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射频磁控溅射法制备TiB_2涂层及其性能分析 被引量:10
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作者 孙荣幸 张同俊 +1 位作者 戴伟 李松 《材料科学与工程学报》 CAS CSCD 北大核心 2006年第2期249-251,257,共4页
利用射频磁控溅射技术在硅和钢片上沉积了TiB2涂层。采用场发射电子扫描显微镜(FESEM),小掠射角x射线衍射(GAXRD)及X射线光电子能谱(XPS)分别研究了涂层的横截面形貌,晶体结构以及涂层中的元素和化学状态。同时,对涂层的显微硬度和残余... 利用射频磁控溅射技术在硅和钢片上沉积了TiB2涂层。采用场发射电子扫描显微镜(FESEM),小掠射角x射线衍射(GAXRD)及X射线光电子能谱(XPS)分别研究了涂层的横截面形貌,晶体结构以及涂层中的元素和化学状态。同时,对涂层的显微硬度和残余应力进行了表征。结果表明,利用射频磁控溅射法制备的TiB2涂层平整光滑,结构致密,沿[001]晶向择优生长,具有纳米晶结构,硬度显著提高,而且残余压应力较低。 展开更多
关键词 射频磁控溅射 TIB2涂层 gaxrd 残余应力
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Surface Analysis of ZIRLO Alloy Implanted with Carbon
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作者 彭德全 白新德 +2 位作者 潘峰 孙辉 陈宝山 《Journal of Rare Earths》 SCIE EI CAS CSCD 2005年第S1期373-377,共5页
ZIRLO alloy specimens were implanted with carbon ions with fluence range from 1×10 16 to 1×10 18ions·cm -2, using a MEVVA source at an extraction voltage of 40 kV at maximum temperature of 380 ℃. The s... ZIRLO alloy specimens were implanted with carbon ions with fluence range from 1×10 16 to 1×10 18ions·cm -2, using a MEVVA source at an extraction voltage of 40 kV at maximum temperature of 380 ℃. The surfaces of the implanted samples were then analyzed and the TRIM 96 computer code was used to simulate the depth distribution of carbon. The valences of elements in the implanted surface of ZIRLO alloy were analyzed by X-ray photoemission spectroscopy (XPS); and then the depth distributions of the elements on the surface of the samples were obtained by Auger electron spectroscopy (AES). Scanning electron microscopy (SEM) was used to examine the micro-morphology of implanted samples. Glancing angle X-ray diffraction (GAXRD) at 0.30 incident angles was employed to examine the phase transformations of implanted samples. It shows that the as-received ZIRLO alloy is mainly composed of hexagonal alpha zirconium, as for implanted samples, there appeared hexagonal zirconia (H-ZrO_ 0.35) and sigma zirconium carbide (δ-Zr_3C_2), and the δ-Zr_3C_2 increased when increasing the fluence. When the fluence reached 1×10 18 ions·cm -2, the concentration of δ-Zr_3C_2 is the maximum in all the samples. The micro-morphology of implanted samples are similar, there are many pits with diameters ranging from 1 to 3 μm on the implanted surfaces. 展开更多
关键词 ZIRLO alloy carbon ion implantation X-ray photoemission spectroscopy (XPS) auger electron spectroscopy (AES) glancing angle X-ray diffraction (gaxrd)
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