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Fabrication of Meander and Spiral Type Micro Inductors 被引量:3
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作者 T.S. Yoont, W.S. Cio and C. O.Kim (Division of Material Eng., Chungnam Nail. Unly., Taejon 305-764, Korea) H. w. hag (Dept. of Electronic Communication, Juseong College, Chungbuk 363-794, Korea) Y.H.Kim (Dept. of Electrical Eng., Pukyong Nail. Unly., Pusan, 608-737, Korea) 《Journal of Materials Science & Technology》 SCIE EI CAS CSCD 2000年第2期236-237,共2页
To obtain microstructure of magnetic devices, the thin film inductors were fabricated by the process such as thin film manufacturing, photolithography and wet etching. The frequency characteristics of these devices ar... To obtain microstructure of magnetic devices, the thin film inductors were fabricated by the process such as thin film manufacturing, photolithography and wet etching. The frequency characteristics of these devices are measured at high frequency range. When the inductor sizes of the spiral and the meander type are same, the inductance and the quality factor of the spiral type inductor are larger than those of the meander type inductor, but the driving frequency of the spiral type inductor is lower than that of the meander type inductor. 展开更多
关键词 In Fabrication of Meander and Spiral type Micro Inductors
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