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Atomic-Oxygen Beam Source with Compact ECR Plasma
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作者 任兆杏 沈克明 吕庆敖 《Plasma Science and Technology》 SCIE EI CAS CSCD 2002年第6期1545-1550,共6页
An atomic-oxygen beam source with compact ECR plasma was successfully investigated. The microwave was produced and transmitted in a coaxial mode, and coupled with the loop. The plasma was produced at a higher asymmetr... An atomic-oxygen beam source with compact ECR plasma was successfully investigated. The microwave was produced and transmitted in a coaxial mode, and coupled with the loop. The plasma was produced at a higher asymmetry magnetic mirror field, and neutralized with the molybdenum target at a lower asymmetry magnetic mirror field. The magnetic field was constituted with permanent magnets. This source has a higher flux density of atom beam, a lower operating pressure, a smaller power consumption and low-cost. When it was installed at the equipment to study the interaction of the beam with the surface, the operation was carried out very easily and with a good stability. 展开更多
关键词 ecr plasma atomic-oxygen beam source
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Continuous operation of 2.45-GHz microwave proton source for 306 hours with more than 50 mA DC beam 被引量:1
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作者 彭士香 张艾霖 +6 位作者 任海涛 张滔 徐源 张景丰 龚建华 郭之虞 陈佳洱 《Chinese Physics B》 SCIE EI CAS CSCD 2015年第7期327-329,共3页
This paper describes a long-term operation of the 2.45-GHz microwave proton source at Peking University. The DC proton beam of 50–55 mA with energy of 35 keV has been run for 306 hours continuously. Total beam availa... This paper describes a long-term operation of the 2.45-GHz microwave proton source at Peking University. The DC proton beam of 50–55 mA with energy of 35 keV has been run for 306 hours continuously. Total beam availability,defined as 35-keV beam-on time divided by elapsed time, is higher than 99%. Water cooling machine failures cause all the downtime, and no plasma generator failure or high voltage breakdown is observed. The longest uninterrupted run time is122 hours. 展开更多
关键词 ecr ion source DC proton beam plasma generator failure high voltage breakdown
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A miniaturized 2.45 GHz ECR ion source at Peking University 被引量:1
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作者 Jia-Mei Wen Shi-Xiang Peng +6 位作者 Hai-Tao Ren Tao Zhang Jing-Feng Zhang Wen-Bin Wu Jiang Sun Zhi-Yu Guo Jia-Er Chen 《Chinese Physics B》 SCIE EI CAS CSCD 2018年第5期374-377,共4页
A miniaturized 2.45 GHz permanent magnet electron cyclotron resonance(PMECR) ion source, which has the ability of producing a tens-m A H+beam, has been built and tested at Peking University(PKU). Its plasma chamb... A miniaturized 2.45 GHz permanent magnet electron cyclotron resonance(PMECR) ion source, which has the ability of producing a tens-m A H+beam, has been built and tested at Peking University(PKU). Its plasma chamber dimension is Φ30 mm×40 mm and the whole size of the ion source is Φ180 mm×130 mm. This source has a unique structure with the whole source body embedded into the extraction system. It can be operated in both continuous wave(CW) mode and pulse mode. In the CW mode, more than 20 m A hydrogen ion beam at 40 k V can be obtained with the microwave power of 180 W and about 1 m A hydrogen ion beam is produced with a microwave power of 10 W. In the pulse mode, more than50 m A hydrogen ion beam with a duty factor of 10% can be extracted when the peak microwave power is 1800 W. 展开更多
关键词 miniaturized ecr ion source hydrogen plasma continuous wave (CW) beam pulse beam
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2.45GHz ECR强流等离子体源核心部件设计与实验研究 被引量:1
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作者 李钢 陈根 +2 位作者 段文学 彭标 尉传颂 《原子与分子物理学报》 北大核心 2024年第5期94-100,共7页
电子回旋共振(Electron Cyclotron Resonance,ECR)等离子体源能产生高电荷态离子、高流强的单电荷态离子,提供稳定的束流和良好的重复性.核心部件的设计对ECR等离子体源是至关重要的,磁场对等离子体的生成和分布有直接影响,良好的磁场... 电子回旋共振(Electron Cyclotron Resonance,ECR)等离子体源能产生高电荷态离子、高流强的单电荷态离子,提供稳定的束流和良好的重复性.核心部件的设计对ECR等离子体源是至关重要的,磁场对等离子体的生成和分布有直接影响,良好的磁场可以提高等离子体的性能和效率.采用有限元分析方法对ECR等离子体源磁场进行分析与设计,得到了满足设计需求与目标的磁场位形,通过高斯计对设计的永磁环轴向磁场精确测量,发现磁场仿真结果与实验结果吻合比较好,只是轴向磁场最大值及对应位置上有点偏差.通过集成实验,研究核心部件对离子源引出束流强度的影响,引出束流稳定且强度达到7 mA. 展开更多
关键词 ecr等离子体源 磁场设计 引出束流
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Practical 2.45-GHz microwave-driven Cs-free Hˉ ion source developed at Peking University 被引量:2
