Intermetallic Getters Reactants for Vacuum Applications

The present work continues a series of publications devoted to the study of the sorption properties of reactive alloys based on IIA metals and the development of advanced getter materials for gas and vacuum technologies. This publication attempts to answer the current challenges in the field of gas sorption associated with the emergence of new vacuum products such as vacuum insulated glasses, electronic systems, cryogenic devices, etc. An analysis of the problems that arise here, as well as the results of sorption measurements, carried out with the participation of intermetallic phases of the composition CaLi2 and Ca0.33Li0.48Mg0.19, show that the best getter support for these new hermetically sealed products can be provided by intermetallic compounds formed in systems Li-IIA metals. Intermetallic phases of this family are easy to manufacture and demonstrate outstanding service characteristics: their specific sorption capacity is recorded high, exceeding traditional gas sorbents in this respect by at least an order of magnitude;the kinetics of gas capturing is set at the stage of alloy production, i.e., is adjustable;the temporary resistance of these phases to atmospheric gases allows to install the getter at its workplace in air, without further thermal activation. The sorption superiority of reactive intermetallics is explained by their special sorption mechanism: the gas/metal interaction is formed here as a combination of two processes, continuous growth of reaction products on a metallic surface and corrosion decay of brittle intermetallic phase under mechanical forces, which feeds the chemical reaction with a fresh surface. The advantages of sorption processes of this new type are undoubted and significant: compared with the conventional sorbents, an intermetallic getter reactant solves two important problems;it reduces production costs and increases the sorption yield.

The Study of Different Structuring Techniques for Creation of Non-Evaporable Getters

The results of observation of different structuring techniques of thin metal layers applied in micro system technologies are presented. The Ti V getter films formed by magnetron sputtering have been explored using scanning electron and atomic-force microscopy, Brunauer-Emmett-Teller method, thermogravimetric analysis and fractal geometry. The film sorption capacity for hydrogen given by thermogravimetry was of 7.7 m3·Pa·g-1. To estimate the effective surface area, the fractal geometry tools were used and the calculated value of the specific surface area was about 155 m2/m3. The second object under investigation was a structure composed of micro- and mesoporous silicon and copper layer deposited electrochemically on the pore walls. Porous silicon when coupled with a reactive metal or alloy is expected to be an effective getter for micro system techniques. The use of porous silicon and specific conditions of depositions allows to form the structure of complex fractal type with a specific surface area of 167 m2/cm3.

Effects of Mo on the Microstructure and Hydrogen Sorption Properties of Ti-Mo Getters

The effects of Mo on the microstructure evolution, porosity and hydrogen sorption properties of Ti-Mo getters are investigated in this work. The results show that the addition of Mo prolongs the densification process of Ti-Mo getters and results in a significant amount of sintered pores. With the Mo content increasing, the porosity of getters firstly increases reaching the maximum value as it attains about 7.5wt.%, and then drops. At the room temperature, the hydrogen sorption property of getters increases progressively with the Mo content increasing, but the tendency is not very clear before its content lies below 2.5wt.%. When the Mo content achieves about 7.5wt.%, the hydrogen sorption property proves to be the best. The discussion is made about the above mentioned phenomena inclusive of hydrogen sorption properties of getters under different activation conditions （from 500-750℃）.

Preparation of Ti-Mo getters by injection molding

Ti-Mo getters have been fabricated via metal injection molding (MIM) using three kinds of Ti powders with different mean particle sizes of 46 μm,35 μm and 26 μm,respectively. The surface morphology,porosity,and hydrogen sorption properties of Ti-Mo getters formed by MIM using paraffin wax as a principal binder constituent were examined. It has been proven that the powder injection molding is a viable forming technique for porous Ti-Mo getters. The particle size of Ti powders and the powder loading influence...

Getters: From Classification to Materials Design

The demand for getters with high sorption efficiency has generated a need for resources to assist in qualification of getter materials for their practical use. This paper discusses innovative steps which should provide a dramatic improvement in the selection and application of getter technologies used in various processes. The first step was to build a natural classification of chemisorbents, from which we obtain a corresponding order of suitability related to known getter products. The classification system suggested by the authors is based on criteria which are directly connected with the sorption behavior of the material. This has lead to the challenge of developing of a computing algorithm for characterization of sorption properties of getter materials and for solving the inverse problem—the problem of designing a chemisorbent based on the requirements of a fully realized application. The employment of the new methodology is demonstrated in the example of the calculations supporting the selection of getter films for MEMS.

Getters Reactants. I. Thermo-Sedimentational Activation

A new method for chemical pumping of gases has been developed using reactive alloys of Li with IIA metals in the liquid state. It is an answer to the need for ultra-high and extremely high vacuum without loose solid particles. Another application of this development is the production of high- and ultra-pure noble gases in a one-step process. Both of these solutions are unprecedented;they are based on a new gas/melt sorption interface that raises the overall bar of technical advances in the field to a higher level, simplifying sorption equipment and leading to cost savings.

