Relative Irradiance Measurement and Bonding Configurations of Amorphous Fluorinated Carbon Films Deposited by Electron Cyclotron Resonance Plasma

a-C:F films are deposited by microwave electron cyclotron resonance (ECR)plasma chemical vapor deposition (CVD) using trifluoromethane (CHF3) and benzene (C6H6) as source gases at different microwave powers. The radicals in plasma originating from source gases dissociation are analyzed by relative irradiance measurement. The bonding configurations and binding state of a-C:F films are measured with Fourier-transformed infrared spectrometer (FTIR) and x-ray photoelectron spectroscopy (XPS). The results show that a-C:F films are mainly composed of CF radical at lower powers but of CF2 radical at higher powers. The deposition of films is related to the radicals generated in plasma and the main bonding configurations are dependent on the ratio of CF to CF2 radicals in films.

Simulation of nonlinear behavior in an electron cyclotron resonance plasma

Some nonlinear behavior in electron cyclotron resonance plasma was investigated using a two-dimension hybrid-mode with self-consistent microwave absorption. The saturation,oscillations of plasma parameters (plasma density, potential, electron temperature) versus operating conditions (pressure, power) are discussed. Our simulation results are consistent qualitatively with many experimental measurements.

Correlation ofⅢ/Ⅴsemiconductor etch results with physical parameters of high-density reactive plasmas excited by electron cyclotron resonance

Reactive ion etching is the interaction of reactive plasmas with surfaces. To obtain a detailed understanding of this process, significant properties of reactive composite low-pressure plasmas driven by electron cyclotron resonance（ECR） were investigated and compared with the radial uniformity of the etch rate. The determination of the electronic properties of chlorine-and hydrogen-containing plasmas enabled the understanding of the pressure-dependent behavior of the plasma density and provided better insights into the electronic parameters of reactive etch gases. From the electrical evaluation of I（V） characteristics obtained using a Langmuir probe,plasmas of different compositions were investigated. The standard method of Druyvesteyn to derive the electron energy distribution functions by the second derivative of the I（V）characteristics was replaced by a mathematical model which has been evolved to be more robust against noise, mainly, because the first derivative of the I（V） characteristics is used. Special attention was given to the power of the energy dependence in the exponent. In particular, for plasmas that are generated by ECR with EM modes, the existence of Maxwellian distribution functions is not to be taken as a self-evident fact, but the bi-Maxwellian distribution was proven for Ar-and Kr-stabilized plasmas. In addition to the electron temperature, the global uniform discharge model has been shown to be useful for calculating the neutral gas temperature. To what extent the invasive method of using a Langmuir probe could be replaced with the noninvasive optical method of emission spectroscopy, particularly actinometry, was investigated,and the resulting data exhibited the same relative behavior as the Langmuir data. The correlation with etchrate data reveals the large chemical part of the removal process—most striking when the data is compared with etching in pure argon. Although the relative amount of the radial variation of plasma density and etch rate is approximately ？5%, the etch rate shows a slightly concave shape in contrast to the plasma density.

Interaction between plasma and electromagnetic field in ion source of 10 cm ECR ion thruster

Through diagnosing the plasma density and calculating the intensity of microwave electric field,four 10 cm electron cyclotron resonance(ECR)ion sources with different magnetic field structures are studied to reveal the inside interaction between the plasma,magnetic field and microwave electric field.From the diagnosing result it can be found that the plasma density distribution is controlled by the plasma generation and electron loss volumes associated with the magnetic field and microwave power level.Based on the cold plasma hypothesis and diagnosing result,the microwave electric field intensity distribution in the plasma is calculated.The result shows that the plasma will significantly change the distribution of the microwave electric field intensity to form a bow shape.From the boundary region of the shape to the center,the electric field intensity varies from higher to lower and the diagnosed density inversely changes.If the bow and its inside lower electric field intensity region are close to the screen grid,the performance of ion beam extracting will be better.The study can provide useful information for the creating of 10 cm ECR ion source and understanding its mechanism.

