Atom lithography is a unique method to fabricate self-traceable pitch standards and angle standards,but extending its structure area to millimeter-level for application is challenging.In this paper,on the one hand,we ...Atom lithography is a unique method to fabricate self-traceable pitch standards and angle standards,but extending its structure area to millimeter-level for application is challenging.In this paper,on the one hand,we put forward a new approach to fabricate a full-covered self-traceable Cr nanograting by inserting and scanning a Dove prism in the Gaussian beam direction of atom lithography.On the other hand,we extend the structure area along the standing-wave direction by splicing two-step atom deposition.Both nanostructures manufactured via scanning atom lithography and splicing atom lithography demonstrate good pitch accuracy,parallelism,continuity,and homogeneity,which opens a new way to fabricate centimeter-level full-covered self-traceable nanograting and lays the basis for the application of square ruler and optical encoders at the nanoscale.展开更多
基金supported by Significant Development Project of Shanghai Zhangjiang National Innovation Benchmarking Zone(Grant No.ZJ2021-ZD-008)National Natural Science Foundation of China(Grant No.62075165)+3 种基金Science and Technology Commission of Shanghai(Grant No.208014043)Shanghai Municipal Science and Technology Major Project(2021SHZDZX0100)the Fundamental Research Funds for the Central UniversitiesOpening Fund from Shanghai Key Laboratory of Online Detection and Control Technology of SIMT.
文摘Atom lithography is a unique method to fabricate self-traceable pitch standards and angle standards,but extending its structure area to millimeter-level for application is challenging.In this paper,on the one hand,we put forward a new approach to fabricate a full-covered self-traceable Cr nanograting by inserting and scanning a Dove prism in the Gaussian beam direction of atom lithography.On the other hand,we extend the structure area along the standing-wave direction by splicing two-step atom deposition.Both nanostructures manufactured via scanning atom lithography and splicing atom lithography demonstrate good pitch accuracy,parallelism,continuity,and homogeneity,which opens a new way to fabricate centimeter-level full-covered self-traceable nanograting and lays the basis for the application of square ruler and optical encoders at the nanoscale.
