Relative Irradiance Measurement and Bonding Configurations of Amorphous Fluorinated Carbon Films Deposited by Electron Cyclotron Resonance Plasma

a-C:F films are deposited by microwave electron cyclotron resonance (ECR)plasma chemical vapor deposition (CVD) using trifluoromethane (CHF3) and benzene (C6H6) as source gases at different microwave powers. The radicals in plasma originating from source gases dissociation are analyzed by relative irradiance measurement. The bonding configurations and binding state of a-C:F films are measured with Fourier-transformed infrared spectrometer (FTIR) and x-ray photoelectron spectroscopy (XPS). The results show that a-C:F films are mainly composed of CF radical at lower powers but of CF2 radical at higher powers. The deposition of films is related to the radicals generated in plasma and the main bonding configurations are dependent on the ratio of CF to CF2 radicals in films.

Simulation of nonlinear behavior in an electron cyclotron resonance plasma

Some nonlinear behavior in electron cyclotron resonance plasma was investigated using a two-dimension hybrid-mode with self-consistent microwave absorption. The saturation,oscillations of plasma parameters (plasma density, potential, electron temperature) versus operating conditions (pressure, power) are discussed. Our simulation results are consistent qualitatively with many experimental measurements.

Correlation ofⅢ/Ⅴsemiconductor etch results with physical parameters of high-density reactive plasmas excited by electron cyclotron resonance

Reactive ion etching is the interaction of reactive plasmas with surfaces. To obtain a detailed understanding of this process, significant properties of reactive composite low-pressure plasmas driven by electron cyclotron resonance（ECR） were investigated and compared with the radial uniformity of the etch rate. The determination of the electronic properties of chlorine-and hydrogen-containing plasmas enabled the understanding of the pressure-dependent behavior of the plasma density and provided better insights into the electronic parameters of reactive etch gases. From the electrical evaluation of I（V） characteristics obtained using a Langmuir probe,plasmas of different compositions were investigated. The standard method of Druyvesteyn to derive the electron energy distribution functions by the second derivative of the I（V）characteristics was replaced by a mathematical model which has been evolved to be more robust against noise, mainly, because the first derivative of the I（V） characteristics is used. Special attention was given to the power of the energy dependence in the exponent. In particular, for plasmas that are generated by ECR with EM modes, the existence of Maxwellian distribution functions is not to be taken as a self-evident fact, but the bi-Maxwellian distribution was proven for Ar-and Kr-stabilized plasmas. In addition to the electron temperature, the global uniform discharge model has been shown to be useful for calculating the neutral gas temperature. To what extent the invasive method of using a Langmuir probe could be replaced with the noninvasive optical method of emission spectroscopy, particularly actinometry, was investigated,and the resulting data exhibited the same relative behavior as the Langmuir data. The correlation with etchrate data reveals the large chemical part of the removal process—most striking when the data is compared with etching in pure argon. Although the relative amount of the radial variation of plasma density and etch rate is approximately ？5%, the etch rate shows a slightly concave shape in contrast to the plasma density.

Interaction between plasma and electromagnetic field in ion source of 10 cm ECR ion thruster

Through diagnosing the plasma density and calculating the intensity of microwave electric field,four 10 cm electron cyclotron resonance(ECR)ion sources with different magnetic field structures are studied to reveal the inside interaction between the plasma,magnetic field and microwave electric field.From the diagnosing result it can be found that the plasma density distribution is controlled by the plasma generation and electron loss volumes associated with the magnetic field and microwave power level.Based on the cold plasma hypothesis and diagnosing result,the microwave electric field intensity distribution in the plasma is calculated.The result shows that the plasma will significantly change the distribution of the microwave electric field intensity to form a bow shape.From the boundary region of the shape to the center,the electric field intensity varies from higher to lower and the diagnosed density inversely changes.If the bow and its inside lower electric field intensity region are close to the screen grid,the performance of ion beam extracting will be better.The study can provide useful information for the creating of 10 cm ECR ion source and understanding its mechanism.

Understanding hydrogen plasma processes based on the diagnostic results of 2.45 GHz ECRIS at Peking University

Optical emission spectroscopy（OES）, as a simple in situ method without disturbing the plasma, has been performed for the plasma diagnosis of a 2.45 GHz permanent magnet electron cyclotron resonance（PMECR） ion source at Peking University（PKU）. A spectrum measurement platform has been set up with the quartz-chamber electron cyclotron resonance（ECR） ion source [Patent Number： ZL 201110026605.4] and experiments were carried out recently. The electron temperature and electron density inside the ECR plasma chamber have been measured with the method of line intensity ratio of noble gas. Hydrogen plasma processes inside the discharge chamber are discussed based on the diagnostic results. What is more, the superiority of the method of line intensity ratio of noble gas is indicated with a comparison to line intensity ratio of hydrogen. Details will be presented in this paper.

Development of plasma sources for Dipole Research EXperiment(DREX)

Dipole Research EXperiment（DREX） is a new terrella device as part of the Space Plasma Environment Research Facility（SPERF） for laboratory studies of space physics relevant to the inner magnetospheric plasmas. Adequate plasma sources are very important for DREX to achieve its scientific goals. According to different research requirements, there are two density regimes for DREX. The low density regime will be achieved by an electron cyclotron resonance（ECR） system for the ‘whistler/chorus＇ wave investigation, while the high density regime will be achieved by biased cold cathode discharge for the desired ‘Alfvén＇ wave study. The parameters of ‘whistler/chorus＇ waves and ‘Alfvén＇ waves are determined by the scaling law between space and laboratory plasmas in the current device. In this paper, the initial design of these two plasma sources for DREX is described. Focus is placed on the chosen frequency and operation mode of the ECR system which will produce relatively low density ‘artificial radiation belt＇ plasmas and the seed electrons, followed by the design of biased cold cathode discharge to generate plasma with high density.