Photoresist grating was fabricated by holography, and it was used in the mask of ion etching. The groovy depth of the etched glass grating was 1.6μm. The glass waveguide was formed by K^+/Na^+ ion exchanging. The las...Photoresist grating was fabricated by holography, and it was used in the mask of ion etching. The groovy depth of the etched glass grating was 1.6μm. The glass waveguide was formed by K^+/Na^+ ion exchanging. The laser beam of 633nm was coupled in the waveguide by a prism at one end, then, it passed through the grating and came out of the waveguide at other end. In the experiment, the Bragg diffraction with several orders was observed. The first order Bragg diffraction had the highest efficiency of 90 percent.展开更多
The possibilities of manufacturing of diffraction optical elements (DOE), using the “Caroline 15 PE” plasma-etching machine were considered. It is established that at thickness of chromic mask of 100 nm the plasma-c...The possibilities of manufacturing of diffraction optical elements (DOE), using the “Caroline 15 PE” plasma-etching machine were considered. It is established that at thickness of chromic mask of 100 nm the plasma-chemical etching (PCE) method reaches depth of surface micro-profile to 1.4 μm on optical glass. It allows increasing the diffraction efficiency of DOE to 0.3 - 0.35 on the second order of diffraction.展开更多
A flat-topped etched diffraction grating (EDG) demultiplexer with a low polarization-dependent loss (PDL) is designed. A design and simulation method based on the method of moment (MoM) is proposed. A 65-channcl EDG d...A flat-topped etched diffraction grating (EDG) demultiplexer with a low polarization-dependent loss (PDL) is designed. A design and simulation method based on the method of moment (MoM) is proposed. A 65-channcl EDG demultiplexer with channel spacing of 100 GHz is considered as a design example. A tapered multi-mode interferometer (MMI) is used to flatten the passband of the EDG demultiplexer. The numerical results show that the exit width of the tapered waveguide impacts the loss of the TE case more than that of the TM case. Based on this fact, the exit width of the taper is optimized to obtain the lowest PDL. The tapering angle is also optimized where the minimal ripple is obtained. The designed EDG demultiplexer has an excellent flat-topped spectral response and a very low PDL.展开更多
A novel semiconductor laser which can achieve mode-hop-free tuning is proposed. The device consists of an etched diffraction grating （EDG） as a dispersive element to provide the mode selection function and an active...A novel semiconductor laser which can achieve mode-hop-free tuning is proposed. The device consists of an etched diffraction grating （EDG） as a dispersive element to provide the mode selection function and an active waveguide to provide optical gain for the laser. The slab waveguide region of the EDG contains a tuning section covered by an electrode to inject a tuning current, and thus changes the refractive index. Mode-hop-free tuning is achieved by specially designing the shape of the tuning section, so that the tuning rate of the central wavelength reflected by the EDG and the tuning rate of the resonant wavelength of the laser cavity are equal. An optimized tuning section shape is designed to obtain the largest tuning range within a limited current range. Numerical simulation is presented to demonstTate the mode-hop-free tuning operation.展开更多
基金Academia Sinica and the Ministry of Posts and Telecommunications
文摘Photoresist grating was fabricated by holography, and it was used in the mask of ion etching. The groovy depth of the etched glass grating was 1.6μm. The glass waveguide was formed by K^+/Na^+ ion exchanging. The laser beam of 633nm was coupled in the waveguide by a prism at one end, then, it passed through the grating and came out of the waveguide at other end. In the experiment, the Bragg diffraction with several orders was observed. The first order Bragg diffraction had the highest efficiency of 90 percent.
文摘The possibilities of manufacturing of diffraction optical elements (DOE), using the “Caroline 15 PE” plasma-etching machine were considered. It is established that at thickness of chromic mask of 100 nm the plasma-chemical etching (PCE) method reaches depth of surface micro-profile to 1.4 μm on optical glass. It allows increasing the diffraction efficiency of DOE to 0.3 - 0.35 on the second order of diffraction.
基金This work was supported by the National Nat- ural Science Foundation of China under Grant No. 90101024 and 60377022.
文摘A flat-topped etched diffraction grating (EDG) demultiplexer with a low polarization-dependent loss (PDL) is designed. A design and simulation method based on the method of moment (MoM) is proposed. A 65-channcl EDG demultiplexer with channel spacing of 100 GHz is considered as a design example. A tapered multi-mode interferometer (MMI) is used to flatten the passband of the EDG demultiplexer. The numerical results show that the exit width of the tapered waveguide impacts the loss of the TE case more than that of the TM case. Based on this fact, the exit width of the taper is optimized to obtain the lowest PDL. The tapering angle is also optimized where the minimal ripple is obtained. The designed EDG demultiplexer has an excellent flat-topped spectral response and a very low PDL.
基金supported by the National Natural Science Foundation of China (No 60788403)the Fundamental Research Funds for the Central Universities of China
文摘A novel semiconductor laser which can achieve mode-hop-free tuning is proposed. The device consists of an etched diffraction grating （EDG） as a dispersive element to provide the mode selection function and an active waveguide to provide optical gain for the laser. The slab waveguide region of the EDG contains a tuning section covered by an electrode to inject a tuning current, and thus changes the refractive index. Mode-hop-free tuning is achieved by specially designing the shape of the tuning section, so that the tuning rate of the central wavelength reflected by the EDG and the tuning rate of the resonant wavelength of the laser cavity are equal. An optimized tuning section shape is designed to obtain the largest tuning range within a limited current range. Numerical simulation is presented to demonstTate the mode-hop-free tuning operation.