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作者 Tao Zhang Shi-Xiang Peng +8 位作者 Wen-Bin Wu Hai-Tao Ren Jing-Feng Zhang Jia-Mei Wen Teng-Hao Ma Yao-Xiang Jiang Jiang Sun Zhi-Yu Guo Jia-Er Chen 《Chinese Physics B》 SCIE EI CAS CSCD 2018年第10期477-483,共7页
A practical 2.45-GHz microwave-driven Cs-free H^- source was improved based on the experimental H^- source at Peking University(PKU). Several structural improvements were implemented to meet the practical requiremen... A practical 2.45-GHz microwave-driven Cs-free H^- source was improved based on the experimental H^- source at Peking University(PKU). Several structural improvements were implemented to meet the practical requirements of Xi'an Proton Application Facility(XiPaf). Firstly, the plasma chamber size was optimized to enhance the plasma intensity and stability. Secondly, the filter magnetic field and electron deflecting magnetic field were enhanced to reduce co-extracted electrons. Thirdly, a new two-electrode extraction system with farther electrode gap and enhanced water cooling ability to diminish spark and sputter during beam extraction was applied. At last, the direct H^- current measuring method was adopted by the arrangement of a new pair of bending magnets before Faraday cup(FC) to remove residual electrons. With these improvements, electron cyclotron resonance(ECR) magnetic field optimization experiments and operation parameter variation experiments were carried out on the H^- ion source and a maximum 8.5-mA pure H^- beam was extracted at 50 kV with the time structure of 100 Hz/0.3 ms. The root-mean-square(RMS) emittance of the beam is 0.25 Π·mm·mrad. This improved H^- source and extraction system were maintenance-free for more than 200 hours in operation. 展开更多
关键词 electron cyclotron resonance ecr ion source hydrogen plasma negative ion beam plasma application
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深亚微米/纳米CMOS器件离子蚀刻新技术
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作者 成立 王振宇 +3 位作者 武小红 范木宏 祝俊 赵倩 《半导体技术》 CAS CSCD 北大核心 2005年第1期35-40,共6页
综述了制备深亚微米/纳米CMOS器件的离子蚀刻新技术:考夫曼(Kaufman)离子铣蚀刻、氟基气体多晶硅蚀刻、氯基或溴基气体硅深蚀刻、电子回旋共振(ECR)蚀刻系统和电感耦合等离子体蚀刻器(ICPE)等,并对比分析了上述蚀刻技术各自的优缺点及... 综述了制备深亚微米/纳米CMOS器件的离子蚀刻新技术:考夫曼(Kaufman)离子铣蚀刻、氟基气体多晶硅蚀刻、氯基或溴基气体硅深蚀刻、电子回旋共振(ECR)蚀刻系统和电感耦合等离子体蚀刻器(ICPE)等,并对比分析了上述蚀刻技术各自的优缺点及其应用要点。 展开更多
关键词 超大规模集成电路 纳米CMOS器件 离子束蚀刻 考夫曼离子源 电子回旋共振 电感耦合等离子体蚀刻器
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微波电子回旋共振等离子体技术及其应用 被引量:4
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作者 甄汉生 《真空科学与技术》 CSCD 1993年第2期79-86,共8页
微波电子回旋共振等离子体是淀积薄膜、微细加工和材料表面改性的一种重要手段。由于这种等离子体电离水平高,化学活性好,可以用来实现基片上薄膜的室温化学气相淀积和反应离子刻蚀,因此对于微电子学、光电子学和薄膜传感器件的发展,这... 微波电子回旋共振等离子体是淀积薄膜、微细加工和材料表面改性的一种重要手段。由于这种等离子体电离水平高,化学活性好,可以用来实现基片上薄膜的室温化学气相淀积和反应离子刻蚀,因此对于微电子学、光电子学和薄膜传感器件的发展,这种等离子体会具有重要的意义。此外,采用微波电子回旋共振等离子体原理,没有灯丝的离子源可以提高离子源的使用寿命,可以增加离子束的束流密度。可以确信,微波电子回旋共振等离子体的发展,将把离子源技术提高到一个新的水平。显然,这必将对材料表面改性工艺,包括离子注入掺杂等工艺的发展发挥作用。自从1985年以来,为了得到大容积等离子体而发展了微波电子回旋共振多磁极等离子体,这些技术在薄膜技术、微细加工以及材料表面改性中的应用前景是乐观的。我们将在本文中,介绍微波电子回旋共振等离子体的原理及其应用。 展开更多
关键词 等离子体 电子回旋共振 微波
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3^(rd) and 4^(th) Generation ECRIS:Some Possible Scenarios
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作者 S.Gammino 《Chinese Physics C》 SCIE CAS CSCD 北大核心 2007年第S1期137-141,共5页
Since the end of’70s the Electron Cyclotron Resonance ion sources(ECRIS)allowed to increase both the energy and intensity of the beams available from different types of accelerators;perspectives for the future are st... Since the end of’70s the Electron Cyclotron Resonance ion sources(ECRIS)allowed to increase both the energy and intensity of the beams available from different types of accelerators;perspectives for the future are still optimistic.It is commonly agreed that only some ECRIS parameters have been fully exploited, whether some others are still not efficiently used,or not understood.The developments in the last 20 years have followed the so called Standard Model and the availability of higher frequency generators and higher field magnets have permitted relevant increase;the use of Nb_3Sn may extend the range.The availability of new schemes of microwave coupling to plasma is promising,and the focusing of the electromagnetic wave towards the chamber axis may improve the density of warm electron population.The paper will also describe some critical point of the 3^(rd) generation ECRIS(including technological troubles and limits)and the scenario for future 4^(th) generation ECRIS,operating at f=56—75GHz,to be built in 2010s. 展开更多
关键词 ecr ION sources plasma microwaves ION beamS SUPERCONDUCTING MAGNETS
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