期刊文献+
共找到1篇文章
< 1 >
每页显示 20 50 100
Growth and Characterization of AIGaAsSb by MOCVD
1
作者 吴伟 彭瑞伍 韦光宇 《Rare Metals》 SCIE EI CAS CSCD 1995年第1期33-39,共7页
The growth of AlGaAsSb quatornary alloys is described. In order to control the epimxial growth ofAIGaAsSb, emphasis is given on the deposition rates, growth temperatures and the relationship between growthconditions a... The growth of AlGaAsSb quatornary alloys is described. In order to control the epimxial growth ofAIGaAsSb, emphasis is given on the deposition rates, growth temperatures and the relationship between growthconditions and the distribution coefficients of Al and As. Whether the growth of AlGaAsSb epilayers is con-trolled by chemical reactions or by mass diffusion depends on the growth temperatures. This argument is veri-fied by kinetic considerations. Specular surfaces of AlGaAsSb on GaSb substrates were obtained. The composi-tional nonuniformities measured by electron probe micro-analysis (EPMA) are less than 0. 6% on area of 15× 15 mm ̄2. The crystallinity is measured by double crystal X-ray diffraction (DCXD). The lattice mismatchbetween AlGaAsSb epilayer and GaSb subetrato is estimated to be less than 5. 5 × 10 ̄(-4). 展开更多
关键词 MOCVD epitaxy ALGAASSB Distribution coefficient growthrate
下载PDF
上一页 1 下一页 到第
使用帮助 返回顶部