期刊文献+
共找到1篇文章
< 1 >
每页显示 20 50 100
Fabrication and Characterization of VO_2 Thin Films by Direct Current Facing Targets Magnetron Sputtering and Low Temperature Oxidation
1
作者 梁继然 胡明 +2 位作者 刘志刚 韩雷 陈涛 《Transactions of Tianjin University》 EI CAS 2008年第3期173-177,共5页
Low valence vanadium oxide(VO2-x) thin films were prepared on SiO2/Si substrates at room temperature by direct current facing targets reactive magnetron sputtering, and then proc- essed through rapid thermal annealing... Low valence vanadium oxide(VO2-x) thin films were prepared on SiO2/Si substrates at room temperature by direct current facing targets reactive magnetron sputtering, and then proc- essed through rapid thermal annealing. The effects of the annealing on the structure and phase transition property of VO2 were discussed. X-ray photoelectron spectroscopy, X-ray diffraction tech- nique and Fourier transform infrared spectroscopy were employed to study the phase composition and structure of the thin films. The resistance-temperature property was measured. The results show that VO2 thin film is obtained after annealed at 320 ℃ for 3 h, its phase transition tempera- ture is 56 ℃, and the resistance changes by more than 2 orders. The vanadium oxide thin films are applicable in thermochromic smart windows, and the deposition and annealing process is compatible with micro electromechanical system process. 展开更多
关键词 vanadium dioxide direct current facing targets magnetron sputtering low temperature oxidation: microstructure
下载PDF
上一页 1 下一页 到第
使用帮助 返回顶部