为了研制满足光纤通讯需求的高性能半导体激光器,对压应变In Ga As Sb/Ga As Sb量子阱激光器有源区进行了研究。根据应变量子阱能带理论、固体模型理论和克龙尼克-潘纳模型,确定了激射波长与量子阱材料组分及阱宽的关系。基于Lastip软...为了研制满足光纤通讯需求的高性能半导体激光器,对压应变In Ga As Sb/Ga As Sb量子阱激光器有源区进行了研究。根据应变量子阱能带理论、固体模型理论和克龙尼克-潘纳模型,确定了激射波长与量子阱材料组分及阱宽的关系。基于Lastip软件建立了条宽为50μm、腔长为800μm的半导体激光器仿真模型,模拟器件的输出特性,讨论了量子阱个数对器件光电特性的影响。结果表明:当量子阱组分为In0.44Ga0.56As0.92Sb0.08/Ga As0.92Sb0.08、阱宽为9 nm、量子阱个数为2时,器件的性能达到最佳,阈值电流为48 m A,斜率效率为0.76 W/A。展开更多
The epi material growth of GaAsSb based DHBTs with InAlAs emitters are investigated using a 4×100mm multi-wafer production Riber 49 MBE reactor fully equipped with real-time in-situ sensors including an absorptio...The epi material growth of GaAsSb based DHBTs with InAlAs emitters are investigated using a 4×100mm multi-wafer production Riber 49 MBE reactor fully equipped with real-time in-situ sensors including an absorption band edge spectroscope and an optical-based flux monitor.The state-of-the-art hole mobilities are obtained from 100nm thick carbon-doped GaAsSb.A Sb composition variation of less than ±0.1 atomic percent across a 4×100mm platen configuration has been achieved.The large area InAlAs/GaAsSb/InP DHBT device demonstrates excellent DC characteristics,such as BV_CEO>6V and a DC current gain of 45 at 1kA/cm2 for an emitter size of 50μm×50μm.The devices have a 40nm thick GaAsSb base with p-doping of 4.5×1019cm-3.Devices with an emitter size of 4μm×30μm have a current gain variation less than 2% across the fully processed 100mm wafer.f_t and f_max are over 50GHz,with a power efficiency of 50%,which are comparable to standard power GaAs HBT results.These results demonstrate the potential application of GaAsSb/InP DHBT for power amplifiers and the feasibility of multi-wafer MBE for mass production of GaAsSb-based HBTs.展开更多
In this paper,we report the growth of Ga As Sb and its crystalline property under various Sb2/As2 flux ratios and growth temperatures.We simulated the incorporation difference between Sb2 and As2 by using a non-equili...In this paper,we report the growth of Ga As Sb and its crystalline property under various Sb2/As2 flux ratios and growth temperatures.We simulated the incorporation difference between Sb2 and As2 by using a non-equilibrium thermodynamic model.Our study of Ga As Sb growth has successfully yielded,high quality In Ga As/Ga As Sb Type II superlattice for which the optical properties were characterized by photoluminescence at different excitation power and temperature.A blue-shift in luminescence peak energy with excitation power was observed and was described by a non-equilibrium carrier density model.We measured and analyzed the dependences of peak energy and integrated intensity on temperature.Two thermal processes were observed from intensity dependent photoluminescence measurements.展开更多
文摘为了研制满足光纤通讯需求的高性能半导体激光器,对压应变In Ga As Sb/Ga As Sb量子阱激光器有源区进行了研究。根据应变量子阱能带理论、固体模型理论和克龙尼克-潘纳模型,确定了激射波长与量子阱材料组分及阱宽的关系。基于Lastip软件建立了条宽为50μm、腔长为800μm的半导体激光器仿真模型,模拟器件的输出特性,讨论了量子阱个数对器件光电特性的影响。结果表明:当量子阱组分为In0.44Ga0.56As0.92Sb0.08/Ga As0.92Sb0.08、阱宽为9 nm、量子阱个数为2时,器件的性能达到最佳,阈值电流为48 m A,斜率效率为0.76 W/A。
文摘The epi material growth of GaAsSb based DHBTs with InAlAs emitters are investigated using a 4×100mm multi-wafer production Riber 49 MBE reactor fully equipped with real-time in-situ sensors including an absorption band edge spectroscope and an optical-based flux monitor.The state-of-the-art hole mobilities are obtained from 100nm thick carbon-doped GaAsSb.A Sb composition variation of less than ±0.1 atomic percent across a 4×100mm platen configuration has been achieved.The large area InAlAs/GaAsSb/InP DHBT device demonstrates excellent DC characteristics,such as BV_CEO>6V and a DC current gain of 45 at 1kA/cm2 for an emitter size of 50μm×50μm.The devices have a 40nm thick GaAsSb base with p-doping of 4.5×1019cm-3.Devices with an emitter size of 4μm×30μm have a current gain variation less than 2% across the fully processed 100mm wafer.f_t and f_max are over 50GHz,with a power efficiency of 50%,which are comparable to standard power GaAs HBT results.These results demonstrate the potential application of GaAsSb/InP DHBT for power amplifiers and the feasibility of multi-wafer MBE for mass production of GaAsSb-based HBTs.
基金supported by the National Natural Science Foundation of China(Grant No.61176082)the National Basic Research Program of China(Grant No.2012CB619203)
文摘In this paper,we report the growth of Ga As Sb and its crystalline property under various Sb2/As2 flux ratios and growth temperatures.We simulated the incorporation difference between Sb2 and As2 by using a non-equilibrium thermodynamic model.Our study of Ga As Sb growth has successfully yielded,high quality In Ga As/Ga As Sb Type II superlattice for which the optical properties were characterized by photoluminescence at different excitation power and temperature.A blue-shift in luminescence peak energy with excitation power was observed and was described by a non-equilibrium carrier density model.We measured and analyzed the dependences of peak energy and integrated intensity on temperature.Two thermal processes were observed from intensity dependent photoluminescence measurements.
