A novel offset Fresnel Zone Plate reflector Antenna ( FZPA ) is proposed, the phase correcting zone of this FZPA is elliptic. Based on Physical Optics Method, the focusing characteristics of the reflector are an...A novel offset Fresnel Zone Plate reflector Antenna ( FZPA ) is proposed, the phase correcting zone of this FZPA is elliptic. Based on Physical Optics Method, the focusing characteristics of the reflector are analyzed. The comparison of this new FZPA with the circular FZPA and Mawzones FZPA is made.展开更多
A new type of reflector antenne is proposed, which applies the 1 D Fresnel zone phase correction to the classical parabolic cylindrical reflector, providing an alternative to the dual parabolic cylindrical ones discu...A new type of reflector antenne is proposed, which applies the 1 D Fresnel zone phase correction to the classical parabolic cylindrical reflector, providing an alternative to the dual parabolic cylindrical ones discussed by Sanad and Shafai [1] . The focusing characteristics of the new reflector are analyzed by physical optics method, and numerical results are illustrated to evaluate its applicability.展开更多
High resolution Fresnel zone plates for nanoscale three-dimensional imaging of materials by both soft and hard x-rays are increasingly needed by the broad applications in nanoscience and nanotechnology.When the outmos...High resolution Fresnel zone plates for nanoscale three-dimensional imaging of materials by both soft and hard x-rays are increasingly needed by the broad applications in nanoscience and nanotechnology.When the outmost zone-width is shrinking down to 50 nm or even below,patterning the zone plates with high aspect ratio by electron beam lithography still remains a challenge because of the proximity effect.The uneven charge distribution in the exposed resist is still frequently observed even after standard proximity effect correction(PEC),because of the large variety in the line width.This work develops a new strategy,nicknamed as local proximity effect correction(LPEC),efficiently modifying the deposited energy over the whole zone plate on the top of proximity effect correction.By this way,50 nm zone plates with the aspect ratio from 4:1 up to 15:1 and the duty cycle close to 0.5 have been fabricated.Their imaging capability in soft(1.3 keV)and hard(9 keV)x-ray,respectively,has been demonstrated in Shanghai Synchrotron Radiation Facility(SSRF)with the resolution of 50 nm.The local proximity effect correction developed in this work should also be generally significant for the generation of zone plates with high resolutions beyond 50 nm.展开更多
文摘A novel offset Fresnel Zone Plate reflector Antenna ( FZPA ) is proposed, the phase correcting zone of this FZPA is elliptic. Based on Physical Optics Method, the focusing characteristics of the reflector are analyzed. The comparison of this new FZPA with the circular FZPA and Mawzones FZPA is made.
文摘A new type of reflector antenne is proposed, which applies the 1 D Fresnel zone phase correction to the classical parabolic cylindrical reflector, providing an alternative to the dual parabolic cylindrical ones discussed by Sanad and Shafai [1] . The focusing characteristics of the new reflector are analyzed by physical optics method, and numerical results are illustrated to evaluate its applicability.
基金Project supported by the National Natural Science Foundation of China(Grant No.U1732104)China Postdoctoral Science Foundation(Grant No.2017M611443)Shanghai STCSM2019-11-20 Grant,China(Grant No.19142202700)。
文摘High resolution Fresnel zone plates for nanoscale three-dimensional imaging of materials by both soft and hard x-rays are increasingly needed by the broad applications in nanoscience and nanotechnology.When the outmost zone-width is shrinking down to 50 nm or even below,patterning the zone plates with high aspect ratio by electron beam lithography still remains a challenge because of the proximity effect.The uneven charge distribution in the exposed resist is still frequently observed even after standard proximity effect correction(PEC),because of the large variety in the line width.This work develops a new strategy,nicknamed as local proximity effect correction(LPEC),efficiently modifying the deposited energy over the whole zone plate on the top of proximity effect correction.By this way,50 nm zone plates with the aspect ratio from 4:1 up to 15:1 and the duty cycle close to 0.5 have been fabricated.Their imaging capability in soft(1.3 keV)and hard(9 keV)x-ray,respectively,has been demonstrated in Shanghai Synchrotron Radiation Facility(SSRF)with the resolution of 50 nm.The local proximity effect correction developed in this work should also be generally significant for the generation of zone plates with high resolutions beyond 50 nm.