The Newest Getter Technologies: Materials, Processes, Equipment

The efficiency of sorption purification of gases, as measured by an improvement in product quality and/or lowering of its cost, can be significantly increased via simple solutions: the substitution of current getter technology with reactive getters;and stimulation of the material in the sorption process using mechanochemical methods instead of heating or cooling. These ideas were embodied by the authors in new sorption apparatuses and devices such as mechanochemical sorption apparatuses for production of ultra pure gases, improved gas purifiers with reactive sorbent for production of pure and high purity gases and, finally, fluidized bed columns for mass production of pure and high purity gases.

Effect of Rapid Thermal Annealing Ambient on Gettering Efficiency and Surface Microstructure in 300mm CZ Silicon Wafers

The effect of rapid thermal annealing （RTA） ambient on denuded zone and oxygen precipitates in Czochralski （CZ） silicon wafers is studied in this paper. N2 and a N2/NH3 mixture are used as RTA ambient. It is demonstrated that a high density of oxygen precipitates and thin denuded zone are obtained in N2/NH3 ambient,while a relatively lower density of oxygen precipitates and thicker denuded zone are observed in N2 ambient. As the RTA duration times increased, the oxygen precipitate density increased and the denuded zone depth decreased. X-ray photoelectron spectroscopy （XPS） data and atomic force microscope （AFM） results show that there RTA process,which can explain the different effect of RTA was a surface nitriding reaction during the N2/NH3 ambient ambient.

Precipitation and gettering behaviors of copper in multicrystalline silicon used for solar cells

The precipitation and gettering behaviors of copper （Cu） at different defective regions in multicrystalline silicon were investigated by combining scanning infrared microscopy, optical microscopy, inductively coupled plasma mass spectrometry and microwave photo-conductance decay. It is found that the behaviors of Cu precipitation are strongly dependent on the defect density. Most of the Cu contaminants tend to form precipitates homogeneously in the low density defect region, while they mostly segregate at the defects and form precipitates heterogeneously in the high density defect region. In the case of heavy contamination, the Cu precipitate can significantly reduce the carrier lifetime of multicrystalline silicon due to their Schottkydiode behavior in the silicon substrate. A 900 °C rap thermal process （RTP） phosphorus gettering anneal cannot be sufficiently effective to remove the Cu precipitates in these two regions.

Reactive Alloys of IIA Metals: Gas Sorption and Corrosion as One Process

The present work summarizes the results of previously known, as well as the latest sorption measurements, which were carried out on IIA metal alloys in the form of films, powders and macrobodies with a monolithic structure. Analysis of these data made it possible to construct an empirical sorption model, according to which the corrosive decomposition of reactive alloys is one of the driving forces of the sorption process. This model provides a qualitative description of the sorption behavior of these alloys in a gas environment and can be useful in solving practical problems in the field of vacuum and gas technologies.

用Kotlin实现变量联动

变量联动指的是一个变量发生变化,其他变量也会发生变化。用Kotlin可以在语言层面实现变量联动。

Activation and pumping characteristics of Ti-Zr-V films deposited on narrow tubes

Non-evaporable getter(NEG)films are an integral part of many particle accelerators.These films provide conductance-free evenly distributed pumping,a low thermal outgassing rate,and a low photon-and electron-stimulated desorption.These characteristics make it an ideal solution for resolving the non-uniform pressure distribution in conductance-limited narrow vacuum tubes.In this study,ternary Ti-Zr-V films were deposited on Si substrates and Ag-Cu(Ag 0.085 wt%)tubes with an inner diameter of 22 mm.All Ti-Zr-V films were prepared from an alloy target using the same DC magnetron sputtering parameters.The compositions and corresponding chemical bonding states were analyzed by X-ray photoelectron spectroscopy after activation at different temperatures.The test particle Monte Carlo(TPMC)method was used to measure the sticking probability of the Ti-Zr-V film based on pressure readings during gas injection.The results indicate that activation commences at temperatures as low as 150℃and Ti~0,Zr~0,and V~0 exist on the surface after annealing at 180℃for 1 h.Ti-Zr-V films can be fully activated at 180℃for 24 h.The CO sticking probability reaches 0.15,with a pumping capacity of 1 monolayer.

Different effect of NiMnCo or FeNiCo on the growth of type-Ⅱa large diamonds with Ti/Cu as nitrogen getter

In order to synthesize high-quality type-Ⅱa large diamond, the selection of catalyst is very important, in addition to the nitrogen getter. In this paper, type-IIa large diamonds are grown under high pressure and high temperature（HPHT） by using the temperature gradient method（TGM）, with adopting Ti/Cu as the nitrogen getter in Ni70Mn25Co5（abbreviated as NiMnCo） or Fe（55）Ni（29）Co（16）（abbreviated FeNiCo） catalyst. The values of nitrogen concentration（Nc） in both synthesized high-quality diamonds are less than 1 ppm, when Ti/Cu（1.6 wt%） is added in the FeNiCo or Ti/Cu（1.8 wt%） is added in the NiMnCo. The difference in solubility of nitrogen between both catalysts at HPHT is the basic reason for the different effect of Ti/Cu on eliminating nitrogen. The nitrogen-removal efficiency of Ti/Cu in the NiMnCo catalyst is less than in the FeNiCo catalyst. Additionally, a high-quality type-Ⅱa large diamond size of 5.0 mm is obtained by reducing the growth rate and keeping the nitrogen concentration of the diamond to be less than 1 ppm, when Ti/Cu（1.6 wt%） is added in the FeNiCo catalyst.

