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Total Dose Radiation Tolerance of Phase Change Memory Cell with GeSbTe Alloy 被引量:1
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作者 吴良才 刘波 +3 位作者 宋志棠 冯高明 封松林 陈宝明 《Chinese Physics Letters》 SCIE CAS CSCD 2006年第9期2557-2559,共3页
Phase change memory (PCM) cell array is fabricated by a standard complementary metal-oxide-semiconductor process and the subsequent special fabrication technique. A chalcogenide Ge2Sb2Te5 film in thickness 50hm depo... Phase change memory (PCM) cell array is fabricated by a standard complementary metal-oxide-semiconductor process and the subsequent special fabrication technique. A chalcogenide Ge2Sb2Te5 film in thickness 50hm deposited by rf magnetron sputtering is used as storage medium for the PCM cell. Large snap-back effect is observed in current-voltage characteristics, indicating the phase transition from an amorphous state (higher resistance state) to the crystalline state (lower resistance state). The resistance of amorphous state is two orders of magnitude larger than that of the crystalline state from the resistance measurement, and the threshold current needed for phase transition of our fabricated PCM cell array is very low (only several μA). An x-ray total dose radiation test is carried out on the PCM cell array and the results show that this kind of PCM cell has excellent total dose radiation tolerance with total dose up to 2 ×10^6 rad(Si), which makes it attractive for space-based applications. 展开更多
关键词 AMORPHOUS THIN-FILMS RANDOM-ACCESS MEMORY ge2SB2te5 FILMS ELECTRICAL-PROPERTIES NONVOLATILE ge20te80-xbix IMPLANTATION teMPERATURE TRANSITION
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