A facile approach was demonstrated for fabricating high-performance nonvolatile memory devices based on ferroelectric-gate field effect transistors using a p-type Si nanowire coated with omega-shaped gate organic ferr...A facile approach was demonstrated for fabricating high-performance nonvolatile memory devices based on ferroelectric-gate field effect transistors using a p-type Si nanowire coated with omega-shaped gate organic ferroelectric poly(vinylidene fluoride-trifluoroethylene)(P(VDF-Tr FE)). We overcame the interfacial layer problem by incorporating P(VDF-Tr FE) as a ferroelectric gate using a low-temperature fabrication process. Our memory devices exhibited excellent memory characteristics with a low programming voltage of ±5 V, a large modulation in channel conductance between ON and OFF states exceeding 105, a long retention time greater than 3 9 104 s, and a high endurance of over 105 programming cycles while maintaining an ION/IOFFratio higher than 102.展开更多
Organic ferroelectric memory devices based on field effect transistors that can be configured between two stable states of on and off have been widely researched as the next generation data storage media in recent yea...Organic ferroelectric memory devices based on field effect transistors that can be configured between two stable states of on and off have been widely researched as the next generation data storage media in recent years.This emerging type of memory devices can lead to a new instrument system as a potential alternative to previous non-volatile memory building blocks in future processing units because of their numerous merits such as cost-effective process,simple structure and freedom in substrate choices.This bi-stable non-volatile memory device of information storage has been investigated using several organic or inorganic semiconductors with organic ferroelectric polymer materials.Recent progresses in this ferroelectric memory field,hybrid system have attracted a lot of attention due to their excellent device performance in comparison with that of all organic systems.In this paper,a general review of this type of ferroelectric non-volatile memory is provided,which include the device structure,organic ferroelectric materials,electrical characteristics and working principles.We also present some snapshots of our previous study on hybrid ferroelectric memories including our recent work based on zinc oxide nanowire channels.展开更多
Among the many possible device configurations for organic memory devices,organic field-effect transistor (OFET) memory is an emerging technology with the potential to realize lightweight,low-cost,flexible charge stora...Among the many possible device configurations for organic memory devices,organic field-effect transistor (OFET) memory is an emerging technology with the potential to realize lightweight,low-cost,flexible charge storage media.In this feature article,the recent progress in the classes of OFET-based memory,including floating gate OFET memory,polymer electret OFET memory,ferroelectric OFET memory and several other kinds of OFET memories with unique configurations,are introduced.Finally,the prospects and problems of OFETs memory are discussed.展开更多
Field-effect transistors based on ferroelectrics have attracted intensive interests, because of their non-volatile data retention, rewritability, and non-destructive read-out. In particular, polymeric materials that p...Field-effect transistors based on ferroelectrics have attracted intensive interests, because of their non-volatile data retention, rewritability, and non-destructive read-out. In particular, polymeric materials that possess ferroelectric properties are promising for the fabrications of memory devices with high performance, low cost, and large-area manufacturing, by virtue of their good solubility, low-temperature processability, and good chemical stability. In this review, we discuss the material characteristics of ferroelectric polymers, providing an update on the current development of ferroelectric field-effect transistors（Fe-FETs） in non-volatile memory applications.展开更多
在铁电场效应晶体管(Ferroelectric Field Effect Transistor,FeFET)中,Hf_(0.5)Zr_(0.5)O_(2)(HZO)铁电薄膜的厚度是影响晶体管性能的关键参数。通过制备不同厚度铁电薄膜的铁电电容对其进行测试,选择最优厚度的铁电薄膜,设计制备一种1...在铁电场效应晶体管(Ferroelectric Field Effect Transistor,FeFET)中,Hf_(0.5)Zr_(0.5)O_(2)(HZO)铁电薄膜的厚度是影响晶体管性能的关键参数。通过制备不同厚度铁电薄膜的铁电电容对其进行测试,选择最优厚度的铁电薄膜,设计制备一种15 nm Hf_(0.5)Zr_(0.5)O_(2)铁电薄膜的铁电晶体管——Si/HZO/W(MFS)栅极结构的铁电晶体管。它的剩余极化强度2Pr达到30μC·cm^(-2),具有高的循环稳定性和倍率性能,电压窗口达到1.2 V,在铁电存储器领域具有巨大的应用潜力。展开更多
