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Dual material gate doping-less tunnel FET with hetero gate dielectric for enhancement of analog/RF performance
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作者 Sunny Anand R.K.Sarin 《Journal of Semiconductors》 EI CAS CSCD 2017年第2期31-37,共7页
In this paper, charge-plasma-based tunnel FET is proposed by employing dual material gate with hetero gate dielectric technique and it is named hetero-dielectric dual material gate doping-less TFET(HD_DMG_DLTFET). I... In this paper, charge-plasma-based tunnel FET is proposed by employing dual material gate with hetero gate dielectric technique and it is named hetero-dielectric dual material gate doping-less TFET(HD_DMG_DLTFET). It is compared with conventional doping-less TFET(DLTFET) and dual material gate doping-less TFET(DMG_DLTFET) on the basis of analog and RF performance. The HD_DMG_DLTFET provides better ON state current(I_(ON) =94 μA/ μm), I_(ON)/I_(OFF)(≈1.36×10^(13)), point(≈3 mV/dec) and average subthreshold slope(AV-SSD40.40 mV/dec). The proposed device offers low total gate capacitance(C_(gg)/ along with higher drive current. However, with a better transconductance(g_m) and cut-off frequency(f_T), the HD_DMG_DLTFET can be a good candidate for RF circuitry. The early voltage(V_(EA)/ and output conductance(gd/ are also moderate for the proposed device with comparison to other devices and therefore can be a candidate for analog devices.From all these simulation results and their study, it is observed that HD_DMG_DLTFET has improved analog/RF performance compared to DLTFET and DMG_DLTFET. 展开更多
关键词 hetero-gate dielectric material dual material gate doping-less TFET average subthreshold slope analog FOM
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