On the basis of free-electronic bands, the Fermi energy is calculated by summing the band eigenvalues over Brillouin-zones ,and the results may lead to understand the physical basis of the average-bond-energy model in...On the basis of free-electronic bands, the Fermi energy is calculated by summing the band eigenvalues over Brillouin-zones ,and the results may lead to understand the physical basis of the average-bond-energy model in the calculation of valence-band offsets.展开更多
A supercell of a nanotube heterojunction formed by an （8, 0） carbon nanotube （CNT） and an （8, 0） silicon carbide nanotube （SiCNT） is established, in which 96 C atoms and 32 Si atoms are included. The geometry ...A supercell of a nanotube heterojunction formed by an （8, 0） carbon nanotube （CNT） and an （8, 0） silicon carbide nanotube （SiCNT） is established, in which 96 C atoms and 32 Si atoms are included. The geometry optimization and the electronic property of the heterojunction are implemented through the first-principles calculation based on the density functional theory （DFT）. The results indicate that the structural rearrangement takes place mainly on the interface and the energy gap of the heterojunction is 0.31 eV, which is narrower than those of the isolated CNT and the isolated SiCNT. By using the average bond energy method, the valence band offset and the conduction band offset are obtained as 0.71 and -0.03 eV, respectively.展开更多
A method, which can predict the valence band offsets at strained layer heterojunctions under different strain situations only by calculating band structures and deformation parameters of the bulk materials, is suggest...A method, which can predict the valence band offsets at strained layer heterojunctions under different strain situations only by calculating band structures and deformation parameters of the bulk materials, is suggested. The applicability of this method is verified by calculation of the valence band offsets at strained layer heterojuntions ,such as InP/InAs, InP/GaP, GaAs/InAs, GaP/GaAs and AlAs/InAs with various strain conditions.展开更多
The average bond energy method is popularized and applied to study band offsets at strained layer heterojunctions. By careful examination of hydrostatic and uniaxial strain actions on the band offset parameter Emv,it ...The average bond energy method is popularized and applied to study band offsets at strained layer heterojunctions. By careful examination of hydrostatic and uniaxial strain actions on the band offset parameter Emv,it is found that the average band offset parameter Emv,av=Em-Ev, av remains basically unchanged under different strain conditions. Therefore, provided the band offset parameter before strain Emv,0 of bulk material is calculated, and the experiment values of deformation potential b and spin-orbit （SO） splitting energy △0 are quoted, the Emv at strained layer can be obtained by a simple and convenient algebraic calculation. Thus the valence band offset △Ev at strained layer heterojunction can also be predicted conveniently. This simplified calculation method is characterized by decreased calculation amount and increased conviction due to use as many as possible the experiment values.展开更多
The ternary alloy heterojunctions In<sub>x</sub>Ga<sub>1-x</sub>As/In<sub>x</sub>Al<sub>1-x</sub>As are important materialswhich have been widely used in microwave and p...The ternary alloy heterojunctions In<sub>x</sub>Ga<sub>1-x</sub>As/In<sub>x</sub>Al<sub>1-x</sub>As are important materialswhich have been widely used in microwave and photoelectric devices.The alloy hetero-junctions In<sub>x</sub>Ga<sub>1-x</sub>As/In<sub>x</sub>Al<sub>1-x</sub>As（x=0.3）have great potential use in high electron mobili-ty transistors（HEMTs）,heterostructure insulated-gate FFTs（HIGFETs）and resonant tun-neling diodes（RTDs）.When x rises to 0.53,In<sub>x</sub>Ga<sub>1-x</sub>As/In<sub>x</sub>Al<sub>1-x</sub>As can be widely used inthe high-speed electronic devices.The valence-band offset（the value of ΔE<sub>v</sub>展开更多
根据半导体自由电子能带模型 ,文中在面心立方 (fcc)晶体、体心立方 (bcc)晶体和 6角密堆积 (hcp)晶体中研究自由电子能带的平均键能 Em 和费米能级 EF 的关系 ,并得出自由电子能带的平均键能 Em 相当于费米能级 EF 的研究结果。其结果...根据半导体自由电子能带模型 ,文中在面心立方 (fcc)晶体、体心立方 (bcc)晶体和 6角密堆积 (hcp)晶体中研究自由电子能带的平均键能 Em 和费米能级 EF 的关系 ,并得出自由电子能带的平均键能 Em 相当于费米能级 EF 的研究结果。其结果有助于了解平均键能 Em 的物理实质 ,同时也为自由电子系统提供一种通过自由电子能带计算费米能级 EF(或费米半径 k F)展开更多
文摘On the basis of free-electronic bands, the Fermi energy is calculated by summing the band eigenvalues over Brillouin-zones ,and the results may lead to understand the physical basis of the average-bond-energy model in the calculation of valence-band offsets.