Understanding hydrogen plasma processes based on the diagnostic results of 2.45 GHz ECRIS at Peking University

Optical emission spectroscopy（OES）, as a simple in situ method without disturbing the plasma, has been performed for the plasma diagnosis of a 2.45 GHz permanent magnet electron cyclotron resonance（PMECR） ion source at Peking University（PKU）. A spectrum measurement platform has been set up with the quartz-chamber electron cyclotron resonance（ECR） ion source [Patent Number： ZL 201110026605.4] and experiments were carried out recently. The electron temperature and electron density inside the ECR plasma chamber have been measured with the method of line intensity ratio of noble gas. Hydrogen plasma processes inside the discharge chamber are discussed based on the diagnostic results. What is more, the superiority of the method of line intensity ratio of noble gas is indicated with a comparison to line intensity ratio of hydrogen. Details will be presented in this paper.

Development of plasma sources for Dipole Research EXperiment(DREX)

Dipole Research EXperiment（DREX） is a new terrella device as part of the Space Plasma Environment Research Facility（SPERF） for laboratory studies of space physics relevant to the inner magnetospheric plasmas. Adequate plasma sources are very important for DREX to achieve its scientific goals. According to different research requirements, there are two density regimes for DREX. The low density regime will be achieved by an electron cyclotron resonance（ECR） system for the ‘whistler/chorus＇ wave investigation, while the high density regime will be achieved by biased cold cathode discharge for the desired ‘Alfvén＇ wave study. The parameters of ‘whistler/chorus＇ waves and ‘Alfvén＇ waves are determined by the scaling law between space and laboratory plasmas in the current device. In this paper, the initial design of these two plasma sources for DREX is described. Focus is placed on the chosen frequency and operation mode of the ECR system which will produce relatively low density ‘artificial radiation belt＇ plasmas and the seed electrons, followed by the design of biased cold cathode discharge to generate plasma with high density.

Plasma parameter diagnosis using hydrogen emission spectra of a quartz-chamber 2.45 GHz ECRIS at Peking University

A quartz-chamber 2.45 GHz electron cyclotron resonance ion source(ECRIS) was designed for diagnostic purposes at Peking University [Patent Number: ZL 201110026605.4]. This ion source can produce a maximum 84 m A hydrogen ion beam at 50 k V with a duty factor of 10%. The root-mean-square(RMS) emittance of this beam is less than 0.12π mm mrad. In our initial work,the electron temperature and electron density inside the plasma chamber had been measured with the line intensity ratio of noble gases. Based on these results, the atomic and molecular emission spectra of hydrogen were applied to determine the dissociation degree of hydrogen and the vibrational temperature of hydrogen molecules in the ground state, respectively. Measurements were performed at gas pressures from 4×10^(-4) to 1×10^(-3) Pa and at input peak RF power ranging from 1000 to 1800 W. The dissociation degree of hydrogen in the range of 0.5%-10% and the vibrational temperature of hydrogen molecules in the ground state in the range of 3500-8500 K were obtained. The plasma processes inside this ECRIS chamber were discussed based on these results.

Plasma perturbations in the coexisting environment of VLF transmitter emission, lightning strokes and seismic activity

We analyzed plasma perturbations occurring in the coexisting environment of powerful VLF transmitter emission, intense lightning strokes and strong seismic activity during pregnant period. The results suggest that anomalous electron bursts with energy dispersion in the range of ~100–350 keV, forming the "wisp" signature, are due to cyclotron resonance of electrons with monochromatic waves from the powerful NWC VLF transmitters during nighttime. The intense broad band VLF emissions (up-going 0+ whistlers) are observed while the DEMETER satellite goes through the region of intense thunderstorm activities at mid-latitudes. However, the effects of intense lightning activity and pregnant earthquake have little impact on this kind of stable energy-dispersed electron structures, despite the fact that they are presumably two primary reasons for the particle precipitation in the ionosphere. The case studied here provides us a valuable opportunity to address the various sources triggering the anomalous plasma perturbations in the ionosphere.

Practical 2.45-GHz microwave-driven Cs-free Hˉ ion source developed at Peking University

A practical 2.45-GHz microwave-driven Cs-free H^- source was improved based on the experimental H^- source at Peking University（PKU）. Several structural improvements were implemented to meet the practical requirements of Xi＇an Proton Application Facility（XiPaf）. Firstly, the plasma chamber size was optimized to enhance the plasma intensity and stability. Secondly, the filter magnetic field and electron deflecting magnetic field were enhanced to reduce co-extracted electrons. Thirdly, a new two-electrode extraction system with farther electrode gap and enhanced water cooling ability to diminish spark and sputter during beam extraction was applied. At last, the direct H^- current measuring method was adopted by the arrangement of a new pair of bending magnets before Faraday cup（FC） to remove residual electrons. With these improvements, electron cyclotron resonance（ECR） magnetic field optimization experiments and operation parameter variation experiments were carried out on the H^- ion source and a maximum 8.5-mA pure H^- beam was extracted at 50 kV with the time structure of 100 Hz/0.3 ms. The root-mean-square（RMS） emittance of the beam is 0.25 Π·mm·mrad. This improved H^- source and extraction system were maintenance-free for more than 200 hours in operation.