Research on deposition rate of TiZrV/Pd film by DC magnetron sputtering method

An accelerator storage ring needs clean ultrahigh vacuum.A TiZrV non-evaporable getter(NEG) film deposited on interior walls of the chamber can realize distributed pumping,effective vacuum improvement and reduced longitudinal pressure gradient.But accumulation of pollutants such as N_2 and O_2 will decrease the adsorption ability of the NEG,leading to a reduction of NEG lifetime.Therefore,an NEG thin film coated with a layer of Pd,which has high diffusion rate and absorption ability for H_2,can extend the service life of NEG and improve the pumping rate of H_2 as well.In this paper,with argon as discharge gas,a magnetron sputtering method is adopted to prepare TiZrV-Pd films in a long straight pipe.By SEM measurement,deposition rates of TiZrV-Pd films are analyzed under different deposition parameters,such as magnetic field strength,gas flow rate,discharge current,discharge voltage and working pressure.By comparing the experimental results with the simulation results based on Sigmund's theory,the Pd deposition rate C can be estimated by the sputtered depth.

Dynamic Ni gettered by PSG from S-MIC poly-Si and its TFTs

A dynamic phosphor-silicate glass （PSG） gettering method is proposed in which the processes of the gettering of Ni by PSC and the crystallizing of α-Si into poly-Si by Ni take place simultaneously. The effects of PSC gettering process on the performances of solution-based metal induced crystallized （S-MIC） poly-Si materials and their thin film transistors （TFTs） are discussed. The crystallization rate is much reduced due to the fact that the Ni as a medium source of crystallization is extracted by the PSC during crystallization at the same time. The boundary between two neighbouring grains in S-MIC poly-Si with PSG looks blurrier than without PSG. Compared with the TFTs made from S-MIC poly-Si without PSC gettering, the TFTs made with PSC gettering has a reduced gate induced leakage current.

Hazy Backside Gettering with a-Si: H Film

Hazy backside gettering of boron-doped <111> siljcon wafer with a-Si: H film deposited by rf glow discharge technique (rf-GD) has been investigated by SEM, optical microscope and preferential etching tech- lique. lt is evident that the deposited film can effectively getter the haze after annealing at l l00℃in wet oxy- len ambient for 120 min. The pre-crystallization annealing at 650℃ in argon ambient for 10 min enhances the gettering effectiveness. The low temperature(200～300℃) process of growing extrinsic gettering film reduces the processing contamination.

Formation and Removement Mechanism of Haze Defects on（111）p－type Silicon Wafers

The haze defects on p-type (111) silicon wafers were investigated by means of chemical etching, Fouriertransform infra-red microscopy (FTIR), spreading resistance measurement. secondary ion mass spectroscopy(SLMS), transmission electron microscopy (TEM) equipped with an energy-dispersive X-ray spectrometer(EDX). The haze defects are the precipitates of silicide of metal impurities (Fe, Ni) on the wafer surface.The formation of haze defects can efficiently be inhibited by utilizing the technology of fast neutronirradiation combined with the internal gettering (IG), and then, the formation and removement mechanismof the haze defects have been discussed in this paper.

Mathematical model of oxygen outdiffusion

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Deposition and characterization of TiZrV-Pd thin films by dc magnetron sputtering

TiZrV film is mainly applied in the ultra-high vacuum pipes of storage rings. Thin fihn coatings of palladium, which are added onto the TiZrV film to increase the service life of nonevaporable getters and enhance H2 pumping speed, were deposited on the inner face of stainless steel pipes by dc magnetron sputtering using argon gas as the sputtering gas. The TiZrV-Pd film properties were investigated by atomic force microscope （AFM）, scanning electron microscope （SEM）, X-ray photoelectron spectroscopy （XPS） and X-Ray Diffraction （XRD）. The grain size of TiZrV and Pd films were about 0.42 1.3 nm and 8.5-18.25 nm respectively. It was found that the roughness of TiZrV films is small, about 2 4 nm, but for Pd film it is large, about 17 19 nm. The PP At. % of Pd in TiZrV/Pd films varied from 86.84 to 87.56 according to the XPS test results.

Polycrystalline Silicon Gettered by Porous Silicon and Heavy Phosphorous Diffusion

The biggest barrier for photovoltaic (PV) utilization is its high cost, so the key for scale PV utiliza-tion is to further decrease the cost of solar cells. One way to improve the efficiency, and therefore lower the cost, is to increase the minority carrier lifetime by controlling the material defects. The main defects in grain boundaries of polycrystalline silicon gettered by porous silicon and heavy phosphorous diffusion have been studied. The porous silicon was formed on the two surfaces of wafers by chemical etching. Phosphorous was then diffused into the wafers at high temperature (900℃). After the porous silicon and diffusion layers were removed, the minority carrier lifetime was measured by photo-conductor decay. The results show that the lifetime抯 minority carriers are increased greatly after such treatment.