人工智能与物联网时代,大数据模型驱动的应用场景和计算任务层出不穷,极大促进了国家数字化发展.然而,传统冯·诺依曼(John von Neumann)体系架构的硬件系统由于存算分离的结构特点导致存储墙瓶颈,在数据密集型应用中消耗了大量的...人工智能与物联网时代,大数据模型驱动的应用场景和计算任务层出不穷,极大促进了国家数字化发展.然而,传统冯·诺依曼(John von Neumann)体系架构的硬件系统由于存算分离的结构特点导致存储墙瓶颈,在数据密集型应用中消耗了大量的数据搬运成本,抑制了能效性能提升.存算一体技术是后摩尔(Moore)时代背离传统架构系统的新型计算范式,利用存储单元器件、电路内在特性,将基本的计算逻辑任务融入存储单元之中,从而消除数据搬运开销,有望实现智能计算硬件平台能效性能的显著提升.本文以契合存算一体技术的存储器件电路为切入点,概述基于传统互补金属氧化物半导体(complementary metal oxide semiconductor,CMOS)和新型非易失存储器件代表铁电晶体管的存算一体电路,并从器件、架构芯片、算法应用等层次讨论存算一体电路的跨层次协同设计优化方法.展开更多
基金supported by Center for BioNano Health-Guardfunded by the Ministry of Science, ICT & Future Planning (MSIP) of Korea as a Global Frontier Project (HGUARD_2013M3A6B2)
文摘A facile approach was demonstrated for fabricating high-performance nonvolatile memory devices based on ferroelectric-gate field effect transistors using a p-type Si nanowire coated with omega-shaped gate organic ferroelectric poly(vinylidene fluoride-trifluoroethylene)(P(VDF-Tr FE)). We overcame the interfacial layer problem by incorporating P(VDF-Tr FE) as a ferroelectric gate using a low-temperature fabrication process. Our memory devices exhibited excellent memory characteristics with a low programming voltage of ±5 V, a large modulation in channel conductance between ON and OFF states exceeding 105, a long retention time greater than 3 9 104 s, and a high endurance of over 105 programming cycles while maintaining an ION/IOFFratio higher than 102.
文摘Organic ferroelectric memory devices based on field effect transistors that can be configured between two stable states of on and off have been widely researched as the next generation data storage media in recent years.This emerging type of memory devices can lead to a new instrument system as a potential alternative to previous non-volatile memory building blocks in future processing units because of their numerous merits such as cost-effective process,simple structure and freedom in substrate choices.This bi-stable non-volatile memory device of information storage has been investigated using several organic or inorganic semiconductors with organic ferroelectric polymer materials.Recent progresses in this ferroelectric memory field,hybrid system have attracted a lot of attention due to their excellent device performance in comparison with that of all organic systems.In this paper,a general review of this type of ferroelectric non-volatile memory is provided,which include the device structure,organic ferroelectric materials,electrical characteristics and working principles.We also present some snapshots of our previous study on hybrid ferroelectric memories including our recent work based on zinc oxide nanowire channels.
基金supported by the National Basic Research Program of China (2011CB808404 and 2009CB939703)the National Natural Science Foundation of China (10974074,90607022,60676001,60676008 and 60825403)
文摘Among the many possible device configurations for organic memory devices,organic field-effect transistor (OFET) memory is an emerging technology with the potential to realize lightweight,low-cost,flexible charge storage media.In this feature article,the recent progress in the classes of OFET-based memory,including floating gate OFET memory,polymer electret OFET memory,ferroelectric OFET memory and several other kinds of OFET memories with unique configurations,are introduced.Finally,the prospects and problems of OFETs memory are discussed.
基金Program supported partially by the NSFC(Nos.61574074,61774080)NSFJS(No.BK20170075)the Open Partnership Joint Projects of NSFC–JSPS Bilateral Joint Research Projects(No.61511140098)
文摘Field-effect transistors based on ferroelectrics have attracted intensive interests, because of their non-volatile data retention, rewritability, and non-destructive read-out. In particular, polymeric materials that possess ferroelectric properties are promising for the fabrications of memory devices with high performance, low cost, and large-area manufacturing, by virtue of their good solubility, low-temperature processability, and good chemical stability. In this review, we discuss the material characteristics of ferroelectric polymers, providing an update on the current development of ferroelectric field-effect transistors（Fe-FETs） in non-volatile memory applications.
文摘人工智能与物联网时代,大数据模型驱动的应用场景和计算任务层出不穷,极大促进了国家数字化发展.然而,传统冯·诺依曼(John von Neumann)体系架构的硬件系统由于存算分离的结构特点导致存储墙瓶颈,在数据密集型应用中消耗了大量的数据搬运成本,抑制了能效性能提升.存算一体技术是后摩尔(Moore)时代背离传统架构系统的新型计算范式,利用存储单元器件、电路内在特性,将基本的计算逻辑任务融入存储单元之中,从而消除数据搬运开销,有望实现智能计算硬件平台能效性能的显著提升.本文以契合存算一体技术的存储器件电路为切入点,概述基于传统互补金属氧化物半导体(complementary metal oxide semiconductor,CMOS)和新型非易失存储器件代表铁电晶体管的存算一体电路,并从器件、架构芯片、算法应用等层次讨论存算一体电路的跨层次协同设计优化方法.