基金supported by the National Defense Pre-research Foundation of China (Grant No 9140A08060407DZ0103)
文摘A supercell of a nanotube heterojunction formed by an （8, 0） carbon nanotube （CNT） and an （8, 0） silicon carbide nanotube （SiCNT） is established, in which 96 C atoms and 32 Si atoms are included. The geometry optimization and the electronic property of the heterojunction are implemented through the first-principles calculation based on the density functional theory （DFT）. The results indicate that the structural rearrangement takes place mainly on the interface and the energy gap of the heterojunction is 0.31 eV, which is narrower than those of the isolated CNT and the isolated SiCNT. By using the average bond energy method, the valence band offset and the conduction band offset are obtained as 0.71 and -0.03 eV, respectively.
文摘A method, which can predict the valence band offsets at strained layer heterojunctions under different strain situations only by calculating band structures and deformation parameters of the bulk materials, is suggested. The applicability of this method is verified by calculation of the valence band offsets at strained layer heterojuntions ,such as InP/InAs, InP/GaP, GaAs/InAs, GaP/GaAs and AlAs/InAs with various strain conditions.
基金Special Doctoral Research Foundation of Chinese State Commission of Education!(9538409 )Natural Science Foundation of Fujian
文摘The average bond energy method is popularized and applied to study band offsets at strained layer heterojunctions. By careful examination of hydrostatic and uniaxial strain actions on the band offset parameter Emv,it is found that the average band offset parameter Emv,av=Em-Ev, av remains basically unchanged under different strain conditions. Therefore, provided the band offset parameter before strain Emv,0 of bulk material is calculated, and the experiment values of deformation potential b and spin-orbit （SO） splitting energy △0 are quoted, the Emv at strained layer can be obtained by a simple and convenient algebraic calculation. Thus the valence band offset △Ev at strained layer heterojunction can also be predicted conveniently. This simplified calculation method is characterized by decreased calculation amount and increased conviction due to use as many as possible the experiment values.
基金Project supported by the National Natural Science Foundation of Chinathe Industrial Department of Xiamen Photoelectron Company.
文摘The ternary alloy heterojunctions In<sub>x</sub>Ga<sub>1-x</sub>As/In<sub>x</sub>Al<sub>1-x</sub>As are important materialswhich have been widely used in microwave and photoelectric devices.The alloy hetero-junctions In<sub>x</sub>Ga<sub>1-x</sub>As/In<sub>x</sub>Al<sub>1-x</sub>As（x=0.3）have great potential use in high electron mobili-ty transistors（HEMTs）,heterostructure insulated-gate FFTs（HIGFETs）and resonant tun-neling diodes（RTDs）.When x rises to 0.53,In<sub>x</sub>Ga<sub>1-x</sub>As/In<sub>x</sub>Al<sub>1-x</sub>As can be widely used inthe high-speed electronic devices.The valence-band offset（the value of ΔE<sub>v</sub>
文摘根据半导体自由电子能带模型 ,文中在面心立方 (fcc)晶体、体心立方 (bcc)晶体和 6角密堆积 (hcp)晶体中研究自由电子能带的平均键能 Em 和费米能级 EF 的关系 ,并得出自由电子能带的平均键能 Em 相当于费米能级 EF 的研究结果。其结果有助于了解平均键能 Em 的物理实质 ,同时也为自由电子系统提供一种通过自由电子能带计算费米能级 EF(或费米半径 k F)
