有了粗大的柱状晶,而是呈现出光滑的断口,对该层进行拉曼谱分析显示,位于1145 cm-1附近有一定强度的散射峰出现。这说明所沉积的晶粒全部变为纳米级尺寸。

Comparison of Reynolds average Navier-Stokes turbulence models in numerical simulations of the DC arc plasma torch

Five turbulence models of Reynolds average Navier-Stokes(RANS),including the standard k-ω model,the RNG k-e model taking into account the low Reynolds number effect,the realizable k-ω model,the SST k-ω model,and the Reynolds stress model(RSM),are employed in the numerical simulations of direct current(DC)arc plasma torches in the range of arc current from 80 A to 240 A and air gas flow rate from 10 m^3 h^-1 to 50 m^3 h^-1.The calculated voltage,electric field intensity,and the heat loss in the arc chamber are compared with the experiments.The results indicate that the arc voltage,the electric field,and the heat loss in the arc chamber calculated by using the standard k-ω model,the RNG k-ωmodel taking into account the low Reynolds number effect,and the realizable k-ω model are much larger than those in the experiments.The RSM predicts relatively close results to the experiments,but fails in the trend of heat loss varying with the gas flow rate.The calculated results of the SST k-ω model are in the best agreement with the experiments,which may be attributed to the reasonable predictions of the turbulence as well as its distribution.

Diagnosis of gas phase near the substrate surface in diamond film deposition by high-power DC arc plasma jet CVD

Optical emission spectroscopy （OES） was used to study the gas phase composition near the substrate surface during diamond deposition by high-power DC arc plasma jet chemical vapor deposition （CVD）. C2 radical was determined as the main carbon radical in this plasma atmosphere. The deposition parameters, such as substrate temperature, anode-substrate distance, methane concentration, and gas flow rate, were inspected to find out the influence on the gas phase. A strong dependence of the concentrations and distribution of radicals on substrate temperature was confirmed by the design of experiments （DOE）. An explanation for this dependence could be that radicals near the substrate surface may have additional ionization or dissociation and also have recombination, or are consumed on the substrate surface where chemical reactions occur.

Effects of deposition parameters on microstructure and thermal conductivity of diamond films deposited by DC arc plasma jet chemical vapor deposition

The uniform diamond films with 60 mm in diameter were deposited by improved DC arc plasma jet chemical vapor deposition technique. The structure of the film was characterized by scanning electronic microcopy(SEM) and laser Raman spectrometry. The thermal conductivity was measured by a photo thermal deflection technique. The effects of main deposition parameters on microstructure and thermal conductivity of the films were investigated. The results show that high thermal conductivity, 10.0 W/(K·cm), can be obtained at a CH4 concentration of 1.5% (volume fraction) and the substrate temperatures of 880-920 ℃ due to the high density and high purity of the film. A low pressure difference between nozzle and vacuum chamber is also beneficial to the high thermal conductivity.

Energy Balance in DC Arc Plasma Melting Furnace

In order to treat hazardous municipal solid waste incinerator＇s （MSWI） fly ash, a new DC arc plasma furnace was developed. Taking an arc of 100 V/1000 A DC as an example, the heat transfer characteristics of the DC arc plasma, ablation of electrodes, heat properties of the fly ash during melting, heat transfer characteristics of the flue gas, and heat loss of the furnace were analyzed based on the energy conservation law, so as to achieve the total heat information and energy balance during plasma processing, and to provide a theoretical basis for an optimized design of the structure and to improve energy efficiency.

OES study of the gas phase during diamond films deposition in high power DC arc plasma jet CVD system

This paper used optical emission spectroscopy （OES） to study the gas phase in high power DC arc plasma jet chemical vapour deposition （CVD） during diamond films growth processes. The results show that all the deposition parameters （methane concentration, substrate temperature, gas flow rate and ratio of H2/Ar） could strongly influence the gas phase. C2 is found to be the most sensitive radical to deposition parameters among the radicals in gas phase. Spatially resolved OES implies that a relative high concentration of atomic H exists near the substrate surface, which is beneficial for diamond film growth. The relatively high concentrations of C2 and CH are correlated with high deposition rate of diamond. In our high deposition rate system, C2 is presumed to be the main growth radical, and CH is also believed to contribute the diamond deposition.

