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Characteristics of High In-Content InGaN Alloys Grown by MOCVD
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作者 朱学亮 郭丽伟 +6 位作者 于乃森 彭铭曾 颜建锋 葛炳辉 贾海强 陈弘 周均铭 《Chinese Physics Letters》 SCIE CAS CSCD 2006年第12期3369-3372,共4页
InN and In0.46 Ca0.54N films are grown on sapphire with a CaN buffer by metalorganic chemical vapour deposition (MOCVD). Both high resolution x-ray diffraction and high resolution transmission electron microscopy re... InN and In0.46 Ca0.54N films are grown on sapphire with a CaN buffer by metalorganic chemical vapour deposition (MOCVD). Both high resolution x-ray diffraction and high resolution transmission electron microscopy results reveal that these films have a hexagonal structure of single crystal. The thin InN film has a high mobility of 4 75 cm^2V^-1s^-1 and that oflno.46 Gao.54N is 163 cm^2 V^-1s^-1. Room-temperat ure photoluminescence measurement of the InN film shows a peak at 0.72eV, confirming that a high quality InN film is fabricated for applications to full spectrum solar cells. 展开更多
关键词 CHEMICAL-VAPOR-DEPOSITION fundamental-band GAP INDIUM NITRIDE IMPROVEMENT ABSORPTION LAYERS
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