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Fe50Mn30Co10Cr10高熵合金组织结构对其绝热剪切敏感性的影响 被引量:4
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作者 杨扬 杨双君 刘文辉 《矿冶工程》 CAS CSCD 北大核心 2019年第3期119-122,共4页
在室温下利用分离式霍普金森压杆对Fe50Mn30Co10Cr10高熵合金帽型样进行动态加载,通过动态加载曲线对比及金相观察分析了不同组织结构对Fe50Mn30Co10Cr10高熵合金的绝热剪切敏感性的影响规律与机制。结果表明,在相同动态加载条件下,试... 在室温下利用分离式霍普金森压杆对Fe50Mn30Co10Cr10高熵合金帽型样进行动态加载,通过动态加载曲线对比及金相观察分析了不同组织结构对Fe50Mn30Co10Cr10高熵合金的绝热剪切敏感性的影响规律与机制。结果表明,在相同动态加载条件下,试样晶粒越小、密排六方(hcp)相含量越多,绝热剪切带形成时的应力坍陷时间、临界应变、单位体积绝热剪切吸收能越大,绝热剪切带的宽度越小,绝热剪切敏感性降低。以面心立方(fcc)相为基体的Fe50Mn30Co10Cr10高熵合金的晶粒越小、hcp相含量越多,其应变硬化效应和应变速率强化效应越大,在相同动态加载条件下绝热剪切敏感性越小。 展开更多
关键词 fe50mn30Co10Cr10 高熵合金 组织结构 绝热剪切敏感性 绝热剪切带 霍普金森压杆
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Induced effects of Cu underlayer on (111) orientation of Fe_(50)Mn_(50) thin films
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作者 王蕾 王凤平 +3 位作者 刘还平 吴平 邱宏 潘礼庆 《中国有色金属学会会刊:英文版》 CSCD 2005年第2期353-357,共5页
Effects of Cu underlayer on the structure of Fe50Mn50 films were studied. Samples with a structure of Fe50Mn50(200 nm)/ Cu(tCu) were prepared by magnetron sputtering on thermally oxidized silicon substrates at room ... Effects of Cu underlayer on the structure of Fe50Mn50 films were studied. Samples with a structure of Fe50Mn50(200 nm)/ Cu(tCu) were prepared by magnetron sputtering on thermally oxidized silicon substrates at room temperature. The thickness of Cu underlayer varied from 0 to 60 nm in the intervals of 10 nm. High-vacuum annealing treatments, at different temperatures of 200, 300 and 400 ℃ for 1 h, respectively, on the Fe50Mn50(200 nm)/ Cu(20 nm) thin films were performed. The surface morphologies and textures of the samples were measured by field emission scan electronic microscope (FE-SEM) and X-ray diffraction(XRD). Energy dispersive X-ray spectroscopy (EDX) and Auger electron spectroscopy(AES) were used to analyze the compositional distribution. It is found that Cu underlayer has an obvious induce effect on (111) orientation of Fe50Mn50 thin films. The induce effects of Cu on (111) orientation of Fe50Mn50 changed with the increase of Cu layer thickness and the best effect was obtained at the Cu layer thickness of 20 nm. High-vacuum annealing treatments cause the migration of Mn atoms towards surface of the film and interface between Cu layer and substrate. With the increasing annealing temperature, migration of Mn atoms is more obvious, which leads to a Fe-riched Fe-Mn alloy film. 展开更多
关键词 fe50mn50薄膜 铜底层 热氧化硅基 磁溅射法
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Study of Ni80Fe20/Fe50Mn50 superlattice microstructures by transmission electron microscopy and x—ray diffraction
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作者 MingXu TaoYang GuangmingLuo ZhengqiLu CuixiuLiu NingYang Zhenh 《Beijing Synchrotron Radiation Facility》 2001年第2期79-87,共9页
