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DETECTION AND DEPTH PROFILING OF ^(19)F USING RESONANCES IN THE ^(19)F(α,p) ^(22)Ne REACTION
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作者 L.C.McIntyre Jr. J.A.Leavitt +5 位作者 M.D.Ashbaugh B.Dezfouly-Arjomandy Z.Lin J.Oder R.F.C.Farrow S.S.P.Parkin 《Nuclear Science and Techniques》 SCIE CAS CSCD 1990年第Z1期56-61,共6页
Resonances in the reaction 19F (α ,p) 22Ne have been used to detect and depth profile 19F in solid targets. Incident alpha particles in the range 2100-2500 keV were used and protons were detected at θ=135° with... Resonances in the reaction 19F (α ,p) 22Ne have been used to detect and depth profile 19F in solid targets. Incident alpha particles in the range 2100-2500 keV were used and protons were detected at θ=135° with a large solid angle surface barrier detector covered to stop elastically scattered alpha particles. This technique is a simple, nuclide specific probe and is particularly useful in detecting 19F in the presence of heavy elements such as GaAs where conventional Rutherford backscattering is ineffective. Examples using this technique on epitaxially grown thin films containing LaF3 layers will be presented. 展开更多
关键词 fluorine depth profile NUCLEAR REACTION analysis
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非晶硅中氟的浓度分布 被引量:1
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作者 钱景华 邵其鋆 +3 位作者 张钰蓉 吴小凤 张阿根 张龙兴 《核技术》 CAS CSCD 北大核心 1990年第2期74-80,共7页
本文用尖锐共振核反应法测定氟在非晶硅中的深度分布,为检验退卷积方法的适用范围,对能级宽度在1keV以下和1keV以上两种情况,对同一样品进行了测量。结果表明:在1keV以下退卷积方法仍可适用。
关键词 非晶硅 浓度 分布
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