Integrated purification of gadolinium and preparation of Gd2O_(3) nanoparticles by DC arc plasma

The rare-earth metal Gd plays an important role in the energy,information,and national defence fields due to its special optical,electrical,magnetic,and catalytic properties.In this study,Gd was purified by direct current(DC)arc plasma,and Gd2O_(3) nanoparticles were prepared via an integration method using purified Gd.The effects of arc current,melting time,gas pressure,and atmosphere on the purification of Gd by DC arc plasma were investigated.With an increase in the arc current and melting time,the rate of removal of impurities from Gd enhances.Moreover,Gd melting was conducted by H_(2)-Ar arc plasma,which improves the impurity removal rate by increasing the H_(2) content.High thermal conductivity and chemical activity of the activated H atoms generated by the dissociation of H_(2) are the main reasons for the significant improvement in the impurity removal rate.The mechanism of Gd purification was analysed based on the above-mentioned experimental results.The as-synthesised Gd2 O_(3) nanoparticles have a uniform spherical structure(average diameter of 32.7 nm),appropriate dispersibility,and high purity.This study provides a new strategy for the integrated purification of metals and preparation of metal/metal-based nanomaterials by DC arc plasma.

3D Numerical Analysis of the Arc Plasma Behavior in a Submerged DC Electric Arc Furnace for the Production of Fused MgO

A three dimensional steady-state magnetohydrodynamic model is developed for the arc plasma in a DC submerged electric arc furnace for the production of fused MgO. The arc is generated in a small semi-enclosed space formed by the graphite electrode, the molten bath and unmelted raw materials. The model is first used to solve a similar problem in a steel making furnace, and the calculated results are found to be in good agreement with the published measurements. The behavior of arcs with different arc lengths is also studied in the furnace for MgO production. From the distribution of the arc pressure on the bath surface it is shown that the arc plasma impingement is large enough to cause a crater-like depression on the surface of the MgO bath. The circulation of the high temperature air under the electrode may enhance the arc efficiency, especially for a shorter arc.

DEPOSITION OF DIAMOND FILMS BY DC ARC PLASMA JET METHOD

Diamond has aroused people’s great interest due to its excellent physical and chemical properties. The development of various low-pressure synthesis methods has offered a bright future to its wide application in many fields. However, the growth rates of the

Diagnosis of Electron,Vibrational and Rotational Temperatures in an Ar/N2 Shock Plasma Jet Produced by a Low Pressure DC Cascade Arc Discharge

In this paper, a low pressure Ar/N2 shock plasma jet with clearly multicycle al- ternating zones produced by a DC cascade arc discharge has been investigated by an emission spectral method combined with Abel inversion analysis. Plasma emission intensity, electron, vi- brational and rotational temperatures of the shock plasma have been measured in the expansion and compression zones. The results indicate that the ranges of the measured electron temperature, vibrational temperature and rotational temperature are 1.1 eV to 1.6 eV, 0.2 eV to 0.7 eV and 0.19 eV to 0.22 eV, respectively, and it is found for the first time that the vibrational and rota- tional temperatures increase while the electron temperature decreases in the compression zones. The electron temperature departs from the vibrational and the rotational temperatures due to non-equilibrium plasma effects. Electrons and heavy particles could not completely exchange energy via collisions in the shock plasma jet under the low pressure of 620 Pa or so.

Diamond Film Synthesis with a DC Plasma Jet:Effect of the Contacting Interface between Substrate and Base on the Substrate Temperature

The contacting interface between the substrate and water-cooled base is vital to the substrate temperature during diamond films deposition by a DC （direct current） plasma jet. The effects of the solid contacting area,conductive materials and fixing between the substrate and the base were investigated without affecting the other parameters. Experimental results indicated that the preferable solid contacting area was more than 60% of total contacting areal; the particular Sn-Pb alloy was more suitable for conducting heat and the concentric fixing ring was a better setting for controlling the substrate temperature. The result was explained in terms of the variable thermal contact resistance at the interface between substrate and base. The diamond films were analyzed by scanning electron microscopy （SEM） for morphology, X-ray diffraction （XRD） for the intensity of characteristic spectroscopy and Raman spectroscopy for structure.