The detailed microstructures of Ni80Fe20/Fe50Mn50 superlattices have been characterized using both x-ray diffraction techniques and transmission electron microscopy.The obrivous layered structure,typical column struct... The detailed microstructures of Ni80Fe20/Fe50Mn50 superlattices have been characterized using both x-ray diffraction techniques and transmission electron microscopy.The obrivous layered structure,typical column structure and twins which exist in Ni80Fe20/Fe50Mn50 superlattices were observed through performing transmission microscopy.By combining the technique of lowangle x-ray reflectivity(specular and off-specular scans)with the anomalous scattering effect and high-angle x-ray diffraction(using conventional x-ray),wequantitatively analysed the microstructural variation as a function of annealing temperature.It is found that the lateral correlation length,the(111)peak intensity of the superlattices and the average multilayer coherence length all increase with a rise in annealing temperature annealing can decrease the rootmean-square roughness at the interfaces of Ni80Fe20/Fe50Mn50 superlattices.the obtained microstructural knowledge will be helpful in understanding the magnetic properties of the ni80Fe20/Fe50Mn50 exchange bias system. 展开更多
关键词 Ni80fe20/fe50mn50超晶格 X射线衍射分析 微观结构 电子输运
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分子束外延生长Fe/Fe_(50)Mn_(50)双层膜的交换偏置 被引量:1
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作者 敬超 金晓峰 +3 位作者 董国胜 龚小燕 郁黎明 郑卫民 《物理学报》 SCIE EI CAS CSCD 北大核心 2000年第10期2022-2026,共5页
利用表面磁光克尔效应和铁磁共振对分子束外延生长的Fe/Fe50 Mn50 双层膜的交换偏置场和矫顽力进行了研究 ,实验结果表明 ,当反铁磁层厚度小于 5 5nm时 ,不出现交换偏置 ,而当大于这一厚度时 ,出现交换偏置 ;大约在7nm时 ,达到极大值 ... 利用表面磁光克尔效应和铁磁共振对分子束外延生长的Fe/Fe50 Mn50 双层膜的交换偏置场和矫顽力进行了研究 ,实验结果表明 ,当反铁磁层厚度小于 5 5nm时 ,不出现交换偏置 ,而当大于这一厚度时 ,出现交换偏置 ;大约在7nm时 ,达到极大值 .随着反铁磁层厚度的继续增大 ,偏置场和矫顽力随Fe50 Mn50 膜厚的增大而下降 .铁磁共振实验结果表明样品的磁性存在单向各向异性 .并对上述结果进行了讨论 . 展开更多
关键词 分子束外延 双层膜 交换偏置
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具有优异力敏特性的纳米Fe50Ni50粉体/丁基橡胶复合材料薄膜
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作者 赵辉 朱正吼 《复合材料学报》 EI CAS CSCD 北大核心 2016年第4期714-722,共9页
为开发力敏性能更为优异的复合材料薄膜,首先,通过液相还原法制备了粒径约为100nm的纳米Fe50Ni50粉体,并通过液态混合分散工艺将纳米粉体与丁基橡胶(IIR)混合分散;然后,通过机械混炼及压制得到了粉体分布均匀、含量为65wt%的纳米Fe50N... 为开发力敏性能更为优异的复合材料薄膜,首先,通过液相还原法制备了粒径约为100nm的纳米Fe50Ni50粉体,并通过液态混合分散工艺将纳米粉体与丁基橡胶(IIR)混合分散;然后,通过机械混炼及压制得到了粉体分布均匀、含量为65wt%的纳米Fe50Ni50粉体/IIR复合材料薄膜;最后,研究了在连续加载/卸载速度为0.10mm/min、测试频率为1kHz的条件下,纳米Fe50Ni50粉体/IIR复合材料薄膜的力敏特性。结果表明:液态混合分散工艺可使Fe50Ni50粉体在复合材料薄膜中达到纳米级均匀分散效果;当压应力为0.20~0.90 MPa时,薄膜越厚,其标准偏差越大,力敏稳定性越差;随压应力增大,厚度为185μm的薄膜在加载阶段的阻抗近似线性下降,力敏灵敏度稳定在40~60范围内,标准偏差约为1~2。所得结论表明在压应力为0.20~0.90MPa时,制备的薄膜具有优异的力敏特性。 展开更多
关键词 复合材料 力敏特性 fe50Ni50粉体 丁基橡胶 力敏薄膜
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