A fiberform nanostructure was synthesized by exposing high-density helium plasma to a 100 nm thick tungsten thin film in the linear plasma device NAGDIS-II.After helium plasma exposure,the cross-section of samples was...A fiberform nanostructure was synthesized by exposing high-density helium plasma to a 100 nm thick tungsten thin film in the linear plasma device NAGDIS-II.After helium plasma exposure,the cross-section of samples was observed by a scanning electron microscope,transmission electron microscope,and focused ion beam scanning electron microscope.It is shown that the thickness of the nanostructured layer increases significantly for only a short irradiation time.The optical absorptivity remains high,even though it is exposed to helium plasma for a short time.The usage of the thin film can shorten the processing time for nanostructure growth,which will be beneficial for commercial production.展开更多
文摘A fiberform nanostructure was synthesized by exposing high-density helium plasma to a 100 nm thick tungsten thin film in the linear plasma device NAGDIS-II.After helium plasma exposure,the cross-section of samples was observed by a scanning electron microscope,transmission electron microscope,and focused ion beam scanning electron microscope.It is shown that the thickness of the nanostructured layer increases significantly for only a short irradiation time.The optical absorptivity remains high,even though it is exposed to helium plasma for a short time.The usage of the thin film can shorten the processing time for nanostructure growth,which will be beneficial for commercial production.