使用电子回旋波共振等离子体源辅助中频磁控溅射沉积氧化铌薄膜

中频磁控溅射虽相较于电子束蒸发成膜质量更好,但不可避免仍然存在一部分颗粒物,将严重影响光学薄膜的质量和光学特性。研究了使用电子回旋波共振(ECWR)等离子体源作为辅助设备与中频磁控溅射相配合沉积的氧化铌薄膜,进行了等离子体诊断和薄膜表征。结果表明:在相同条件下,ECWR等离子体放电的氧化效果明显优于传统的感应耦合等离子体放电。ECWR等离子体源能够在较低压强的纯氧环境下稳定产生高密度等离子体,无须通过氩气作“引子”来激发维持氧气的稳定放电,展示了电子回旋波共振放电结构的优越性。沉积得到的非晶氧化铌薄膜光滑均匀且透射率达91%,能有效消除中频磁控溅射产生的颗粒物问题。通过透射率波峰位置对比发现纯氧ECWR放电样片出现红移,原因是其放电得到的薄膜均匀而致密,使光学禁带宽度向低能方向漂移出现带隙窄化。研究结果还揭示了离子源高密度、低能量特性与薄膜表面和光学特性之间的关系,为精密光学薄膜应用提供了新的解决方案。

工质流量对ECR离子源束流影响研究

栅格进气道电子回旋共振(electron cyclotron resonance,ECR)离子源推进剂供给压强低、无阴极,有应用于吸气式电推进系统的潜力。流量对离子源的束流影响显著,当流量超过临界流量时,离子束流的增长受到抑制。为明晰限制离子束流增长的根本原因,开展不同流量下氮工质栅格进气道ECR离子源的Langmuir探针诊断实验,并基于诊断结果计算了寻常(ordinary,O)波截止区和电子获能指标的分布。研究结果表明,当流量低于临界流量时,随着流量增加,离子密度快速增加,限制离子束流增长的主要因素是中性气体密度。当流量超出临界流量时,O波截止区几乎覆盖整个等离子体产生区域,这导致电子能量获取效率下降了一个数量级。此时,限制离子束流增长的主要因素转变为电子温度。

微波等离子体制备类金刚石薄膜进展

随着对材料需求的日渐增长,在材料表面沉积性能优异的薄膜以提高材料的使用性能成为一种趋势。类金刚石薄膜具有高硬度、强的耐腐蚀性能、低摩擦因数、良好的耐磨损性等优势,在工业制造领域受到越来越多的关注。介绍了电子回旋共振等离子体源和表面波等离子体源的原理及在制备DLC薄膜中的应用,分析了沉积过程中影响DLC薄膜性能的主要因素,指出了目前存在的问题,总结了微波等离子体源能够产生大面积的高密度等离子体,且无电极污染等优势,为促进高性能DLC薄膜的制备和应用提供参考。

双放电腔微波-ECR等离子体源增强磁控溅射沉积技术

因其设备简单、沉积速率高等特点 ,磁控溅射沉积技术被广泛地用于各种薄膜制备中 .但用反应磁控溅射制备化合物薄膜如氧化物、氮化物膜时 ,为了得到化学配比的膜层 ,薄膜生长表面的反应激活基团、离子等的密度必须足够大 .为此对原有的微波 -ECR等离子体源进行了改造 .研究了双放电腔微波 -ECR等离子体源增强磁控溅射的放电特性 ,并用该方法制备了氮化碳膜 .结果表明 :该方法是一种有效的制备化合物薄膜的技术 ;用该方法制备的氮化碳膜 。

HL-2A装置2MW电子回旋共振加热系统研制

HL-2A装置电子回旋共振加热系统的主要指标是2MW/1s/68GHz,系统由4个单元组成,每个单元包括一只回旋管,微波传输系统,控制保护测量和冷却等子系统。通过对ECRH系统和回旋管的调试,每只管子微波输出功率500kW,脉冲宽度1s,四管并联运行时总输出功率达到1.63MW,系统使用效率高于80%。

