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SPS法制备的赝二元合金(Ga_2Te_3)_x-(Bi_(0.5)Sb_(1.5)Te_3)_(1-x)(x=0~0.2)电学性能
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作者 薛海峰 崔教林 修伟杰 《稀有金属材料与工程》 SCIE EI CAS CSCD 北大核心 2007年第9期1653-1656,共4页
采用放电等离子烧结(SPS)方法制备了赝二元合金(Ga2Te3)x-(Bi0.5Sb1.5Te3)1-x(x=0~0.2),并研究其电学性能。结果表明,在318K时(Ga2Te3)x-(Bi0.5Sb1.5Te3)1-x(x=0.1)合金的电导率为3.7×104Ω-1·m-1,是三元合金Bi0.5Sb1.5Te3的... 采用放电等离子烧结(SPS)方法制备了赝二元合金(Ga2Te3)x-(Bi0.5Sb1.5Te3)1-x(x=0~0.2),并研究其电学性能。结果表明,在318K时(Ga2Te3)x-(Bi0.5Sb1.5Te3)1-x(x=0.1)合金的电导率为3.7×104Ω-1·m-1,是三元合金Bi0.5Sb1.5Te3的2倍,而Seebeck系数没有明显下降。从所测得的α和σ值可知,赝二元(Ga2Te3)x-(Bi0.5Sb1.5Te3)1-x(x=0.1)合金的功率因子最大,为2.1×10-3(W·K-2·m-1),是三元Bi0.5Sb1.5Te3合金的1.5倍。 展开更多
关键词 赝二元合金(ga2Te3)x-(Bi0.5Sb1.5Te3)1-x 放电等离子烧结(SPS) 电学性能
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Microstructural Probing of (1-x) GeS_(2-x)Ga_2S_3 System Glasses By Raman Scattering 被引量:4
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作者 陶海征 《Journal of Wuhan University of Technology(Materials Science)》 SCIE EI CAS 2005年第3期8-10,共3页
Roman scattering measurement of ( 1 - x ) GeS2-x Ga2S3 system glasses was conducted in order to understand the microstructural change caused by the addition of Ga2S3 . According to the change of Raman spectra with t... Roman scattering measurement of ( 1 - x ) GeS2-x Ga2S3 system glasses was conducted in order to understand the microstructural change caused by the addition of Ga2S3 . According to the change of Raman spectra with the addition of Ga2S3, two main structural transformations were deduced : the gradual enhancement of ethane- like structural units S3 Ge- GeS3 ( 250 cm ^- 1) and S3 Ga- GaS3 (270 cm ^- 1 ) and the appearance of charge imbalanced units [ Ga2 S2 ( S1/2 )4 ]^2- and [Ga( S1/2 )4 ]^- . And this change of structural aspect seems to give as a clue to understanding the cause of the increased rare-earth solubility. 展开更多
关键词 1 - x GeS2-x ga2S3 system glasses Raman microstructure
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High-temperature oxidation behavior of Ti_3Si_((1-x))Al_xC_2 in air
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作者 刘小磐 万隆 +1 位作者 汪洋 马文闵 《中国有色金属学会会刊:英文版》 CSCD 2006年第B02期478-482,共5页
The oxidation behaviors of bulk Ti3Si(1-x)AlxC2 prepared by hot pressing were investigated. The results show that the isothermal oxidation behavior of Ti3SiC2 obeys a parabolic law between 900 and 1 100℃and follows a... The oxidation behaviors of bulk Ti3Si(1-x)AlxC2 prepared by hot pressing were investigated. The results show that the isothermal oxidation behavior of Ti3SiC2 obeys a parabolic law between 900 and 1 100℃and follows a two-step parabolic rate law between 1 200℃and 1 300℃. The cyclic oxidation behavior of material is assumed to obey a three-step parabolic rate law at 1 100℃and 1 200℃. The calculated activation energy of isothermal oxidation is 101.43 kJ/mol. The oxide layers which consist of a mass ofα-Al2O3 and little TiO2 and SiO2 are observed on Ti3SiC2 as a dense and adhesive protect scale. The oxidation mechanism varies with the additive aluminum that greatly improves the oxidation resistance of Ti3SiC2. 展开更多
关键词 Ti3Si(1-x)AlxC2陶瓷 纳米层压化合物 等温氧化 空气 高温氧化行为
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氧空位对Ga_(1.5)In_(0.5)O_3透明导电氧化物性能的影响 被引量:2
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作者 赵银女 《材料科学与工程学报》 CAS CSCD 北大核心 2015年第3期396-400,共5页
Ga1.5In0.5O3是一种潜在的紫外透明导电材料。用第一性原理计算了含氧空位的Ga1.5In0.5O3的结构参数、生成焓、能带结构、态密度、光吸收和光反射。氧空位的位置影响Ga1.5In0.5O3化合物的晶格常数和生成焓,含氧空位的Ga1.5In0.5O3是间... Ga1.5In0.5O3是一种潜在的紫外透明导电材料。用第一性原理计算了含氧空位的Ga1.5In0.5O3的结构参数、生成焓、能带结构、态密度、光吸收和光反射。氧空位的位置影响Ga1.5In0.5O3化合物的晶格常数和生成焓,含氧空位的Ga1.5In0.5O3是间接带隙半导体,其带隙宽度较本征Ga1.5In0.5O3带隙值变宽。氧空位VO(1)、VO(2)和VO(3)在Ga1.5In0.5O3中分别引入0.237eV、0.239eV和1.384eV的施主杂质能级,在吸收光谱中出现杂质吸收现象。氧空位降低Ga1.5In0.5O3吸收主峰和反射主峰的强度,在近红外区含VO(1)和VO(2)的Ga1.5In0.5O3的吸收系数和反射率较大,含VO(3)的Ga1.5In0.5O3的吸收系数和反射率较小。 展开更多
关键词 ga2(1-x)in2xo3化合物 氧空位 电子结构 第一性原理
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金属有机物化学气相沉积法生长Ga_(2(1-x))In_(2x)O_3薄膜的结构及光电性能研究
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作者 杨帆 马瑾 +2 位作者 孔令沂 栾彩娜 朱振 《物理学报》 SCIE EI CAS CSCD 北大核心 2009年第10期7079-7082,共4页
采用金属有机物化学气相沉积(MOCVD)法在蓝宝石(0001)衬底上制备出了Ga2(1-x)In2xO3(x=0.1—0.9)薄膜,研究了薄膜的结构、电学和光学特性以及退火处理对薄膜性质的影响.测量结果表明:当In组分x=0.2时,样品为单斜β-Ga2O3结构;x=0.5的样... 采用金属有机物化学气相沉积(MOCVD)法在蓝宝石(0001)衬底上制备出了Ga2(1-x)In2xO3(x=0.1—0.9)薄膜,研究了薄膜的结构、电学和光学特性以及退火处理对薄膜性质的影响.测量结果表明:当In组分x=0.2时,样品为单斜β-Ga2O3结构;x=0.5的样品,薄膜呈现非晶结构,退火处理后薄膜结构得到明显的改善,由非晶结构转变为具有(222)单一取向的立方In2O3结构;对于x=0.8,薄膜为立方In2O3结构,退火后薄膜的晶体质量得到提高.在可见光区薄膜本身的透过率均达到了85%以上,带隙宽度随样品中Ga含量的改变在3.76—4.43eV之间变化,且经退火处理后带隙宽度明显增大. 展开更多
关键词 金属有机物化学气相沉积 ga2(1-x)in2xo3薄膜 蓝宝石衬底 退火
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