Numerical Study on Arc Plasma Behavior During Arc Commutation Process in Direct Current Circuit Breaker

This paper focuses on the numerical investigation of arc plasma behavior during arc commutation process in a medium-voltage direct current circuit breaker （DCCB） contact system. A three-dimensional magneto-hydrodynamic （MHD） model of air arc plasma in the contact system of a DCCB is developed, based on commercial software FLUENT. Coupled electromagnetic and gas dynamic interactions are considered as usual, and a thin layer of nonlinear electrical resistance elements is used to represent the voltage drop of plasma sheath and the formation of new arc root. The distributions of pressure, temperature, gas flow and current density of arc plasma in arc region are calculated. The simulation results indicate that the pressure distribution related to the contact system has a strong effect on the arc commutation process, arising from the change of electrical conductivity in the arc root region. In DCCB contact system, the pressure of arc root region will be concentrated and higher if the space above the moving contact is enclosed, which is not good for arc root commutation. However, when the region is opened, the pressure distribution would be lower and more evenly, which is favorable for the arc root commutation.

直流电弧等离子体炬数值模拟与诊断

直流电弧等离子体炬内部物理过程复杂且具动态性,较难对其进行准确描述与深入研究,且其工作温度较高,其状态参数难以使用常规方式测量。针对直流电弧等离子体炬,建立流动、传热和电磁相互耦合的数值模型,基于Fluent软件对直流电弧等离子体炬进行三维数值模拟和特性分析,设计并搭建了一套热焓探针实验系统,完成对直流电弧等离子体炬射流参数的测量分析。结果表明:建立的数值模型模拟结果与实验测量结果吻合较好,误差在10%以内;炬内温度与速度最大值与工作气流量呈正相关,均出现在靠近阴极区域,且沿轴线逐渐降低;等离子体炬内高温区与高电流密度区重合。

特征信号图像测速法在超声速多组分等离子体射流中的应用

高速稀薄等离子体流场在航空航天领域有重要的应用.等离子体射流不同于常规的气体或液体的流动,其内部的电离状态、丰富的反应活性、多样的特征尺度、热平衡与非平衡共存等特点导致传统测速方法难以应用.特征信号图像测速法(SSIV)通过将羽流光强波动作为示踪信号来测量流体速度,从而拥有更好的流体跟随性和测量精度.利用低气压(约为100 Pa)直流电弧等离子体实验平台,文章基于特征信号图像测速方法,通过跟踪发生器输入功率周期变化引起的光强波动来测量纯氩以及氩-氦多组分两种工况下的羽流轴向平均速度分布.将中心波长为696.5 nm的窄带滤光片安装到光学镜头上,进一步获取两种工况下氩原子(ArI)单一谱线所对应的射流速度.结果分析表明,相同工况(电功率、气体质量流量及背景气压)下,氩-氦多组分等离子体的射流平均速度显著高于纯氩等离子体射流的平均速度.并且在氩-氦多组分等离子体的射流中,基于整体光强波动得到的射流速度要明显高于基于Ar I特征谱线获得的速度,表明SSIV方法不仅能够测量可压缩等离子体射流的平均速度,还具有分辨不同组分速度场的能力.研究结果展示了特征信号图像测速方法在复杂流场测量中的适用性和优势.

金刚石涂层游动芯头制备及其在铜管生产中的应用

通过沉积方式和旋转装置设计,采用直流电弧等离子体喷射法在硬质合金游动芯头表面均匀沉积金刚石涂层,并利用白光干涉仪、扫描电子显微镜、Raman光谱仪和压痕法对涂层的表面粗糙度、形貌、质量均匀性和膜–基附着力等进行测试分析。结果表明:金刚石涂层抛光后的表面平均粗糙度S_(a)为76.4 nm,金刚石涂层脱落位置到压痕中心的平均距离为287.9μm,且各位置的金刚石涂层厚度均匀性和质量均较好。将制备的金刚石涂层游动芯头应用于高精度精密铜管生产线中,与硬质合金游动芯头对比,其在降低劳动强度、保证铜管一致性和延长芯头使用寿命方面都有显著效果。