微型电子回旋共振离子推力器离子源结构优化实验研究

微型电子回旋共振(ECR)离子推力器可满足微小航天器空间探测的推进需求.为此,本文开展直径20mm的微型ECR离子源结构优化实验研究.根据放电室内静磁场和ECR谐振区的分布特点,研究不同微波耦合输入位置对离子源性能的影响,结果表明环形天线处在高于ECR谐振强度的强磁场区域时,微波与等离子体实现无损耦合,电子共振加热效果显著,引出离子束流较大.根据放电室电磁截止特性,结合微波电场计算,研究放电容积对离子源性能的影响,实验表明过长或过短的腔体长度会导致引出离子束流下降甚至等离子体熄灭.经优化后离子源性能测试表明,在入射微波功率2.1 W、氩气流量14.9μg/s下,可引出离子束流5.4 mA,气体放电损耗和利用率分别为389 W/A和15%.

Langmuir探针诊断微波ECR非平衡磁控溅射等离子体

利用朗谬尔探针诊断了ECR非平衡磁控溅射等离子体,给出了微观等离子体参量随宏观工艺参量变化关系。实验测得基片架附近等离子体密度达到1010～1011数量级,电子温度在(5～10)eV之间。随溅射靶功率变化,等离子体密度在130W时取得最大值;同样随微波源功率变化,等离子体密度在功率为850W时也达到最大值。电子温度、等离子体空间电位变化与等离子体密度呈相同趋势。

用于半导体加工的腔耦合－磁多极型ECR源的研究

本实验室研制出一台谐振腔耦合一多极场位形的电子回旋共振（ＥＣＲ）微波等离子体源（ＭＥＰ）。采用朗谬探针和离子能量分析器，测量了ＭＥＰ中Ａｒ等离子体的放电特性。实验结果表明．ＭＥＰ能在很宽的运行参数范围，高效率地产生具有较高密度、较低离子温度和空间电位的大面积均匀等离子体，特别适合于半导体加工应用研究。

PZT铁电薄膜材料的ECR等离子体刻蚀研究

以SF6和SF6+Ar为刻蚀气体,采用电子回旋共振等离子体刻蚀工艺成功地对溶胶-凝胶工艺制备的锆钛酸铅铁电薄膜进行了有效的刻蚀去除.研究了不同气体总流量、混合比、微波功率等因素对刻蚀速率的影响,指出当气体混合比约为20%时,刻蚀速率达到最大值.锆钛酸铅铁电薄膜表面组份XPS能谱分析曲线表明,在SF6和SF6+Ar气体中,被刻蚀后样品的Pb含量大大减少,TiO2的刻蚀是限制锆钛酸铅铁电薄膜刻蚀速率的主要因素.

等离子体辅助原子层沉积氧化铝薄膜的研究

为在室温条件下进行氧化铝薄膜的原子层沉积,自行设计了一套微波回旋共振等离子体辅助原子层沉积装置,以三甲基铝作为铝源前躯体,氧气作为氧化剂,在室温下于氢氟酸溶液中处理过的单晶硅基片上进行了氧化铝薄膜的沉积。利用扫描电子显微镜、原子力显微镜、高分辨率透射电子显微镜、X-ray射线衍射、X-ray射线光电子能谱等分析手段测试了薄膜的表面形貌和成分,结果表明制备的氧化铝薄膜为非晶态结构,铝、氧元素含量配比接近2/3,同时薄膜表面非常光滑平整而且致密,表面粗糙度<0.4nm。通过高分辨率透射电子显微镜的截面图,可以估算出薄膜厚度约为80nm,界面非常清晰、平整,薄膜质量较高,沉积速率为0.27nm/周期,沉积速率较热沉积大大提高。

基于电子学的太赫兹辐射源

随着太赫兹科学与技术的发展,太赫兹辐射源研究受到越来越广泛的重视.本文对近年来常见的基于电子学的太赫兹辐射源进行综述,包括基于新型慢波结构真空电子器件的仿真设计与实验结果、基于电子回旋谐振脉塞的太赫兹辐射源和基于史密斯-帕塞尔效应的太赫兹辐射源的国内外研究近况,以及基于类等离子体光子晶体的太赫兹辐射源和固态太赫兹辐射源.对太赫兹辐射源在无线通信、成像探测、光谱探测和生物医学等方面的应用进行了展望.