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Characterization of functionalized multiwalled carbon nanotubes and application as an effective filter for heavy metal removal from aqueous solutions 被引量:1
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作者 Emad.M.Elsehly N.G.Chechenin +5 位作者 A.V.Makunin H.A.Motaweh E.A.Vorobyeva K.A.Bukunov E.G.Leksina A.B.Priselkova 《Chinese Journal of Chemical Engineering》 SCIE EI CAS CSCD 2016年第12期1695-1702,共8页
Filtration efficiency of Ni(II) from aqueous solution using pristine and modified MWCNTs filters was investigated as a function of Ni(II) ion concentration, p H, and filter mass. MWCNTs were synthesized by CVD method ... Filtration efficiency of Ni(II) from aqueous solution using pristine and modified MWCNTs filters was investigated as a function of Ni(II) ion concentration, p H, and filter mass. MWCNTs were synthesized by CVD method and modified using two complementary treatments, purification(using a mixture of hydrochloric acid and hydrogen peroxide) and functionalization(using nitric acid). The effect and mechanism of each treatment on the structural integrity of pristine MWCNTs has been studied. Morphology of the pristine and modified filters was investigated by Raman Spectrometry(RS), Scanning Electron Microscopy(SEM), Energy Dispersive X-ray Spectroscopy(EDS),Fourier Transform Infrared(FTIR) spectrometry and Thermogravimetric analysis. It was found from Raman spectra that the ratio of the intensity of D-band to that of G-band decreased by purification process, and increased by functionalization process. The adsorption mechanism of Ni(II) onto the surface functional groups of modified MWCNTs was confirmed by FTIR spectrum. The filtration results showed that the removal efficiency of Ni(II) is strongly dependent on pH and could reach 85% at pH = 8. Also, modified MWCNT filters can be reused through many cycles of regeneration with high performance. Functionalized MWCNTs filters may be a promising adsorbent candidate for heavy metal removal from wastewater. 展开更多
关键词 MWCNTs filters functionalization Nickel removal Filtration Raman spectrometry Purification
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Numerical Simulation on CCOS Controllable Variable
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作者 CHENG Hao bo, FENG Zhi jing (Dept.of Precision Instruments,Tsinghua University,Beijing 100084,CHN) 《Semiconductor Photonics and Technology》 CAS 2003年第4期251-255,共5页
On the basis of Preston hypothesis,the motion relationship between tool and workpiece upon the tools motion in planar model is analyzed.The effect on computer controlled optical surfacing (CCOS) caused by controllable... On the basis of Preston hypothesis,the motion relationship between tool and workpiece upon the tools motion in planar model is analyzed.The effect on computer controlled optical surfacing (CCOS) caused by controllable variable is simulated except for the dwelling time,thus,some reference on theory is provided to optimize the former numerical control (NC) model,and fast manufacturing of large departure aspherics is realized. 展开更多
关键词 Departure aspherics removal function Motion in planar model CCOS
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Material removal model of magnetorheological finishing based on dense granular flow theory 被引量:3
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作者 Yang Bai Xuejun Zhang +2 位作者 Chao Yang Longxiang Li Xiao Luo 《Light(Advanced Manufacturing)》 2022年第4期4-13,共10页
Magnetorheological finishing(MRF)technology is widely used in the fabrication of high-precision optical elements.The material removal mechanism of MRF has not been fully understood because MRF technology involves the ... Magnetorheological finishing(MRF)technology is widely used in the fabrication of high-precision optical elements.The material removal mechanism of MRF has not been fully understood because MRF technology involves the integration of electromagnetics,contact mechanics,and materials science.In this study,the rheological properties of the MR polishing fluid in oscillation model have been investigated.We propose that the shear-thinned MR polishing fluid over the polishing area should be considered a dense granular flow,based on which a new contact model of MRF over the polishing area has been constructed.Removal function and processing force test experiments were conducted under different working gaps.The normal pressure and effective friction equations over the polishing area were built based on the continuous medium and dense granular flow theories.Then,a novel MRF material removal model was established.A comparison of the results of the theoretical model with actual polishing results demonstrated the accuracy of the established model.The novel model proposed herein reveals the generation mechanism of shear force over a polished workpiece and realizes effective decoupling of the main processing parameters that influence the material removal of MRF.The results of this study will provide new and effective theoretical guidance for the process optimization and technology improvement of MRF. 展开更多
关键词 Magnetorheological finishing Material removal mechanism Dense granular flow removal function Optical fabrication
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