大孔径不锈钢薄壁焊管金刚石涂层拉拔模具制备及应用

研究了利用直流电弧等离子体喷射法,在硬质合金拉拔模具表面沉积CVD金刚石涂层。采用孔径测量仪、接触式粗糙度仪和Raman光谱仪对金刚石涂层厚度、表面粗糙度和质量进行了测试分析。结果表明:金刚石涂层厚度d为24.5μm,沉积速率v为2.45μm/h,抛光后定径区表面平均粗糙度Ra为46 nm,拉拔模具入口区、压缩区和定径区在1 332 cm~(-1)附近都有明显的金刚石涂层特征峰。将制备的金刚石涂层拉拔模具应用于不锈钢焊管生产线中,经与硬质合金拉拔模具对比,使用寿命提高200倍,并在环保、降低劳动强度和管材一致性上都有了明显的优势。

大尺寸低损耗金刚石窗片制备及微波窗口封接

为满足长脉冲大功率回旋管研制需求,采用直流电弧等离子体喷射化学气相沉积法合成大尺寸低损耗金刚石厚膜窗片;通过表面金属化和钎焊工艺进行微波窗口的封接。采用法布里-玻罗(Fabry-Perot)开放激励腔、激光导热仪、三维轮廓仪、激光干涉仪等对金刚石窗片介电损耗、热导率、表面平坦度、粗糙度等性能参数进行了表征;采用氦质谱检漏仪、高功率长脉冲微波测试平台测试了窗口气密性和微波吸收特性。实验结果表明,抛光厚度1.36 mm的金刚石窗片具有高尺寸精度,热导率达到17.9~18.7 W·cm^(-1)·K^(-1);波导窗片介电损耗tanδ=1.76×10^(-4),回旋管窗片tanδ=2.6×10^(-4)。计算结果表明,在1 MW微波输入功率下波导窗损耗功率约2.34 kW,窗片中心热应力在安全数值内,相同损耗功率条件下回旋管窗口可承受至少680 kW的输出功率。

Numerical Modeling of the High-Intensity Transferred Arc with a Water-Cooled Constrictor Tube

Stable and axi-symmetrical DC high-intensity transferred arcs with a coaxial water-cooled constrictor tube have been used to study the arc characteristics for many years. All the previous modeling studies concerning the high-intensity transferred arcs were restricted to the near-anode region. Modeling results are presented in this paper concerning the characteristics of the whole high-intensity transferred arc, referring to a recent experiment. It is shown that the computed flow and temperature fields for different flow rates of the working gas are overall similar, but a fully developed flow regime can only be achieved in the water-cooled constrictor tube at low working-gas flow rates. The predicted radial profiles of plasma temperature at the cross section near the constrictor-tube exit compare favorably with available experimental data, but corresponding comparison about the plasma axial-velocity profiles shows appreciable difference, revealing that there may exist considerable errors in the plasma velocity measurements using a sweeping Pitot tube.

电弧法CVD金刚石膜热学性能影响因素分析

金刚石具有极高热导率和超强稳定性,使其在高频大功率器件及电路热沉(散热片)等方面有很大应用前景。在众多金刚石材料制备方法中,电弧法金刚石沉积速度快,沉积面积大且晶体质量相对较高,非常适用于金刚石散热材料快速制备。本文基于金刚石电弧制备方法,主要论述晶界状态、生长工艺、杂质和缺陷等方面对CVD金刚石膜热学性能的影响情况,并提出改善措施建议。

氮氩直流电弧等离子体射流特性实验研究

基于自主研发的等离子体射流性能监测系统,文中通过实验研究了氮氩直流电弧等离子体射流特性:利用基于LabVIEW虚拟仪器技术的监测系统研究了不同氮氩混合比例下直流电弧等离子体射流的弧压、热效率及热焓值特性;利用CCD图像采集与MATLAB图像处理融合技术研究了不同氮氩混合比例下直流电弧等离子体射流长度特性;提出通过钨棒熔断时间表征等离子体射流相对温度的方法,并研究了不同氮氩混合比例下直流电弧等离子体射流在离喷出口5mm处的相对温度变化规律。实验结果表明:氮氩混合比例会对直流电弧等离子体射流特性产生明显影响,具体为直流电弧等离子体的弧压、热效率、热焓值、射流长度、喷口射流温度均随着氮气所占氮氩混合比例的增加呈现出先急剧增加后以某一恒定速率缓慢增加的现象。