2017年9月,在比利时布鲁塞尔举办的Labelexpo Europe 2017展会同期,隶属于瑞士上市公司COMET集团公司的ebeam Technologies事业部出品的紧凑型固化单元荣获了'2017标签工业全球大奖'4个重量级奖项之一的'可持续发展大奖...2017年9月,在比利时布鲁塞尔举办的Labelexpo Europe 2017展会同期,隶属于瑞士上市公司COMET集团公司的ebeam Technologies事业部出品的紧凑型固化单元荣获了'2017标签工业全球大奖'4个重量级奖项之一的'可持续发展大奖',该奖项表彰了ebeam在研发适用于窄幅轮转印刷机的紧凑型电子束固化系统方面的努力。展开更多
Technology roadmaps have been a part of the semiconductor industry for many years.The first roadmap was Moore’s law,which started as an empirical observation that competitive forces then turned into a prediction that...Technology roadmaps have been a part of the semiconductor industry for many years.The first roadmap was Moore’s law,which started as an empirical observation that competitive forces then turned into a prediction that became an industry roadmap.Then the ITRS roadmap was developed and for many years was used by leading edge semiconductor producers to drive new technology they needed.Now there is the IRDS roadmap,which projects semiconductor end user requirements and develops a technology roadmap based on those requirements.The 2017 IRDS roadmap was just released.To prepare the roadmap,we received input from experts around the world.The roadmap predicts that the requirements of high performance logic will drive the development of different device structures in logic chips.Memory technology will also advance but is more focused on cost than high performance logic is.Because of this,there may be a split in the patterning roadmaps for different types of devices.Logic will adopt EUV and its extensions,while flash memory will consider nanoimprint.Directed self-assembly and direct write e-beam are also being developed.DSA has the potential to improve CD uniformity and lower costs.Direct write e-beam promises to make personalization of chips more feasible.DRAM memory will trail logic in critical dimensions and will adopt EUV when it becomes cost effective.The lithography community will both have to make EUV work and overcome the challenges of randomness in CDs and resist performance,while memory will try to make nanoimprint a reliable and low defect method of patterning.Long term,logic is expected to start focusing on 3D architectures in the late 2020’s.This will put a tremendous stress on the yield of patterning processes and on reducing the number of process steps that are required.It will also put more focus on hole type patterns,which will become one of the key patterning challenges in the future.展开更多
The potato/tomato psyllid Bactericera cockerelli causes serious damage to several solanaceous crops by direct feeding and vectoring Candidatus Liberibacter solanacearum,a bacterial pathogen.Electron beam(eBeam)irradia...The potato/tomato psyllid Bactericera cockerelli causes serious damage to several solanaceous crops by direct feeding and vectoring Candidatus Liberibacter solanacearum,a bacterial pathogen.Electron beam(eBeam)irradiation is an environmentally friendly,chemical-free alternative method that is increasing in use for disinfestation of insect pests.We hypothesize that this irradiation technology will have detrimental effects on potato psyllid and thus impede its disease vectoring.To this end,we explored the effects of eBeam treatment ranging from 50 to 500 Gy on survival,development and reproduction of this pest.Impact on psyllids was apparently dose-dependent.When irradiated at 350 Gy,eggs could not hatch,1st instar nymphs failed to emerge,and although a small portion of irradiated 5th instar nymphs survived,the emerged adults were mostly deformed.Abnormality in eclosed adults suggests harmful effects of eBeam on metamorphosis.Reproduction was seriously impaired when female psyllids were exposed to eBeam at the 5th instar nymphal or young adult stage,presumably due to inability to form oocytes.In addition,reciprocal crosses between irradiated and untreated psyllids indicated that female psyllids were more radiosensitive than males to eBeam.Taken together,these findings indicate that eBeam negatively impacted potato psyllid development and reproduction,which would inevitably compromise its disease transmission capacity.A dose of 350 Gy can be considered as a reference dose for effective control of potato psyllids.展开更多
文摘2017年9月,在比利时布鲁塞尔举办的Labelexpo Europe 2017展会同期,隶属于瑞士上市公司COMET集团公司的ebeam Technologies事业部出品的紧凑型固化单元荣获了'2017标签工业全球大奖'4个重量级奖项之一的'可持续发展大奖',该奖项表彰了ebeam在研发适用于窄幅轮转印刷机的紧凑型电子束固化系统方面的努力。
文摘Technology roadmaps have been a part of the semiconductor industry for many years.The first roadmap was Moore’s law,which started as an empirical observation that competitive forces then turned into a prediction that became an industry roadmap.Then the ITRS roadmap was developed and for many years was used by leading edge semiconductor producers to drive new technology they needed.Now there is the IRDS roadmap,which projects semiconductor end user requirements and develops a technology roadmap based on those requirements.The 2017 IRDS roadmap was just released.To prepare the roadmap,we received input from experts around the world.The roadmap predicts that the requirements of high performance logic will drive the development of different device structures in logic chips.Memory technology will also advance but is more focused on cost than high performance logic is.Because of this,there may be a split in the patterning roadmaps for different types of devices.Logic will adopt EUV and its extensions,while flash memory will consider nanoimprint.Directed self-assembly and direct write e-beam are also being developed.DSA has the potential to improve CD uniformity and lower costs.Direct write e-beam promises to make personalization of chips more feasible.DRAM memory will trail logic in critical dimensions and will adopt EUV when it becomes cost effective.The lithography community will both have to make EUV work and overcome the challenges of randomness in CDs and resist performance,while memory will try to make nanoimprint a reliable and low defect method of patterning.Long term,logic is expected to start focusing on 3D architectures in the late 2020’s.This will put a tremendous stress on the yield of patterning processes and on reducing the number of process steps that are required.It will also put more focus on hole type patterns,which will become one of the key patterning challenges in the future.
基金the AgriLife Research Insect Vector Diseases Grant Programthe USDA-AFRI grant(2014-67013-21781)+1 种基金USDA-APHIS(AP18PPQS&T00C235)China Scholarship Council.
文摘The potato/tomato psyllid Bactericera cockerelli causes serious damage to several solanaceous crops by direct feeding and vectoring Candidatus Liberibacter solanacearum,a bacterial pathogen.Electron beam(eBeam)irradiation is an environmentally friendly,chemical-free alternative method that is increasing in use for disinfestation of insect pests.We hypothesize that this irradiation technology will have detrimental effects on potato psyllid and thus impede its disease vectoring.To this end,we explored the effects of eBeam treatment ranging from 50 to 500 Gy on survival,development and reproduction of this pest.Impact on psyllids was apparently dose-dependent.When irradiated at 350 Gy,eggs could not hatch,1st instar nymphs failed to emerge,and although a small portion of irradiated 5th instar nymphs survived,the emerged adults were mostly deformed.Abnormality in eclosed adults suggests harmful effects of eBeam on metamorphosis.Reproduction was seriously impaired when female psyllids were exposed to eBeam at the 5th instar nymphal or young adult stage,presumably due to inability to form oocytes.In addition,reciprocal crosses between irradiated and untreated psyllids indicated that female psyllids were more radiosensitive than males to eBeam.Taken together,these findings indicate that eBeam negatively impacted potato psyllid development and reproduction,which would inevitably compromise its disease transmission capacity.A dose of 350 Gy can be considered as a reference dose for effective control of potato psyllids.
