期刊文献+
共找到2篇文章
< 1 >
每页显示 20 50 100
Numerical simulation of a direct current glow discharge in atmospheric pressure helium 被引量:1
1
作者 尹增谦 汪岩 +2 位作者 张盼盼 张琦 李雪辰 《Chinese Physics B》 SCIE EI CAS CSCD 2016年第12期332-336,共5页
Characteristics of a direct current (DC) discharge in atmospheric pressure helium are numerically investigated based on a one-dimensional fluid model. The results indicate that the discharge does not reach its stead... Characteristics of a direct current (DC) discharge in atmospheric pressure helium are numerically investigated based on a one-dimensional fluid model. The results indicate that the discharge does not reach its steady state till it takes a period of time. Moreover, the required time increases and the current density of the steady state decreases with increasing the gap width. Through analyzing the spatial distributions of the electron density, the ion density and the electric field at different discharge moments, it is found that the DC discharge starts with a Townsend regime, then transits to a glow regime. In addition, the discharge operates in a normal glow mode or an abnormal glow one under different parameters, such as the gap width, the ballast resistors, and the secondary electron emission coefficients, judged by its voltage-current characteristics. 展开更多
关键词 direct current discharge one-dimensional fluid model Townsend regime glow regime
下载PDF
Growth of mirror-like ultra-nanocrystalline diamond(UNCD)films by a facile hybrid CVD approach
2
作者 阳硕 满卫东 +3 位作者 吕继磊 肖雄 游志恒 江南 《Plasma Science and Technology》 SCIE EI CAS CSCD 2017年第5期74-79,共6页
In this study, growth of mirror-like ultra-nanocrystalline diamond(UNCD) films by a facile hybrid CVD approach was presented. The nucleation and deposition of UNCD films were conducted in microwave plasma CVD(MPCVD... In this study, growth of mirror-like ultra-nanocrystalline diamond(UNCD) films by a facile hybrid CVD approach was presented. The nucleation and deposition of UNCD films were conducted in microwave plasma CVD(MPCVD) and direct current glow discharge CVD(DC GD CVD) on silicon substrates, respectively. A very high nucleation density(about 1×10^11 nuclei cm^-2) was obtained after plasma pretreatment. Furthermore, large area mirrorlike UNCD films of Φ 50 mm were synthesized by DC GD CVD. The thickness and grain size of the UNCD films are 24 μm and 7.1 nm, respectively. In addition, the deposition mechanism of the UNCD films was discussed. 展开更多
关键词 plasma pretreatment microwave plasma CVD direct current glow discharge CVD ultra-nanocrystalline diamond films
下载PDF
上一页 1 下一页 到第
使用帮助 返回顶部