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A Novel Semiconductor CIGS Photovoltaic Material and Thin-Film ED Technology 被引量:10
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作者 ZHENG Guang fu 1,YANG Hong xing 1,MAN Cheuk ho 1,WONG Wing lok 2, AN Da wei 1 and John BURNETT 1(1 Centre for Development of Solar Energy Technology,Department of Building Services Engineering, The Hong Kong Polytechnic University,Hong Kong,C 《Journal of Semiconductors》 EI CAS CSCD 北大核心 2001年第11期1357-1363,共7页
In order to achieve low cost high efficiency thin film solar cells,a novel Semiconductor Photovoltaic (PV) active material CuIn 1-x Ga x Se 2 (CIGS) and thin film Electro Deposition (ED) technology is explored.Firstly... In order to achieve low cost high efficiency thin film solar cells,a novel Semiconductor Photovoltaic (PV) active material CuIn 1-x Ga x Se 2 (CIGS) and thin film Electro Deposition (ED) technology is explored.Firstly,the PV materials and technologies is investigated,then the detailed experimental processes of CIGS/Mo/glass structure by using the novel ED technology and the results are reported.These results shows that high quality CIGS polycrystalline thin films can be obtained by the ED method,in which the polycrystalline CIGS is definitely identified by the (112),(204,220) characteristic peaks of the tetragonal structure,the continuous CIGS thin film layers with particle average size of about 2μm of length and around 1 6μm of thickness.The thickness and solar grade quality of CIGS thin films can be produced with good repeatability.Discussion and analysis on the ED technique,CIGS energy band and sodium (Na) impurity properties,were also performed.The alloy CIGS exhibits not only increasing band gap with increasing x ,but also a change in material properties that is relevant to the device operation.The beneficial impurity Na originating from the low cost soda lime glass substrate becomes one prerequisite for high quality CIGS films.These novel material and technology are very useful for low cost high efficiency thin film solar cells and other devices. 展开更多
关键词 半导体光电材料 薄膜 ed技术
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氧化膜形貌对铝电解电容器寿命的影响 被引量:1
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作者 黄彩韶 《世界有色金属》 2017年第13期230-230,232,共2页
本文通过对三种化成铝箔采用SEM与EDS技术工具分析,分析研究三种低压阳极化成铝箔的形貌与组分,并用该三种铝箔制作100V/47u F低压电容器,进而进行耐久性试验比较分析,对化成铝箔氧化膜形貌与电容器性能的影响关系进行研究,试验比较发现... 本文通过对三种化成铝箔采用SEM与EDS技术工具分析,分析研究三种低压阳极化成铝箔的形貌与组分,并用该三种铝箔制作100V/47u F低压电容器,进而进行耐久性试验比较分析,对化成铝箔氧化膜形貌与电容器性能的影响关系进行研究,试验比较发现,氧化膜对铝电解电容器寿命的影响较大,主要表现在氧化膜上的羟基过多,影响漏电流。 展开更多
关键词 氧化膜形貌 铝电解电容器 SEM技术 eds技术 性能影响
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