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Diagnosis of gas phase near the substrate surface in diamond film deposition by high-power DC arc plasma jet CVD
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作者 Zuyuan Zhou Guangchao Chen +2 位作者 Bin Li Weizhong Tang Fanxiu Lv 《Journal of University of Science and Technology Beijing》 CSCD 2007年第4期365-368,共4页
Optical emission spectroscopy (OES) was used to study the gas phase composition near the substrate surface during diamond deposition by high-power DC arc plasma jet chemical vapor deposition (CVD). C2 radical was ... Optical emission spectroscopy (OES) was used to study the gas phase composition near the substrate surface during diamond deposition by high-power DC arc plasma jet chemical vapor deposition (CVD). C2 radical was determined as the main carbon radical in this plasma atmosphere. The deposition parameters, such as substrate temperature, anode-substrate distance, methane concentration, and gas flow rate, were inspected to find out the influence on the gas phase. A strong dependence of the concentrations and distribution of radicals on substrate temperature was confirmed by the design of experiments (DOE). An explanation for this dependence could be that radicals near the substrate surface may have additional ionization or dissociation and also have recombination, or are consumed on the substrate surface where chemical reactions occur. 展开更多
关键词 gas phase diamond film optical emission spectroscopy substrate surface high power dc arc plasma jet chemical vapor deposition
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