He-charged oxide dispersion strengthened （ODS） FeCrNi fills were prepared by a radiofrequency （RF） plasma magnetron sputtering method in a He and Ar mixed atmosphere at 150 °C.As a comparison,He-charged FeCrN...He-charged oxide dispersion strengthened （ODS） FeCrNi fills were prepared by a radiofrequency （RF） plasma magnetron sputtering method in a He and Ar mixed atmosphere at 150 °C.As a comparison,He-charged FeCrNi films were also fabricated at the same conditions through direct current （DC） plasma magnetron sputtering.The doping of He atoms and Y2O3 in the FeCrNi fills was realized by the high backscattered rate of He ions and Y2O3/FeCrNi composite target sputtering method,respectively.Inductive coupled plasma （ICP） and x-ray photoelectron spectroscopy （XPS） analysis confirmed the existence of Y2O3 in FeCrNi fills,and Y2O3 content hardly changed with sputtering He/Ar ratio.Cross-sectional scanning electron microscopy （SEM） shows that the FeCrNi films were composed of dense colunnarnanocrystallines and the thickness of the films was obviously dependent on He/Ar ratio.Nanoindentation measurements revealed that the FeCrNi films fabricated through DC/RF plasma magnetron sputtering methods exhibited similar hardness values at each He/Ar ratio,while the dispersion of Y2O3 apparently increased the hardness of the fills.Elastic recoil detection （ERD） showed that DC/RF magnetron sputtered FeCrNi films contained similar He amounts （～17 at.%）.Compared with the minimal change of He level with depth in DC-sputtered films,the He amount decreases gradually in depth in the RF-sputtered fills.The Y2O3-doped FeCrNi films were shown to exhibit much smaller amounts of He owing to the lower backscattering possibility of Y2O3 and the inhibition effect of nano-sized Y2O3 particles on the He element.展开更多
The effects of small amount(≥0.05%)of active elements Y and Ce in Fe-25Cr-40Ni al- loy have been investigated on the kinetics of early stage of high temperature oxidation as well as composition and microsructure of o...The effects of small amount(≥0.05%)of active elements Y and Ce in Fe-25Cr-40Ni al- loy have been investigated on the kinetics of early stage of high temperature oxidation as well as composition and microsructure of oxide film by ion backscattering and slow positron beam.The results show that Y and Ce can reduce evidently the high tem- perature oxidation rate of FeCrNi alloy at early stage and can effectively enhance the Cr_2O_3 formation and retard the oxide formation of Fe and Ni in the surface layer thus the microstructure of the oxide film is improved.Y and Ce enter the oxide film and concentrate within several tens nanometres from surface of the outer layer.The mech- anism of oxidation resistance for Ce is different from Y.Ce can decrease the density of vacancy defects in oxide layer,so the cations are restrained from diffusion outward through vacancies.While Y can control the outward diffusion of cations through va- cancies at the early statge of oxidation(shorter than 12 min),aften that restrained the cations from diffusion outward along grain boundaries up to 60 min oxidation.展开更多
基金financially supported by National Natural Science Foundation of China(No.11374299)
文摘He-charged oxide dispersion strengthened （ODS） FeCrNi fills were prepared by a radiofrequency （RF） plasma magnetron sputtering method in a He and Ar mixed atmosphere at 150 °C.As a comparison,He-charged FeCrNi films were also fabricated at the same conditions through direct current （DC） plasma magnetron sputtering.The doping of He atoms and Y2O3 in the FeCrNi fills was realized by the high backscattered rate of He ions and Y2O3/FeCrNi composite target sputtering method,respectively.Inductive coupled plasma （ICP） and x-ray photoelectron spectroscopy （XPS） analysis confirmed the existence of Y2O3 in FeCrNi fills,and Y2O3 content hardly changed with sputtering He/Ar ratio.Cross-sectional scanning electron microscopy （SEM） shows that the FeCrNi films were composed of dense colunnarnanocrystallines and the thickness of the films was obviously dependent on He/Ar ratio.Nanoindentation measurements revealed that the FeCrNi films fabricated through DC/RF plasma magnetron sputtering methods exhibited similar hardness values at each He/Ar ratio,while the dispersion of Y2O3 apparently increased the hardness of the fills.Elastic recoil detection （ERD） showed that DC/RF magnetron sputtered FeCrNi films contained similar He amounts （～17 at.%）.Compared with the minimal change of He level with depth in DC-sputtered films,the He amount decreases gradually in depth in the RF-sputtered fills.The Y2O3-doped FeCrNi films were shown to exhibit much smaller amounts of He owing to the lower backscattering possibility of Y2O3 and the inhibition effect of nano-sized Y2O3 particles on the He element.
文摘The effects of small amount(≥0.05%)of active elements Y and Ce in Fe-25Cr-40Ni al- loy have been investigated on the kinetics of early stage of high temperature oxidation as well as composition and microsructure of oxide film by ion backscattering and slow positron beam.The results show that Y and Ce can reduce evidently the high tem- perature oxidation rate of FeCrNi alloy at early stage and can effectively enhance the Cr_2O_3 formation and retard the oxide formation of Fe and Ni in the surface layer thus the microstructure of the oxide film is improved.Y and Ce enter the oxide film and concentrate within several tens nanometres from surface of the outer layer.The mech- anism of oxidation resistance for Ce is different from Y.Ce can decrease the density of vacancy defects in oxide layer,so the cations are restrained from diffusion outward through vacancies.While Y can control the outward diffusion of cations through va- cancies at the early statge of oxidation(shorter than 12 min),aften that restrained the cations from diffusion outward along grain boundaries up to 60 min oxidation.
